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Extract from the Register of European Patents

EP About this file: EP1783813

EP1783813 - Frequency based controlling of microwave plasma process [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  15.01.2010
Database last updated on 18.09.2024
Most recent event   Tooltip15.01.2010Application deemed to be withdrawnpublished on 17.02.2010  [2010/07]
Applicant(s)For all designated states
Ohmi, Tadahiro
1-17-301, Komegafukuro 2-chome
Aoba-ku
Sendai-shi
Miyagi 980-0813 / JP
For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome Minato-ku
Tokyo 107-8481 / JP
[N/P]
Former [2007/19]For all designated states
OHMI, Tadahiro
1-17-301, Komegafukuro 2-chome, Aoba-ku Sendai-shi
Miyagi 980-0813 / JP
For all designated states
TOKYO ELECTRON LIMITED
3-6 Akasaka 5-chome Minato-ku
Tokyo 107-8481 / JP
Inventor(s)01 / Ohmi, Tadahiro
1-17-301, Komegafukuro 2-chome Aoba-ku
Sendai-shi Miyagi 980-0813 / JP
02 / Hirayama, Masaki Graduate School of Engineering
Tohoku University 05, Aza-Aoba Aramaki Aoba-ku
Sendai-Shi Miyagi 980-8579 / JP
03 / Sugawa, Shigetoshi Graduate School of Engineer.
Tohoku University 05, Aza-Aoba Aramaki Aoba-ku
Sendai-Shi Miyagi 980-8579 / JP
04 / Goto, Tetsuya Graduate School of Engineering
Tohoku University 05, Aza-Aoba Aramaki Aoba-ku
Sendai-Shi Miyagi 980-8579 / JP
 [2007/19]
Representative(s)Liesegang, Eva
Boehmert & Boehmert
Anwaltspartnerschaft mbB
Pettenkoferstrasse 22
80336 München / DE
[N/P]
Former [2007/19]Liesegang, Eva
Forrester & Boehmert, Pettenkoferstrasse 20-22
80336 München / DE
Application number, filing date07000526.928.03.2002
[2007/19]
Priority number, dateJP2001009427828.03.2001         Original published format: JP 2001094278
[2007/19]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP1783813
Date:09.05.2007
Language:EN
[2007/19]
Search report(s)(Supplementary) European search report - dispatched on:EP05.04.2007
ClassificationIPC:H01J37/32
[2007/19]
CPC:
H01J37/32266 (EP,US); H05H1/18 (KR); H01J37/32192 (EP,US);
H01J37/32954 (EP,US); H01J37/3299 (EP,US)
Designated contracting statesDE,   FR,   IT [2007/19]
TitleGerman:Frequenzbasierte Kontrolle eines mikrowellenangeregten Plasmaprozesses[2007/19]
English:Frequency based controlling of microwave plasma process[2007/19]
French:Contrôle d'un processus à plasma à base de la fréquence des micro-ondes[2007/19]
Examination procedure02.05.2007Examination requested  [2007/24]
18.06.2007Despatch of a communication from the examining division (Time limit: M06)
18.12.2007Reply to a communication from the examining division
03.04.2008Despatch of a communication from the examining division (Time limit: M04)
14.07.2008Reply to a communication from the examining division
12.08.2008Despatch of a communication from the examining division (Time limit: M04)
03.12.2008Reply to a communication from the examining division
14.04.2009Communication of intention to grant the patent
25.08.2009Application deemed to be withdrawn, date of legal effect  [2010/07]
30.09.2009Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2010/07]
Parent application(s)   TooltipEP02707231.3  / EP1377138
Fees paidRenewal fee
11.01.2007Renewal fee patent year 03
11.01.2007Renewal fee patent year 04
11.01.2007Renewal fee patent year 05
11.01.2007Renewal fee patent year 06
14.03.2008Renewal fee patent year 07
13.03.2009Renewal fee patent year 08
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Documents cited:Search[A]US4898118  (MURAKAMI TSUTOMU [JP], et al) [A] 2,3,5,6,10-12 * column 3, line 36 - column 6, line 24; compound - *;
 [A]JPH02281600  (HITACHI LTD) [A] 1,7* abstract *;
 [A]EP0415122  (MORI YUZO [JP], et al) [A] 2,3,5,6,10-12 * page 5, line 7 - line 35; figure - *;
 [X]EP0481198  (IBM [US]) [X] 1,7 * column 3, line 41 - column 4, line 25 * * figure 1 *;
 [A]JP2000299198  (TOKYO ELECTRON LTD, et al) [A] 2,3,5,6,10-12 * abstract *;
 [X]WO0106268  (TOKYO ELECTRON LTD [JP], et al) [X] 1-12 * abstract * * title; page 1 - page 4 * * pages 8,11 * * figure 1 *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.