EP1921671 - WAFER LEVEL BURN-IN METHOD AND WAFER LEVEL BURN-IN SYSTEM [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 21.01.2011 Database last updated on 31.08.2024 | Most recent event Tooltip | 21.01.2011 | Withdrawal of application | published on 23.02.2011 [2011/08] | Applicant(s) | For all designated states Panasonic Corporation 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | [N/P] |
Former [2008/47] | For all designated states Panasonic Corporation 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | ||
Former [2008/20] | For all designated states MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 1006, Oaza Kadoma, Kadoma-shi Osaka 571-8501 / JP | Inventor(s) | 01 /
SEGAWA, Terutsugu, c/o Matsushita Electric Industrial Co., Ltd IP Development Center, 7 F Twin 21 OBP Panasonic Tower 2-1-61 Shiromi, Chuo-ku, Osaka 540-6207 / JP | 02 /
SANADA, Minoru, c/o Matsushita Electric Industrial Co., Ltd IP Development Center, 7 F Twin 21 OBP Panasonic Tower 2-1-61 Shiromi, Chuo-ku, Osaka 540-6207 / JP | [2008/20] | Representative(s) | Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstraße 4 80802 München / DE | [N/P] |
Former [2008/20] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Maximilianstrasse 58 80538 München / DE | Application number, filing date | 06746964.3 | 29.05.2006 | [2008/20] | WO2006JP310686 | Priority number, date | JP20050230194 | 09.08.2005 Original published format: JP 2005230194 | [2008/20] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2007017981 | Date: | 15.02.2007 | Language: | JA | [2007/07] | Type: | A1 Application with search report | No.: | EP1921671 | Date: | 14.05.2008 | Language: | EN | [2008/20] | Search report(s) | International search report - published on: | JP | 15.02.2007 | (Supplementary) European search report - dispatched on: | EP | 02.07.2010 | Classification | IPC: | H01L21/00, G01R31/28 | [2010/31] | CPC: |
H01L21/67248 (EP,US);
H01L22/00 (KR);
G01R31/2874 (EP,US);
H01L21/67103 (EP,US);
H01L21/67242 (EP,US);
H01L21/67288 (EP,US)
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Former IPC [2008/20] | H01L21/66 | Designated contracting states | IT, NL [2008/36] |
Former [2008/20] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | MK | Not yet paid | YU | Not yet paid | Title | German: | VERFAHREN UND SYSTEM ZUM BURN-IN AUF WAFEREBENE | [2008/20] | English: | WAFER LEVEL BURN-IN METHOD AND WAFER LEVEL BURN-IN SYSTEM | [2008/20] | French: | PROCÉDÉ DE VITRIFICATION D UN NIVEAU DE GALETTE ET SYSTÈME DE VITRIFICATION DE NIVEAU DE GALETTE | [2008/20] | Entry into regional phase | 29.02.2008 | Translation filed | 29.02.2008 | National basic fee paid | 29.02.2008 | Search fee paid | 29.02.2008 | Designation fee(s) paid | 29.02.2008 | Examination fee paid | Examination procedure | 29.02.2008 | Examination requested [2008/20] | 10.03.2008 | Loss of particular rights, legal effect: designated state(s) | 15.04.2008 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, LT, LU, LV, MC, PL, PT, RO, SE, SI, SK, TR | 17.01.2011 | Application withdrawn by applicant [2011/08] | Fees paid | Renewal fee | 29.02.2008 | Renewal fee patent year 03 | 29.05.2009 | Renewal fee patent year 04 | 28.05.2010 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]JPH10256325 (ORION MACHINERY CO LTD) [X] 1-20 * abstract *; | [X]EP0915499 (TOKYO ELECTRON LTD [JP]) [X] 1-20 * paragraph [0057] - paragraph [0077]; figures 7, 8a-8c *; | [X]EP1174723 (TOKYO ELECTRON LTD [JP]) [X] 1-20* paragraph [0034] - paragraph [0041]; figures 1-3 * |