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EP1777321
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EP About this file: EP1777321
| EP1777321 - Sputtering target, transparent conductive oxide, and process for producing the sputtering target [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 26.06.2009 Database last updated on 26.07.2024 | Most recent event Tooltip | 26.06.2009 | Application deemed to be withdrawn | published on 29.07.2009 [2009/31] | Applicant(s) | For all designated states IDEMITSU KOSAN CO., LTD. 1-1, Marunouchi 3-chome Chiyoda-ku Tokyo 100-8321 / JP | [N/P] |
| Former [2007/17] | For all designated states IDEMITSU KOSAN CO., LTD. 1-1, Marunouchi 3-chome, Chiyoda-ku Tokyo 100-8321 / JP | Inventor(s) | 01 /
INOUE, Kazuyoshi 1280, Kamiizumi, Sodegaura-shi Chiba 299-0293 / JP | 02 /
SHIBUYA, Tadao 1280, Kamiizumi Sodegaura-shi, Chiba 299-0293 / JP | 03 /
KAIJO, Akira 1280, Kamiizumi, Sodegaura-shi Chiba 299-0293 / JP | [2007/24] |
| Former [2007/20] | 01 /
INOUE, Kazuyoshi 3-6, Kita-Aoyama 1-chome Minato-ku, Tokyo, Tokyo 107-0061 / JP | ||
| 02 /
SHIBUYA, Tadao 1280, Kamiizumi Sodegaura-shi, Chiba 299-0293 / JP | |||
| 03 /
KAIJO, Akira 1280, Kamiizumi, Sodegaura-shi Chiba 299-0293 / JP | |||
| Former [2007/17] | 01 /
INOUE, Kazuyoshi 3-6, Kita-Aoyama 1-chome Minato-ku, Tokyo, Tokyo 107-0061 / JP | ||
| 02 /
SHIBUYA, Tadao 1280, Kamiizumi Sodegaura-shi, Chiba 299-0293 / JP | |||
| 03 /
KAIJO, Akira 3-6, Kita-Aoyama 1-chome Minato-ku, Tokyo, Tokyo 107-0061 / JP | Representative(s) | Gille Hrabal Partnerschaftsgesellschaft mbB Patentanwälte Brucknerstraße 20 40593 Düsseldorf / DE | [N/P] |
| Former [2008/40] | Gille Hrabal Struck Neidlein Prop Roos Patentanwälte Brucknerstrasse 20 40593 Düsseldorf / DE | ||
| Former [2007/17] | Gille Hrabal Struck Neidlein Prop Roos Patentanwälte Brucknerstrasse 20 40593 Düsseldorf / DE | Application number, filing date | 06122640.3 | 22.11.2000 | [2007/17] | Priority number, date | JP19990333730 | 25.11.1999 Original published format: JP 33373099 | JP19990333731 | 25.11.1999 Original published format: JP 33373199 | JP20000027741 | 04.02.2000 Original published format: JP 2000027741 | JP20000042378 | 21.02.2000 Original published format: JP 2000042378 | JP20000111505 | 13.04.2000 Original published format: JP 2000111505 | JP20000118924 | 20.04.2000 Original published format: JP 2000118924 | [2007/17] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1777321 | Date: | 25.04.2007 | Language: | EN | [2007/17] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.03.2007 | Classification | IPC: | C23C14/34, C04B35/00 | [2007/17] | CPC: |
C23C14/3414 (EP,US);
C23C14/34 (KR);
C04B35/01 (EP,US);
C04B35/453 (EP,US);
C04B35/457 (EP,US);
C04B35/6262 (EP,US);
C04B35/64 (EP,US);
C04B35/6455 (EP,US);
C23C14/086 (EP,US);
C23C14/3407 (EP,US);
C03C2217/211 (EP,US);
C03C2217/216 (EP,US);
C03C2217/23 (EP,US);
C03C2218/154 (EP,US);
C04B2235/3284 (EP,US);
C04B2235/3286 (EP,US);
C04B2235/3293 (EP,US);
C04B2235/44 (EP,US);
C04B2235/441 (EP,US);
C04B2235/443 (EP,US);
C04B2235/449 (EP,US);
C04B2235/5436 (EP,US);
C04B2235/664 (EP,US);
C04B2235/763 (EP,US);
C04B2235/767 (EP,US);
C04B2235/77 (EP,US);
C04B2235/785 (EP,US);
C04B2235/786 (EP,US);
C04B2235/96 (EP,US);
C04B2235/963 (EP,US);
| Designated contracting states | DE, FI, FR, GB, NL [2007/17] | Title | German: | Sputtertarget, transparentes und leitendes Oxid sowie Verfahren zur Herstellung des Sputtertargets | [2007/17] | English: | Sputtering target, transparent conductive oxide, and process for producing the sputtering target | [2007/17] | French: | Cible de pulvérisation cathodique, oxyde transparent conducteur et procédé pour la fabrication de la cible | [2007/17] | Examination procedure | 22.05.2007 | Examination requested [2007/27] | 23.08.2007 | Despatch of a communication from the examining division (Time limit: M04) | 02.10.2007 | Reply to a communication from the examining division | 17.07.2008 | Despatch of a communication from the examining division (Time limit: M06) | 28.01.2009 | Application deemed to be withdrawn, date of legal effect [2009/31] | 10.03.2009 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2009/31] | Parent application(s) Tooltip | EP00977861.4 / EP1233082 | Fees paid | Renewal fee | 20.10.2006 | Renewal fee patent year 03 | 20.10.2006 | Renewal fee patent year 04 | 20.10.2006 | Renewal fee patent year 05 | 20.10.2006 | Renewal fee patent year 06 | 20.10.2006 | Renewal fee patent year 07 | 20.11.2007 | Renewal fee patent year 08 | 21.11.2008 | Renewal fee patent year 09 |
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