blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News Flashes

New version of the European Patent Register – SPC proceedings information in the Unitary Patent Register.

2024-07-24

More...
blank Related links

Release notes
European Patent Register Assistant
European Patent Register Resource Book
European Patent Register – pocket guide
FAQ - European Patent Register
FAQ - Register Alert
Federated Register (Flyer)
Global Dossier (Flyer)
Register events
Deep link coverage
Federated Register content
The Patent Information Tour
Fair use charter

Extract from the Register of European Patents

EP About this file: EP1995767

EP1995767 - PROJECTION OPTICAL SYSTEM, ALIGNER AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  22.06.2018
Database last updated on 26.07.2024
FormerThe patent has been granted
Status updated on  14.07.2017
FormerGrant of patent is intended
Status updated on  01.03.2017
FormerExamination is in progress
Status updated on  18.11.2016
Most recent event   Tooltip26.06.2020Lapse of the patent in a contracting state
New state(s): CY		published on 29.07.2020  [2020/31]
Applicant(s)For all designated states
Nikon Corporation
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
[2015/36]
Former [2010/30]For all designated states
Nikon Corporation
12-1, Yurakucho 1-chome Chiyoda-ku
Tokyo 100-8331 / JP
Former [2008/48]For all designated states
Nikon Corporation
2-3, Marunouchi 3-chome, Chiyoda-ku
Tokyo 100-8331 / JP
Inventor(s)01 / MURAKAMI, Katsuhiko
c/o NIKON CORPORATION
2-3, Marunouchi 3-chome
Chiyoda-ku
Tokyo 100-8331 / JP
02 / KOMIYA, Takaharu
c/o NIKON CORPORATION
2-3, Marunouchi 3-chome
Chiyoda-ku
Tokyo 100-8331 / JP
 [2017/33]
Former [2008/48]01 / MURAKAMI, Katsuhiko
c/o NIKON CORPORATION 2-3, Marunouchi 3-chome Chiyoda-ku
Tokyo 100-8331 / JP
02 / KOMIYA, Takaharu
c/o NIKON CORPORATION 2-3, Marunouchi 3-chome Chiyoda-ku
Tokyo 100-8331 / JP
Representative(s)Hooiveld, Arjen Jan Winfried, et al
Arnold & Siedsma
Bezuidenhoutseweg 57
2594 AC The Hague / NL
[2017/33]
Former [2008/48]Hooiveld, Arjen Jan Winfried, et al
Arnold & Siedsma Sweelinckplein 1
2517 GK Den Haag / NL
Application number, filing date07714302.215.02.2007
[2008/48]
WO2007JP52772
Priority number, dateJP2006006658310.03.2006         Original published format: JP 2006066583
[2008/48]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2007105406
Date:20.09.2007
Language:JA
[2007/38]
Type: A1 Application with search report 
No.:EP1995767
Date:26.11.2008
Language:EN
[2008/48]
Type: B1 Patent specification 
No.:EP1995767
Date:16.08.2017
Language:EN
[2017/33]
Search report(s)International search report - published on:JP20.09.2007
(Supplementary) European search report - dispatched on:EP06.09.2010
ClassificationIPC:H01L21/027, G02B13/14, G02B13/24, G02B17/00, G03F7/20
[2008/48]
CPC:
G02B17/0663 (EP); G02B5/0891 (EP); G03F7/70941 (EP);
G03F7/70983 (EP); G21K1/062 (EP)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2017/33]
Former [2008/48]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
Extension statesALNot yet paid
BANot yet paid
HRNot yet paid
MKNot yet paid
RSNot yet paid
TitleGerman:OPTISCHES PROJEKTIONSSYSTEM, AUSRICHTVORRICHTUNG UND VERFAHREN ZUM HERSTELLEN VON HALBLEITERBAUELEMENTEN[2008/48]
English:PROJECTION OPTICAL SYSTEM, ALIGNER AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE[2008/48]
French:SYSTEME OPTIQUE DE PROJECTION, ALIGNEUR ET PROCEDE DE FABRICATION D'UN DISPOSITIF A SEMI-CONDUCTEURS[2008/48]
Entry into regional phase28.08.2008Translation filed 
28.08.2008National basic fee paid 
28.08.2008Search fee paid 
28.08.2008Designation fee(s) paid 
28.08.2008Examination fee paid 
Examination procedure28.08.2008Examination requested  [2008/48]
21.03.2011Amendment by applicant (claims and/or description)
12.05.2011Despatch of a communication from the examining division (Time limit: M04)
09.09.2011Reply to a communication from the examining division
26.06.2012Despatch of a communication from the examining division (Time limit: M06)
03.01.2013Reply to a communication from the examining division
05.12.2014Despatch of a communication from the examining division (Time limit: M06)
02.06.2015Reply to a communication from the examining division
12.07.2016Communication of intention to grant the patent
11.11.2016Fee for grant paid
11.11.2016Fee for publishing/printing paid
14.11.2016Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO
29.11.2016Despatch of a communication from the examining division (Time limit: M02)
24.01.2017Reply to a communication from the examining division
09.03.2017Communication of intention to grant the patent
06.07.2017Receipt of the translation of the claim(s)
Divisional application(s)EP17180354.7  / EP3264444
The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  12.05.2011
Opposition(s)17.05.2018No opposition filed within time limit [2018/30]
Fees paidRenewal fee
28.08.2008Renewal fee patent year 03
26.02.2010Renewal fee patent year 04
23.02.2011Renewal fee patent year 05
28.02.2012Renewal fee patent year 06
25.02.2013Renewal fee patent year 07
25.02.2014Renewal fee patent year 08
24.02.2015Renewal fee patent year 09
24.02.2016Renewal fee patent year 10
10.02.2017Renewal fee patent year 11
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU15.02.2007
AT16.08.2017
CY16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
PT16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
TR16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
GB15.02.2018
IE15.02.2018
LU15.02.2018
BE28.02.2018
CH28.02.2018
FR28.02.2018
LI28.02.2018
[2020/31]
Former [2020/27]HU15.02.2007
AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
PT16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
TR16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
GB15.02.2018
IE15.02.2018
LU15.02.2018
BE28.02.2018
CH28.02.2018
FR28.02.2018
LI28.02.2018
Former [2020/16]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
TR16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
GB15.02.2018
IE15.02.2018
LU15.02.2018
BE28.02.2018
CH28.02.2018
FR28.02.2018
LI28.02.2018
Former [2019/12]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
GB15.02.2018
IE15.02.2018
LU15.02.2018
BE28.02.2018
CH28.02.2018
FR28.02.2018
LI28.02.2018
Former [2019/09]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
IE15.02.2018
LU15.02.2018
CH28.02.2018
LI28.02.2018
Former [2018/52]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
LU15.02.2018
CH28.02.2018
LI28.02.2018
Former [2018/51]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
CH28.02.2018
LI28.02.2018
Former [2018/44]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
MC16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/39]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SI16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/24]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
IT16.08.2017
LT16.08.2017
LV16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/23]AT16.08.2017
CZ16.08.2017
DK16.08.2017
EE16.08.2017
ES16.08.2017
FI16.08.2017
LT16.08.2017
LV16.08.2017
PL16.08.2017
RO16.08.2017
SE16.08.2017
SK16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/21]AT16.08.2017
CZ16.08.2017
DK16.08.2017
ES16.08.2017
FI16.08.2017
LT16.08.2017
LV16.08.2017
PL16.08.2017
SE16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/12]AT16.08.2017
ES16.08.2017
FI16.08.2017
LT16.08.2017
LV16.08.2017
PL16.08.2017
SE16.08.2017
BG16.11.2017
GR17.11.2017
IS16.12.2017
Former [2018/10]AT16.08.2017
FI16.08.2017
LT16.08.2017
SE16.08.2017
Former [2018/09]FI16.08.2017
LT16.08.2017
SE16.08.2017
Former [2018/08]FI16.08.2017
LT16.08.2017
Former [2018/07]LT16.08.2017
Documents cited:Search   [ ] - No further relevant documents disclosed
International search[A]JP2004260043  (NIKON CORP);
 [A]JPH11219900  (NIKON CORP);
 [A]JP2004031958  (NIKON CORP);
 [A]JP2004363571  (CANON KK)
ExaminationEP1496521
by applicantJP2003014893
 JPH06148399
 JP2004260043
    - TICHENOR ET AL., PROCEEDINGS SPIE, (1995), vol. 2437, page 292
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.