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EP1708008
European procedure
Extract from the Register of European Patents
EP About this file: EP1708008
| EP1708008 - Beam homogenizer and laser irradition apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.06.2012 Database last updated on 02.11.2024 | Most recent event Tooltip | 22.06.2012 | No opposition filed within time limit | published on 25.07.2012 [2012/30] | Applicant(s) | For all designated states Semiconductor Energy Laboratory Co., Ltd. 398 Hase Atsugi-shi, Kanagawa-ken 243-0036 / JP | [N/P] |
| Former [2006/40] | For all designated states SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 398 Hase Atsugi-shi, Kanagawa-ken 243-0036 / JP | Inventor(s) | 01 /
Moriwaka, Tomoaki c/o Semiconductor Energy Lab., Co. Ltd. 398, Hase Atsugi-shi Kanagawa-ken 243-0036 / JP | [2006/40] | Representative(s) | Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstrasse 4 80802 München / DE | [N/P] |
| Former [2006/40] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE | Application number, filing date | 06006435.9 | 28.03.2006 | [2006/40] | Priority number, date | JP20050106392 | 01.04.2005 Original published format: JP 2005106392 | [2006/40] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1708008 | Date: | 04.10.2006 | Language: | EN | [2006/40] | Type: | B1 Patent specification | No.: | EP1708008 | Date: | 17.08.2011 | Language: | EN | [2011/33] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 17.08.2006 | Classification | IPC: | G02B27/09, B23K26/067 | [2006/40] | CPC: |
G02B27/0966 (EP,US);
B23K26/064 (EP,US);
B23K26/0648 (EP,US);
B23K26/0665 (EP,US);
B23K26/067 (EP,US);
G02B27/0961 (EP,US)
| Designated contracting states | DE, FI, FR, GB, NL [2007/24] |
| Former [2006/40] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Strahlhomogenisator und Laserbestrahlungsvorrichtung | [2010/25] | English: | Beam homogenizer and laser irradition apparatus | [2006/40] | French: | Homogénéisateur de faisceau et appareil d'irradiation laser | [2006/40] |
| Former [2006/40] | Strahlenhomogenisator und Laserbestrahlungsvorrichtung | Examination procedure | 26.03.2007 | Examination requested [2007/19] | 26.04.2007 | Despatch of a communication from the examining division (Time limit: M04) | 04.09.2007 | Reply to a communication from the examining division | 25.08.2008 | Despatch of a communication from the examining division (Time limit: M04) | 18.12.2008 | Reply to a communication from the examining division | 22.07.2010 | Communication of intention to grant the patent | 11.11.2010 | Fee for grant paid | 11.11.2010 | Fee for publishing/printing paid | 16.12.2010 | Despatch of a communication from the examining division (Time limit: M02) | 16.02.2011 | Reply to a communication from the examining division | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 26.04.2007 | Opposition(s) | 21.05.2012 | No opposition filed within time limit [2012/30] | Fees paid | Renewal fee | 14.03.2008 | Renewal fee patent year 03 | 27.03.2009 | Renewal fee patent year 04 | 15.03.2010 | Renewal fee patent year 05 | 15.03.2011 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | FI | 17.08.2011 | NL | 17.08.2011 | [2012/09] |
| Former [2012/08] | NL | 17.08.2011 | Documents cited: | Search | [A]JP2001023920 ; | [XY]US4769750 (MATSUMOTO KOICHI [JP], et al) [X] 1-3 * column 5, lines 12-24; figure 4 * * column 1 * [Y] 4-6; | [X]US4988188 (OHTA MASAKATSU [JP]) [X] 1-3 * column 4, line 16 - line 23; figure 2 *; | [YA]EP1122020 (SEMICONDUCTOR ENERGY LAB [JP]) [Y] 4-6,34-37 * figures 1,2,10,11; example 11 * [A] 1-3,7-33; | [XY]WO0161411 (SILICON VALLEY GROUP [US]) [X] 1-3,7-33 * page 11, line 17 - page 13, line 19; figures 2A,4A,4C * [Y] 4-6,34-37 | [A] - PATENT ABSTRACTS OF JAPAN, (20010508), vol. 2000, no. 16, & JP2001023920 A 20010126 (SUMITOMO HEAVY IND LTD; NEC CORP) [A] 4-6,34-37 * abstract * | Examination | DE10049557 |