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EP1739489
European procedure
Extract from the Register of European Patents
EP About this file: EP1739489
| EP1739489 - Immersion lithography apparatus with damage control system [Right-click to bookmark this link] | |||
| Former [2007/01] | Lithographic apparatus immersion damage control | ||
| [2010/46] | Status | No opposition filed within time limit Status updated on 16.03.2012 Database last updated on 16.11.2024 | Most recent event Tooltip | 03.08.2012 | Lapse of the patent in a contracting state New state(s): GB | published on 05.09.2012 [2012/36] | Applicant(s) | For all designated states ASML Netherlands BV De Run 6501 5504 DR Veldhoven / NL | [2011/19] |
| Former [2007/01] | For all designated states ASML Netherlands BV 6501, De Run 5504 DR Veldhoven / NL | Inventor(s) | 01 /
van der Meulen, Frits 40, Berkven 5646 JG Eindhoven / NL | 02 /
Cox, Henrikus Herman Marie 41, Berkven 5646 JH Eindhoven / NL | 03 /
Houkes, Martijn 8, Friezenstraat 6135 HJ Sittard / NL | 04 /
van Vliet, Robertus Johannes 36d, Postelseweg 5521 RB Eersel / NL | 05 /
Nihtianov, Stoyan 16, Icaruslaan 5631 LD Eindhoven / NL | 06 /
Kemper, Petrus Wilhelmus Josephus Maria 24, Elandlaan 5581 CL Waalre / NL | 07 /
Hanegraaf, Roland Petrus Hendrikus 19, Nieuwlandsestraat 5473 RT Heeswijk-Dinther / NL | [2011/02] |
| Former [2007/01] | 01 /
van der Meulen, Frits 40, Berkven 5646 JG Eindhoven / NL | ||
| 02 /
Cox, Henrikus Herman Marie 41, Berkven 5646 JH Eindhoven / NL | |||
| 03 /
Houkes, Martijn 8, Friezenstraat 6135 HJ Sittard / NL | |||
| 04 /
van Vliet, Robertus Johannes 36d, Postelseweg 5521 RB Eersel / NL | |||
| 05 /
Nihtianov, Stoyan 16, Icaruslaan 5631 LD Eindhoven / NL | |||
| 06 /
Kemper, Petrus Wilhelmus Josephus Maria 24, Elandlaan 5581 CL Waalre / NL | |||
| 07 /
Hanegraaf, Roland Petrus Hendrikus 19, Nieuwlandsestraat 5473 RT Heeswijk-Dinther / NL | Representative(s) | Maas, Abraham Johannes, et al ASML Netherlands B.V. Corporate Intellectual Property De Run 6501 P.O. Box 324 5500 AH Veldhoven / NL | [N/P] |
| Former [2009/23] | Maas, Abraham Johannes, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2009/09] | Van den Hooven, Jan, et al ASML Netherlands B.V. Corporate Intellectual Property P.O. Box 324 5500 AH Veldhoven / NL | ||
| Former [2007/01] | Seitz, Holger Fritz Karl Exter Polak & Charlouis B.V. P.O. Box 3241 2280 GE Rijswijk / NL | Application number, filing date | 06076267.1 | 19.06.2006 | [2007/01] | Priority number, date | US20050169298 | 29.06.2005 Original published format: US 169298 | [2007/01] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP1739489 | Date: | 03.01.2007 | Language: | EN | [2007/01] | Type: | A3 Search report | No.: | EP1739489 | Date: | 06.06.2007 | [2007/23] | Type: | B1 Patent specification | No.: | EP1739489 | Date: | 11.05.2011 | Language: | EN | [2011/19] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 09.05.2007 | Classification | IPC: | G03F7/20 | [2007/01] | CPC: |
G03F7/70341 (EP,KR,US);
G03F7/70516 (KR);
G03F7/70533 (KR);
G03F7/706847 (KR);
H01L21/67259 (KR)
| Designated contracting states | DE, FR, GB, IT, NL [2008/07] |
| Former [2007/01] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Vorrichtung für Immersionslithographie mit Schadenkontrollsystem | [2010/50] | English: | Immersion lithography apparatus with damage control system | [2010/46] | French: | Appareil de lithographie par immersion doté d'un dispositif de contrôle du dommage | [2010/46] |
| Former [2007/01] | Immersionsschadenkontrolle für eine lithografische Vorrichtung | ||
| Former [2007/01] | Lithographic apparatus immersion damage control | ||
| Former [2007/01] | Contrôle du dégât d'immersion de l'appareil lithographique | Examination procedure | 26.09.2007 | Examination requested [2007/46] | 26.10.2007 | Despatch of a communication from the examining division (Time limit: M06) | 07.12.2007 | Loss of particular rights, legal effect: designated state(s) | 14.01.2008 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GR, HU, IE, IS, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR | 14.04.2008 | Reply to a communication from the examining division | 30.04.2009 | Despatch of a communication from the examining division (Time limit: M04) | 04.09.2009 | Reply to a communication from the examining division | 23.12.2010 | Communication of intention to grant the patent | 31.03.2011 | Fee for grant paid | 31.03.2011 | Fee for publishing/printing paid | Divisional application(s) | EP08075552.3 / EP1962140 | Opposition(s) | 14.02.2012 | No opposition filed within time limit [2012/16] | Fees paid | Renewal fee | 28.03.2008 | Renewal fee patent year 03 | 16.06.2009 | Renewal fee patent year 04 | 29.06.2010 | Renewal fee patent year 05 |
| Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | IT | 11.05.2011 | NL | 11.05.2011 | GB | 11.08.2011 | [2012/36] |
| Former [2012/23] | IT | 11.05.2011 | |
| NL | 11.05.2011 | ||
| Former [2012/02] | NL | 11.05.2011 | Documents cited: | Search | [Y]EP1420299 (ASML NETHERLANDS BV [NL]); | [Y]US2004160582 (LOF JOERI [NL], et al); | [Y]WO2004086468 (NIPPON KOGAKU KK [JP], et al); | [Y]EP1486828 (ASML NETHERLANDS BV [NL]); | [XAY]US2005007569 (STREEFKERK BOB [NL], et al); | [X]US2005048220 (MERTENS JEROEN JOHANNES SOPHIA [NL], et al); | [Y]WO2005020299 (NIKON CORP [JP], et al); | [A]EP1528431 (NIKON CORP [JP]); | [PY]EP1598855 (NIKON CORP [JP]); | [PY]EP1662554 (NIKON CORP [JP]); | [E]EP1708029 (ASML NETHERLANDS BV [NL]) |