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EP2031633
European procedure
Extract from the Register of European Patents
EP About this file: EP2031633
| EP2031633 - Charged particle device with a gas ion source with high mechanical stability [Right-click to bookmark this link] | |||
| Former [2009/10] | Gas ion source with high mechanical stability | ||
| [2012/10] | Status | No opposition filed within time limit Status updated on 26.07.2013 Database last updated on 09.04.2026 | Most recent event Tooltip | 26.07.2013 | No opposition filed within time limit | published on 28.08.2013 [2013/35] | Applicant(s) | For all designated states ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ammerthalstrasse 20 85551 Heimstetten / DE | [2009/10] | Inventor(s) | 01 /
Winkler, Dieter Stademannstrasse 6 81737 München / DE | 02 /
Jasinski, Thomas Rubenstrasse 22 81245 München / DE | [2009/10] | Representative(s) | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [N/P] |
| Former [2009/10] | Zimmermann, Gerd Heinrich, et al Zimmermann & Partner Postfach 330 920 80069 München / DE | Application number, filing date | 07016766.3 | 27.08.2007 | [2009/10] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2031633 | Date: | 04.03.2009 | Language: | EN | [2009/10] | Type: | B1 Patent specification | No.: | EP2031633 | Date: | 19.09.2012 | Language: | EN | [2012/38] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 08.05.2008 | Classification | IPC: | H01J37/28, H01J37/08, F25D19/00 | [2012/10] | CPC: |
F25D19/006 (EP,US);
H01J27/26 (EP,US);
H01J37/08 (EP,US);
H01J37/28 (EP,US);
F25B2500/13 (EP,US);
H01J2237/002 (EP,US);
H01J2237/0216 (EP,US);
H01J2237/061 (EP,US);
H01J2237/0807 (EP,US);
Y10T29/49826 (EP,US)
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| Former IPC [2009/10] | H01J37/08 | Designated contracting states | DE, NL [2009/46] |
| Former [2009/10] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR | Title | German: | Teilchenstrahlgerät mit einer Gas-Ionen-Quelle mit hoher mechanischer Stabilität | [2012/10] | English: | Charged particle device with a gas ion source with high mechanical stability | [2012/10] | French: | Dispositif à particules chargées comprenant une source ionique à gaz ayant une stabilité mécanique élévée | [2012/10] |
| Former [2009/10] | Gas-Ionen-Quelle mit hoher mechanischer Stabilität | ||
| Former [2009/10] | Gas ion source with high mechanical stability | ||
| Former [2009/10] | Stabilité mécanique élévée d'une source ionique à gaz | Examination procedure | 13.08.2009 | Amendment by applicant (claims and/or description) | 13.08.2009 | Examination requested [2009/39] | 05.09.2009 | Loss of particular rights, legal effect: designated state(s) | 13.10.2009 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, PL, PT, RO, SE, SI, SK, TR | 08.10.2010 | Despatch of a communication from the examining division (Time limit: M04) | 08.02.2011 | Reply to a communication from the examining division | 19.10.2011 | Despatch of a communication from the examining division (Time limit: M04) | 19.12.2011 | Reply to a communication from the examining division | 29.02.2012 | Communication of intention to grant the patent | 28.06.2012 | Fee for grant paid | 28.06.2012 | Fee for publishing/printing paid | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 08.10.2010 | Opposition(s) | 20.06.2013 | No opposition filed within time limit [2013/35] | Fees paid | Renewal fee | 07.08.2009 | Renewal fee patent year 03 | 06.08.2010 | Renewal fee patent year 04 | 08.08.2011 | Renewal fee patent year 05 | 08.08.2012 | Renewal fee patent year 06 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A] WO9828776 (PHILIPS ELECTRONICS NV et al.) [A] 5-7,9 * page 6, lines 22-25 * | [XY] WILBERTZ C ET AL: "RECENT PROGRESS IN GAS FIELD ION SOURCE TECHNOLOGY", PROCEEDINGS OF THE SPIE, SPIE, BELLINGHAM, VA, US, vol. 2194, 1994, pages 407 - 417, XP008043021, ISSN: 0277-786X [X] 1-4,13-18 * figure 5 * [Y] 5-7,9 DOI: http://dx.doi.org/10.1117/12.175829 | [X] WILBERTZ C ET AL: "A FOCUSED GAS-ION BEAM SYSTEM FOR SUBMICRON APPLICATION", NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, SECTION - B: BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ELSEVIER, AMSTERDAM, NL, vol. B63, no. 1/2, January 1992 (1992-01-01), pages 120 - 124, XP008043027, ISSN: 0168-583X [X] 1,4 * page 123, column 2, lines 30-35 * DOI: http://dx.doi.org/10.1016/0168-583X(92)95180-Y | [Y] EADES J A ET AL: "A helium-cooled specimen stage for electron microscopy", JOURNAL OF PHYSICS E. SCIENTIFIC INSTRUMENTS, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, vol. 15, no. 2, 1 February 1982 (1982-02-01), pages 184 - 186, XP020016757, ISSN: 0022-3735 [Y] 5-7,9 * figure 1 * DOI: http://dx.doi.org/10.1088/0022-3735/15/2/010 | [A] BOTT M ET AL: "DESIGN PRINCIPLES OF A VARIABLE TEMPERATURE SCANNING TUNNELING MICROSCOPE", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 66, no. 8, 1 August 1995 (1995-08-01), pages 4135 - 4139, XP000525607, ISSN: 0034-6748 [A] 5-7,9 * page 4135, column 2, lines 32-40 * DOI: http://dx.doi.org/10.1063/1.1145360 | [A] HARIDAS M M ET AL: "Cryogenic-Scanning Electron Microscopy as a Technique to Image Sol-to-Gel Transformation in Chelated Alkoxide Systems", CERAMICS INTERNATIONAL, ELSEVIER, AMSTERDAM, NL, vol. 22, no. 2, 1996, pages 155 - 159, XP004040532, ISSN: 0272-8842 [A] 5-7,9 * page 157, column 1, lines 40-49 * DOI: http://dx.doi.org/10.1016/0272-8842(95)00073-9 | [A] HANSON G R ET AL: "H2 and rare gas field ion source with high angular current", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, NEW YORK, NY, US, vol. 16, no. 6, November 1979 (1979-11-01), pages 1875 - 1878, XP007903682, ISSN: 0022-5355 [A] * figure 1 * DOI: http://dx.doi.org/10.1116/1.570317 | [X] ORLOFF J ET AL: "Angular intensity of a gas-phase field ionization source", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 50, no. 9, September 1979 (1979-09-01), pages 6026 - 6027, XP007903677, ISSN: 0021-8979 [X] 11,13,14 * figure 1 * DOI: http://dx.doi.org/10.1063/1.326679 | Examination | DE4133121 |