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Extract from the Register of European Patents

EP About this file: EP1820881

EP1820881 - Low-K dielectric layers for large substrates [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  30.07.2010
Database last updated on 13.09.2024
Most recent event   Tooltip30.07.2010Application deemed to be withdrawnpublished on 01.09.2010  [2010/35]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[N/P]
Former [2007/34]For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
Inventor(s)01 / Stowell, Michael W.
809 White Elm Drive
Loveland, 80538 / US
02 / Dieguez-Campo, Jose M.
Sandgasse 59
63457, Hanau / DE
03 / Liehr, Michael
Friedhofstrasse 27
36325, Feldatal / DE
 [2007/34]
Representative(s)Schickedanz, Willi
Langener Strasse 68
63073 Offenbach / DE
[2007/34]
Application number, filing date07101507.731.01.2007
[2007/34]
Priority number, dateUS20060772593P10.02.2006         Original published format: US 772593 P
US2006055821709.11.2006         Original published format: US 558217
[2007/34]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP1820881
Date:22.08.2007
Language:EN
[2007/34]
Type: A3 Search report 
No.:EP1820881
Date:12.12.2007
[2007/50]
Search report(s)(Supplementary) European search report - dispatched on:EP12.11.2007
ClassificationIPC:C23C16/46, H01J17/49
[2007/34]
CPC:
C23C16/0227 (EP,KR,US); C23C16/46 (EP,KR,US); C23C16/402 (EP,KR,US);
C23C16/50 (EP,KR,US); H01J11/12 (EP,KR,US); H01J11/38 (EP,KR,US);
H01J9/02 (EP,KR,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2007/34]
TitleGerman:Low-K-Dielektrikschichten für grossflächige Substrate[2007/34]
English:Low-K dielectric layers for large substrates[2007/34]
French:Couches diélectriques à faible K pour substrats de grande taille[2007/34]
Examination procedure15.04.2008Examination requested  [2008/22]
21.05.2008Despatch of a communication from the examining division (Time limit: M04)
24.09.2008Reply to a communication from the examining division
27.10.2009Despatch of a communication from the examining division (Time limit: M04)
09.03.2010Application deemed to be withdrawn, date of legal effect  [2010/35]
16.04.2010Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2010/35]
Fees paidRenewal fee
14.01.2009Renewal fee patent year 03
22.01.2010Renewal fee patent year 04
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Documents cited:Search[X]US2004185668  (MORITA NOBORU [JP], et al) [X] 1-6,8-12 * page 8, paragraph 160 - paragraph 166; figure 1; claims 1,7 * * page 7, paragraph 126 - paragraph 129 * * page 3, paragraph 54 - paragraph 55 *;
 [A]US2005255257  (CHOI SOO Y [US], et al) [A] 1-6,8-12 * page 17; example 4; claims 1,2; tables 16,17 ** page 9, paragraph 126 *
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