EP1968136 - NEGATIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY AND METHOD FOR PRODUCING THE SAME AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY EMPLOYING IT [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 08.02.2013 Database last updated on 31.08.2024 | Most recent event Tooltip | 08.02.2013 | Withdrawal of application | published on 13.03.2013 [2013/11] | Applicant(s) | For all designated states Panasonic Corporation 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | [N/P] |
Former [2008/47] | For all designated states Panasonic Corporation 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | ||
Former [2008/37] | For all designated states Matsushita Electric Industrial Co., Ltd. 1006, Oaza Kadoma Kadoma-shi Osaka 571-8501 / JP | Inventor(s) | 01 /
UGAJI, Masaya c/o Matsushita Electric Industrial Co., Ltd Intellectual Property Rights Operations Company IP Development Center 7F Twin 21 OBP Panasonic Tower 2-1-61, Shiromi Chuo-ku, Osaka-shi, Osaka 540-6207 / JP | 02 /
HASEGAWA, Masaki c/o Matsushita Electric Industrial Co., Ltd Intellectual Property Rights Operations Company IP Development Center 7F Twin 21 OBP Panasonic Tower 2-1-61, Shiromi Chuo-ku, Osaka-shi, Osaka 540-6207 / JP | 03 /
YAMAMOTO, Taisuke c/o Matsushita Electric Industrial Co., Ltd Intellectual Property Rights Operations Company IP Development Center 7F Twin 21 OBP Panasonic Tower 2-1-61, Shiromi Chuo-ku, Osaka-shi, Osaka 540-6207 / JP | 04 /
OHARA, Keisuke c/o Matsushita Electric Industrial Co., Ltd Intellectual Property Rights Operations Company IP Development Center 7F Twin 21 OBP Panasonic Tower 2-1-61, Shiromi Chuo-ku, Osaka-shi, Osaka 540-6207 / JP | [2008/37] | Representative(s) | SSM Sandmair Patentanwälte Rechtsanwalt Partnerschaft mbB Joseph-Wild-Straße 20 81829 München / DE | [N/P] |
Former [2008/37] | Schwabe - Sandmair - Marx Patentanwälte Stuntzstrasse 16 81677 München / DE | Application number, filing date | 07831333.5 | 07.11.2007 | [2008/37] | WO2007JP71602 | Priority number, date | JP20060335409 | 13.12.2006 Original published format: JP 2006335409 | [2008/37] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2008072430 | Date: | 19.06.2008 | Language: | JA | [2008/25] | Type: | A1 Application with search report | No.: | EP1968136 | Date: | 10.09.2008 | Language: | EN | [2008/37] | Search report(s) | International search report - published on: | JP | 19.06.2008 | (Supplementary) European search report - dispatched on: | EP | 11.07.2011 | Classification | IPC: | H01M4/02, H01M4/04, H01M4/48 | [2008/37] | CPC: |
H01M4/70 (EP,US);
H01M4/02 (KR);
H01M10/05 (KR);
H01M10/0525 (EP,KR,US);
H01M10/058 (EP,US);
H01M4/04 (KR);
H01M4/13 (EP,US);
H01M4/362 (EP,US);
H01M4/483 (EP,US);
H01M10/0565 (EP,US);
H01M10/0566 (EP,US);
H01M2004/027 (EP,US);
H01M4/136 (EP,US);
H01M4/58 (EP,US);
Y02E60/10 (EP);
Y10T29/49108 (EP,US)
(-)
| Designated contracting states | DE, FR [2010/01] |
Former [2008/37] | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR | Extension states | AL | Not yet paid | BA | Not yet paid | HR | Not yet paid | MK | Not yet paid | RS | Not yet paid | Title | German: | NEGATIVE ELEKTRODE FÜR EINE NICHT WÄSSRIGE ELEKTROLYTSEKUNDÄRBATTERIE, HERSTELLUNGSVERFAHREN DAFÜR UND NICHT WÄSSRIGE ELEKTROLYTSEKUNDÄRBATTERIE MIT DER ELEKTRODE | [2008/37] | English: | NEGATIVE ELECTRODE FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY AND METHOD FOR PRODUCING THE SAME AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY EMPLOYING IT | [2008/37] | French: | ÉLECTRODE NÉGATIVE POUR BATTERIE SECONDAIRE À ÉLECTROLYTE NON AQUEUX ET PROCÉDÉ DE FABRICATION DE CELLE-CI ; BATTERIE SECONDAIRE À ÉLECTROLYTE NON AQUEUX UTILISANT LADITE ÉLECTRODE NÉGATIVE | [2008/37] | Entry into regional phase | 14.05.2008 | Translation filed | 14.05.2008 | National basic fee paid | 14.05.2008 | Search fee paid | 14.05.2008 | Designation fee(s) paid | 14.05.2008 | Examination fee paid | Examination procedure | 14.05.2008 | Examination requested [2008/37] | 14.07.2009 | Loss of particular rights, legal effect: designated state(s) | 20.08.2009 | Despatch of communication of loss of particular rights: designated state(s) AT, BE, BG, CH, CY, CZ, DK, EE, ES, FI, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, MT, NL, PL, PT, RO, SE, SI, SK, TR | 20.01.2012 | Amendment by applicant (claims and/or description) | 31.01.2013 | Application withdrawn by applicant [2013/11] | Fees paid | Renewal fee | 24.11.2009 | Renewal fee patent year 03 | 23.11.2010 | Renewal fee patent year 04 | 23.11.2011 | Renewal fee patent year 05 | 23.11.2012 | Renewal fee patent year 06 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [Y]US2005064291 (SATO TOSHITADA [JP], et al) [Y] 1-14 * paragraphs [0042] , [0 55]; figure 2 *; | [Y]US2005118503 (HONDA KAZUYOSHI [JP], et al) [Y] 1-14 * paragraphs [0029] , [0 41] , [0 87]; figure 2 *; | [Y]JP2005196970 (MATSUSHITA ELECTRIC IND CO LTD) [Y] 1-14 * the whole document * | [Y] - ROBBIE K ET AL, "Advanced techniques for glancing angle deposition", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICSPROCESSING AND PHENOMENA, AMERICAN VACUUM SOCIETY, NEW YORK, NY, US, (19980501), vol. 16, no. 3, doi:10.1116/1.590019, ISSN 0734-211X, pages 1115 - 1122, XP012006772 [Y] 1-14 * the whole document * DOI: http://dx.doi.org/10.1116/1.590019 | International search | [A]JP2002170557 (TOYOTA CENTRAL RES & DEV); | [A]JP2002313319 (SANYO ELECTRIC CO); | [AP]JP2007172991 (SANYO ELECTRIC CO); | [XP]WO2007052803 (MATSUSHITA ELECTRIC IND CO LTD [JP], et al); | [AP]JP2007194076 (MATSUSHITA ELECTRIC IND CO LTD); | [XP]WO2007074654 (MATSUSHITA ELECTRIC IND CO LTD [JP], et al); | [AP]JP2007128659 (MATSUSHITA ELECTRIC IND CO LTD); | [XP]JP4038233B | by applicant | JP2003017040 | JP2002279974 | JP2005196970 |