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EP1906248
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EP About this file: EP1906248
| EP1906248 - Resist composition and pattern forming method using the same [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 05.04.2015 Database last updated on 16.11.2024 | Most recent event Tooltip | 05.04.2015 | Application deemed to be withdrawn | published on 06.05.2015 [2015/19] | Applicant(s) | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | [N/P] |
| Former [2008/14] | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | Inventor(s) | 01 /
Kamimura, Sou c/o Fujifilm Corporation 4000, Kawashiri, Yoshida-cho Haibara-gun Shizuoka / JP | 02 /
Wada, Kenji c/o Fujifilm Corporation 4000, Kawashiri, Yoshida-cho Haibara-gun Shizuoka / JP | [2014/32] |
| Former [2008/14] | 01 /
Kamimura, Sou c/o Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | ||
| 02 /
Wada, Kenji c/o Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
| Former [2008/14] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 07019182.0 | 28.09.2007 | [2008/14] | Priority number, date | JP20060264821 | 28.09.2006 Original published format: JP 2006264821 | [2008/14] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP1906248 | Date: | 02.04.2008 | Language: | EN | [2008/14] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 26.02.2008 | Classification | IPC: | G03F7/039, G03F7/004 | [2008/14] | CPC: |
G03F7/0045 (EP,KR,US);
G03F7/039 (KR);
G03F7/0392 (EP,KR,US);
G03F7/0397 (EP,KR,US);
Y10S430/12 (EP,KR,US);
Y10S430/122 (EP,KR,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR [2008/14] | Title | German: | Resistzusammensetzung und Verfahren zur Strukturformung damit | [2008/14] | English: | Resist composition and pattern forming method using the same | [2008/14] | French: | Composition de réserve et procédé de formation de motifs l'utilisant | [2008/14] | Examination procedure | 17.09.2008 | Amendment by applicant (claims and/or description) | 23.09.2008 | Examination requested [2008/45] | 08.07.2014 | Communication of intention to grant the patent | 19.11.2014 | Application deemed to be withdrawn, date of legal effect [2015/19] | 23.12.2014 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2015/19] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 08.07.2014 | Fees paid | Renewal fee | 25.09.2009 | Renewal fee patent year 03 | 22.09.2010 | Renewal fee patent year 04 | 27.09.2011 | Renewal fee patent year 05 | 17.09.2012 | Renewal fee patent year 06 | 23.09.2013 | Renewal fee patent year 07 | Penalty fee | Additional fee for renewal fee | 30.09.2014 | 08 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]US2003207201 (HATAKEYAMA JUN [JP], et al) [A] 1-7* pages 3-6; claim - *; | [X]EP1635218 (FUJI PHOTO FILM CO LTD [JP]) [X] 1-7 * page 11, compound A-8 * * page 54, resin RA-9 * * page 57; example 9; table 2 *; | [A]EP1701214 (FUJI PHOTO FILM CO LTD [JP]) [A] 1-7 * page 27, compound A2-II-17 * * page 37, lines 15-20 * * page 40; example 2; table 1 * |