Extract from the Register of European Patents

EP About this file: EP2064731

EP2064731 - METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES [Right-click to bookmark this link]
Former [2009/23]SEMICONDUCTOR DEVICES AND MANUFACTURING METHOD THEREOF
[2009/35]
StatusNo opposition filed within time limit
Status updated on  11.02.2011
Database last updated on 26.03.2026
Most recent event   Tooltip11.02.2011No opposition filed within time limitpublished on 16.03.2011  [2011/11]
Applicant(s)For all designated states
TOYOTA JIDOSHA KABUSHIKI KAISHA
1 Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
[N/P]
Former [2010/26]For all designated states
Toyota Jidosha Kabushiki Kaisha
1, Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
Former [2009/23]For all designated states
Toyota Jidosha Kabushiki Kaisha
1, Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
For all designated states
Osaka University
1-1, Yamadaoka Suita-shi
Osaka 565-0871 / JP
Inventor(s)01 / KAWAHASHI, Akira
c/o TOYOTA JIDOSHA KABUSHIKI KAISHA, 1, Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
02 / SUGIMOTO, Masahiro
c/o TOYOTA JIDOSHA KABUSHIKI KAISHA, 1, Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
03 / SEKI, Akinori
c/o TOYOTA JIDOSHA KABUSHIKI KAISHA, 1, Toyota-cho
Toyota-shi, Aichi 471-8571 / JP
04 / MAEDA, Masakatsu
c/o OSAKA UNIVERSITY, 1-1, Yamadaoka
Suita-shi, Osaka 565-0871 / JP
05 / TAKAHASHI, Yasuo
c/o OSAKA UNIVERSITY, 1-1, Yamadaoka
Suita-shi, Osaka 565-0871 / JP
 [2009/23]
Representative(s)Winter, Brandl - Partnerschaft mbB
Alois-Steinecker-Straße 22
85354 Freising / DE
[N/P]
Former [2009/23]Winter, Brandl, Fürniss, Hübner Röss, Kaiser, Polte Partnerschaft Patent- und Rechtsanwaltskanzlei
Alois-Steinecker-Strasse 22
85354 Freising / DE
Application number, filing date07828876.821.09.2007
[2009/23]
WO2007JP69135
Priority number, dateJP2006025670522.09.2006         Original published format: JP 2006256705
JP2006025670622.09.2006         Original published format: JP 2006256706
[2009/23]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2008035822
Date:27.03.2008
Language:EN
[2008/13]
Type: A1 Application with search report 
No.:EP2064731
Date:03.06.2009
Language:EN
The application published by WIPO in one of the EPO official languages on 27.03.2008 takes the place of the publication of the European patent application.
[2009/23]
Type: B1 Patent specification 
No.:EP2064731
Date:07.04.2010
Language:EN
[2010/14]
Search report(s)International search report - published on:EP27.03.2008
ClassificationIPC:H01L21/28, H01L29/45, H01L29/78, H01L29/24
[2009/23]
CPC:
H10D30/66 (EP,US); H10D30/60 (EP,US); H10D64/62 (EP,US);
H10P30/2042 (EP,US); H10P30/21 (EP,US); H10D62/8325 (EP,US);
Y10S438/931 (EP) (-)
Designated contracting statesDE,   FR [2010/12]
Former [2010/09]BE,  DE,  FR 
Former [2009/30]DE,  FR 
Former [2009/23]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MT,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:HERSTELLUNGSVERFAHREN FÜR HALBLEITERBAUELEMENTE[2009/35]
English:METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES[2009/35]
French:PROCÉDÉ DE FABRICATION DE DISPOSITIFS À SEMI-CONDUCTEUR[2009/35]
Former [2009/23]HALBLEITERBAUELEMENTE UND HERSTELLUNGSVERFAHREN DAFÜR
Former [2009/23]SEMICONDUCTOR DEVICES AND MANUFACTURING METHOD THEREOF
Former [2009/23]DISPOSITIFS À SEMI-CONDUCTEUR ET LEUR PROCÉDÉ DE FABRICATION
Entry into regional phase12.03.2009National basic fee paid 
12.03.2009Designation fee(s) paid 
12.03.2009Examination fee paid 
Examination procedure12.03.2009Amendment by applicant (claims and/or description)
12.03.2009Examination requested  [2009/23]
30.09.2009Communication of intention to grant the patent
09.02.2010Fee for grant paid
09.02.2010Fee for publishing/printing paid
Opposition(s)10.01.2011No opposition filed within time limit [2011/11]
Fees paidRenewal fee
21.09.2009Renewal fee patent year 03
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Cited inInternational search[A]   JOHNSON BRIAN J ET AL: "Mechanism of ohmic behavior of Al/Ti contacts to p-type 4H-SiC after annealing", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 95, no. 10, 15 May 2004 (2004-05-15), pages 5616 - 5620, XP012066622, ISSN: 0021-8979 [A] 1,5,6,9 * figure 1c *

DOI:   http://dx.doi.org/10.1063/1.1707215
 [X]   GUO HUI ET AL: "Ti-Al based ohmic contacts to n-type 6H-SiC with P+ ion implantation", CHINESE PHYSICS, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, US, vol. 15, no. 9, 1 September 2006 (2006-09-01), pages 2142 - 2145, XP020106356, ISSN: 1009-1963 [X] 10-12 * page 2144, column R *

DOI:   http://dx.doi.org/10.1088/1009-1963/15/9/039
 [X]   PECZ B ET AL: "Ti3SiC2 formed in annealed Al/Ti contacts to p-type SiC", APPL SURF SCI; APPLIED SURFACE SCIENCE FEB 15 2003, vol. 206, no. 1-4, 15 February 2003 (2003-02-15), pages 8 - 11, XP002462221 [X] 10-12 * figure 2 *

DOI:   http://dx.doi.org/10.1016/S0169-4332(02)01195-9
 [X]   TSUKIMOTO S ET AL: "Correlation between the electrical properties and the interfacial microstructures of TiAl-based ohmic contacts to p-type 4H-SiC", J ELECTRON MATER; JOURNAL OF ELECTRONIC MATERIALS MAY 2004, vol. 33, no. 5, May 2004 (2004-05-01), pages 460 - 466, XP008086767 [X] 10-12 * page 563, column R *

DOI:   http://dx.doi.org/10.1007/s11664-004-0203-x
 [PX]   GAO M ET AL: "Role of interface layers and localized states in TiAl-based Ohmic contacts to p-type 4H-SiC", J ELECTRON MATER; JOURNAL OF ELECTRONIC MATERIALS APRIL 2007, vol. 36, no. 4, April 2007 (2007-04-01), pages 277 - 284, XP002462222 [PX] 10-12 * figure 1 *

DOI:   http://dx.doi.org/10.1007/s11664-006-0078-0
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