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Extract from the Register of European Patents

EP About this file: EP1949460

EP1949460 - METHOD FOR FABRICATING HIGH-QUALITY SEMICONDUCTOR LIGHT-EMITTING DEVICES ON SILICON SUBSTRATES [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  07.09.2012
Database last updated on 12.11.2024
Most recent event   Tooltip07.09.2012Withdrawal of applicationpublished on 10.10.2012  [2012/41]
Applicant(s)For all designated states
Lattice Power (Jiangxi) Corporation
Institute of Materials Science North Area of Nanchang University No. 235 East Nanjin Road
Nanchang, Jiangxi 330047 / CN
[2008/31]
Inventor(s)01 / JIANG, Fengyi
Institute of Material Science North Area of Nanchang University No. 235, East Nanjing Road Nanchang
Jiangxi 330047 / CN
02 / SHAO, Bilin
Institute of Material Science North Area of Nanchang University No. 235, East Nanjing Road Nanchang
Jiangxi 330047 / CN
03 / WANG, Li
Institute of Material Science North Area of Nanchang University No. 235, East Nanjing Road Nanchang
Jiangxi 330047 / CN
04 / FANG, Wenqing
Institute of Material Science North Area of Nanchang University No. 235, East Nanjing Road Nanchang
Jiangxi 330047 / CN
 [2008/31]
Representative(s)Davies, Simon Robert
D Young & Co LLP
120 Holborn
London EC1N 2DY / GB
[N/P]
Former [2008/31]Davies, Simon Robert
D Young & Co 120 Holborn
London, EC1N 2DY / GB
Application number, filing date06817841.717.11.2006
[2008/31]
WO2006CN03098
Priority number, dateCN2005111056617.11.2005         Original published format: CN200510110566
[2008/31]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2007056956
Date:24.05.2007
Language:EN
[2007/21]
Type: A1 Application with search report 
No.:EP1949460
Date:30.07.2008
Language:EN
The application published by WIPO in one of the EPO official languages on 24.05.2007 takes the place of the publication of the European patent application.
[2008/31]
Search report(s)International search report - published on:CN24.05.2007
ClassificationIPC:H01L33/00
[2008/31]
CPC:
H01L33/0066 (EP,US); H01L21/02381 (EP,US); H01L21/02433 (EP,US);
H01L21/02458 (EP,US); H01L21/02472 (EP,US); H01L21/02491 (EP,US);
H01L21/02502 (EP,US); H01L21/02505 (EP,US); H01L21/0254 (EP,US);
H01L21/02554 (EP,US); H01L21/02565 (EP,US); H01L33/0087 (EP,US);
H01L33/12 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2008/31]
TitleGerman:VERFAHREN ZUR HERSTELLUNG VON QUALITATIV HOCHWERTIGEN HALBLEITER-LEUCHTBAUELEMENTEN AUF SILIZIUMSUBSTRATEN[2008/31]
English:METHOD FOR FABRICATING HIGH-QUALITY SEMICONDUCTOR LIGHT-EMITTING DEVICES ON SILICON SUBSTRATES[2008/31]
French:PROCEDE DE FABRICATION DE DELS A SEMI-CONDUCTEURS DE HAUTE QUALITE, SUR DES SUBSTRATS DE SILICIUM[2008/31]
Entry into regional phase20.05.2008National basic fee paid 
20.05.2008Search fee paid 
20.05.2008Designation fee(s) paid 
20.05.2008Examination fee paid 
Examination procedure19.05.2008Amendment by applicant (claims and/or description)
20.05.2008Examination requested  [2008/31]
14.08.2012Application withdrawn by applicant  [2012/41]
Fees paidRenewal fee
20.11.2008Renewal fee patent year 03
17.11.2009Renewal fee patent year 04
15.11.2010Renewal fee patent year 05
28.11.2011Renewal fee patent year 06
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Cited inInternational search[A]JP2004207508  (SHINETSU HANDOTAI KK);
 [A]CN1667849  (SHINETSU SEMICONDUCTOR CO LTD [JP]);
 [A]CN1159251  (UNIV OF CENTRAL FLORIDA [US])
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.