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Extract from the Register of European Patents

EP About this file: EP1851589

EP1851589 - TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY [Right-click to bookmark this link]
Former [2007/45]IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE
[2010/14]
StatusNo opposition filed within time limit
Status updated on  20.05.2011
Database last updated on 31.08.2024
Most recent event   Tooltip04.10.2013Lapse of the patent in a contracting state
New state(s): HU		published on 06.11.2013  [2013/45]
Applicant(s)For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, NY 10504 / US
[N/P]
Former [2007/45]For all designated states
International Business Machines Corporation
New Orchard Road
Armonk, New York 10504 / US
Inventor(s)01 / ALLEN, Robert, David
6186 Calle Del Conejo
San Jose, California 95120 / US
02 / BROCK, Phillip, Joe
757 Carolina Avenue
Sunnyvale, California 94085 / US
03 / GIL, Dario
28 Foxwood Drive, 6
Pleasantville, New York 10570 / US
04 / HINSBERG, William, Dinan
40635 Ladero Street
Fremont, California 94539 / US
05 / LARSON, Carl, Eric
6513 Lovely Creek Court
San Jose, California 95123 / US
06 / SUNDBERG, Linda, Karin
859 University Avenue, 3
Los Gatos, California 95032 / US
07 / WALLRAFF, Gregory, Michael
16925 Del Monte Avenue, 142
Morgan Hill, California 95037 / US
 [2007/45]
Representative(s)Burt, Roger James
IBM United Kingdom Limited Intellectual Property Department Hursley Park Winchester
Hampshire SO21 2JN / GB
[N/P]
Former [2007/45]Burt, Roger James
IBM United Kingdom Limited, Intellectual Property Law, MP 110, Hursley Park, Hursley
Winchester, Hampshire SO21 2JN / GB
Application number, filing date06735757.422.02.2006
[2007/45]
WO2006US06225
Priority number, dateUS2005006394023.02.2005         Original published format: US 63940
[2007/45]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report
No.:WO2006091648
Date:31.08.2006
Language:EN
[2006/35]
Type: A2 Application without search report 
No.:EP1851589
Date:07.11.2007
Language:EN
The application published by WIPO in one of the EPO official languages on 31.08.2006 takes the place of the publication of the European patent application.
[2007/45]
Type: B1 Patent specification 
No.:EP1851589
Date:14.07.2010
Language:EN
[2010/28]
Search report(s)International search report - published on:US22.11.2007
(Supplementary) European search report - dispatched on:EP20.07.2009
ClassificationIPC:G03F7/11, G03F7/20
[2010/14]
CPC:
G03F7/11 (EP,US); G03F7/2041 (EP,US); G03F7/0046 (EP,US);
Y10S430/108 (EP,US); Y10S430/111 (EP,US)
Former IPC [2008/04]G03C1/00
Former IPC [2007/45]G03C1/76
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2007/45]
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
YUNot yet paid
TitleGerman:DECKSCHICHTMATERIALIEN FÜR DIE IMMERSION-LITHOGRAPHIE[2010/14]
English:TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY[2010/14]
French:MATERIAUX POUR COUCHE DE PROTECTION EN LITHOGRAPHIE PAR IMMERSION[2010/14]
Former [2007/45]TAUCHFÄHIGE DECKSCHICHTMATERIALIEN MIT VERBESSERTER LEISTUNG
Former [2007/45]IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE
Former [2007/45]BAIN DE COUCHE DE FINITION A RENDEMENT ACCRU
Entry into regional phase06.09.2007National basic fee paid 
06.09.2007Search fee paid 
06.09.2007Designation fee(s) paid 
06.09.2007Examination fee paid 
Examination procedure06.09.2007Examination requested  [2007/45]
24.08.2009Amendment by applicant (claims and/or description)
22.03.2010Communication of intention to grant the patent
19.05.2010Fee for grant paid
19.05.2010Fee for publishing/printing paid
Opposition(s)15.04.2011No opposition filed within time limit [2011/25]
Fees paidRenewal fee
26.02.2008Renewal fee patent year 03
18.02.2009Renewal fee patent year 04
22.02.2010Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
HU14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
TR14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
IE22.02.2011
LU22.02.2011
CH28.02.2011
LI28.02.2011
MC28.02.2011
[2013/45]
Former [2013/44]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
TR14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
IE22.02.2011
LU22.02.2011
CH28.02.2011
LI28.02.2011
MC28.02.2011
Former [2013/25]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
IE22.02.2011
LU22.02.2011
CH28.02.2011
LI28.02.2011
MC28.02.2011
Former [2012/08]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
IE22.02.2011
CH28.02.2011
LI28.02.2011
MC28.02.2011
Former [2011/48]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
CH28.02.2011
LI28.02.2011
MC28.02.2011
Former [2011/45]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
MC28.02.2011
Former [2011/29]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
IT14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
RO14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
ES25.10.2010
IS14.11.2010
PT15.11.2010
Former [2011/23]AT14.07.2010
BE14.07.2010
CY14.07.2010
CZ14.07.2010
DK14.07.2010
EE14.07.2010
FI14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
SE14.07.2010
SI14.07.2010
SK14.07.2010
BG14.10.2010
GR15.10.2010
IS14.11.2010
PT15.11.2010
Former [2011/19]AT14.07.2010
BE14.07.2010
CY14.07.2010
DK14.07.2010
FI14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
SE14.07.2010
SI14.07.2010
BG14.10.2010
GR15.10.2010
IS14.11.2010
PT15.11.2010
Former [2011/17]AT14.07.2010
BE14.07.2010
CY14.07.2010
FI14.07.2010
LT14.07.2010
LV14.07.2010
NL14.07.2010
PL14.07.2010
SE14.07.2010
SI14.07.2010
BG14.10.2010
GR15.10.2010
IS14.11.2010
PT15.11.2010
Former [2011/09]AT14.07.2010
LT14.07.2010
NL14.07.2010
Documents cited:Search[X]JP2004083900  (CENTRAL GLASS CO LTD) [X] 1,2 * page 29; example 24; table 1 * * page 29, paragraph 140 ** page 27, paragraph 130 *;
 [PX]EP1589377  (SHINETSU CHEMICAL CO [JP]) [PX] 1,2,7-10 * polymer 1; page 14, lines 45-55, paragraph 57 * * page 18, paragraph 63 * * claim 1 * * polymer 1; page 18; table 1 *;
 [E]EP1720067  (CENTRAL GLASS CO LTD [JP]) [E] 1-4,6 * page 13, paragraph 56 * * page 20; example 14; table 3 *
International search[X]US2004131965  (LEE GEUN SU [KR]);
 [X]US2004248034  (HENDERSON CLIFFORD L [US], et al);
 [X]US6861199  (LEE GEUN SU [KR])
by applicantUS5240812
 US5595861
 US5744537
 US5879853
 US6057080
 US6274295
    - L. GEPPERT, "Chip Making's Wet New World", IEEE SPECTRUM, (200405), vol. 41, no. 5, pages 29 - 33
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.