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EP1876258
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EP About this file: EP1876258
| EP1876258 - SPUTTERING TARGET [Right-click to bookmark this link] | Status | The application has been refused Status updated on 01.05.2015 Database last updated on 31.08.2024 | Most recent event Tooltip | 01.05.2015 | Refusal of application | published on 03.06.2015 [2015/23] | Applicant(s) | For all designated states JX Nippon Mining & Metals Corporation 6-3, Otemachi 2-chome Chiyoda-ku Tokyo 100-8164 / JP | [2011/39] |
| Former [2008/02] | For all designated states Nippon Mining & Metals Co., Ltd. 10-1, Toranomon 2-chome Minato-ku Tokyo 105-0001 / JP | Inventor(s) | 01 /
MIYASHITA, Hirohito Isohara Fac. of Nippon M&M Co. 187-4, Usuba, Hanakawa-cho, Kitaibaraki-shi Ibaraki 3191535 / JP | [2008/02] | Representative(s) | Hoarton, Lloyd Douglas Charles, et al Forresters IP LLP Skygarden Erika-Mann-Strasse 11 80636 München / DE | [N/P] |
| Former [2012/13] | Hoarton, Lloyd Douglas Charles, et al Forrester & Boehmert SkyGarden Erika-Mann-Strasse 11 80636 München / DE | ||
| Former [2008/44] | Hoarton, Lloyd Douglas Charles Forrester & Boehmert Pettenkoferstrasse 20-22 80336 Munich / DE | ||
| Former [2008/02] | Hoarton, Lloyd Douglas Charles Forrester & Boehmert Pettenkoferstrasse 20-22 80336 München / DE | Application number, filing date | 06730171.3 | 28.03.2006 | [2008/02] | WO2006JP306223 | Priority number, date | JP20050132224 | 28.04.2005 Original published format: JP 2005132224 | [2008/02] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2006117949 | Date: | 09.11.2006 | Language: | JA | [2006/45] | Type: | A1 Application with search report | No.: | EP1876258 | Date: | 09.01.2008 | Language: | EN | [2008/02] | Search report(s) | International search report - published on: | JP | 09.11.2006 | (Supplementary) European search report - dispatched on: | EP | 15.07.2008 | Classification | IPC: | C23C14/34 | [2008/02] | CPC: |
C23C14/3414 (EP,KR,US);
C22C1/02 (KR);
C22C27/02 (KR);
C23C14/14 (KR);
C23C14/54 (KR)
| Designated contracting states | DE, FR [2008/32] |
| Former [2008/02] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | MK | Not yet paid | YU | Not yet paid | Title | German: | SPUTTERTARGET | [2008/02] | English: | SPUTTERING TARGET | [2008/02] | French: | CIBLE DE PULVERISATION | [2008/02] | Entry into regional phase | 26.10.2007 | Translation filed | 26.10.2007 | National basic fee paid | 26.10.2007 | Search fee paid | 26.10.2007 | Designation fee(s) paid | 26.10.2007 | Examination fee paid | Examination procedure | 25.09.2006 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 26.10.2007 | Examination requested [2008/02] | 21.01.2009 | Despatch of a communication from the examining division (Time limit: M06) | 21.05.2009 | Reply to a communication from the examining division | 09.12.2011 | Despatch of a communication from the examining division (Time limit: M04) | 13.04.2012 | Reply to a communication from the examining division | 30.05.2013 | Date of oral proceedings | 12.06.2013 | Despatch of communication that the application is refused, reason: substantive examination [2015/23] | 12.06.2013 | Minutes of oral proceedings despatched | 27.04.2015 | Application refused, date of legal effect [2015/23] | Appeal following examination | 01.08.2013 | Appeal received No. T2252/13 | 18.10.2013 | Statement of grounds filed | 27.04.2015 | Result of appeal procedure: appeal of the applicant withdrawn | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 21.01.2009 | Fees paid | Renewal fee | 14.03.2008 | Renewal fee patent year 03 | 13.03.2009 | Renewal fee patent year 04 | 15.03.2010 | Renewal fee patent year 05 | 15.03.2011 | Renewal fee patent year 06 | 14.03.2012 | Renewal fee patent year 07 | 11.03.2013 | Renewal fee patent year 08 | 12.03.2014 | Renewal fee patent year 09 | 10.03.2015 | Renewal fee patent year 10 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US2002026965 (MICHALUK CHRISTOPHER A [US], et al) [X] 1-5 * paragraph [0051] *; | [X] - WICKERSHAM CHARLES E ET AL, "Tantalum angular sputter emission distributions", COMPENDEX, ENGINEERING INFORMATION, INC., NEW YORK, NY, US, Database accession no. E2005179064023, XP002486593 [X] 1-5 * abstract * | [ ] - JOM; JOM NOVEMBER 2004, (200411), vol. 56, no. 11, page 210 | Examination | WO03025238 | - JIANG A ET AL, "Investigation of the structure of beta-tantalum", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, (20030801), vol. 437, no. 1-2, doi:10.1016/S0040-6090(03)00702-8, ISSN 0040-6090, pages 116 - 122, XP004438583 DOI: http://dx.doi.org/10.1016/S0040-6090(03)00702-8 |