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Extract from the Register of European Patents

EP About this file: EP2083448

EP2083448 - SILICON CARBIDE SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  10.10.2014
Database last updated on 12.07.2024
Most recent event   Tooltip10.10.2014Application deemed to be withdrawnpublished on 12.11.2014  [2014/46]
Applicant(s)For all designated states
Sumitomo Electric Industries, Ltd.
5-33 Kitahama 4-chome Chuo-ku Osaka-shi
Osaka 540-0041 / JP
[2009/31]
Inventor(s)01 / HARADA, Shin
Osaka Works of SUMITOMO ELECTRIC INDUSTRIES, LTD. 1-3, Shimaya 1-chome Konohana-ku
Osaka-shi Osaka 554-0024 / JP
02 / MASUDA, Takeyoshi
Osaka Works of SUMITOMO ELECTRIC INDUSTRIES, LTD. 1-3, Shimaya 1-chome Konohana-ku
Osaka-shi Osaka 554-0024 / JP
 [2009/31]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstrasse 4
80802 München / DE
[N/P]
Former [2009/31]Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
Leopoldstrasse 4
80802 München / DE
Application number, filing date07831361.607.11.2007
[2009/31]
WO2007JP71630
Priority number, dateJP2006030547610.11.2006         Original published format: JP 2006305476
[2009/31]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2008056698
Date:15.05.2008
Language:JA
[2008/20]
Type: A1 Application with search report 
No.:EP2083448
Date:29.07.2009
Language:EN
[2009/31]
Search report(s)International search report - published on:JP15.05.2008
(Supplementary) European search report - dispatched on:EP18.10.2010
ClassificationIPC:H01L21/04, H01L29/78, H01L29/04, H01L21/02, // H01L29/24
[2010/46]
CPC:
H01L29/7802 (EP,KR,US); H01L21/02378 (EP,KR,US); H01L21/02293 (KR);
H01L21/0243 (EP,KR,US); H01L21/02433 (EP,KR,US); H01L21/02529 (EP,KR,US);
H01L21/02639 (EP,KR,US); H01L21/0445 (EP,KR,US); H01L21/049 (EP,KR,US);
H01L29/045 (EP,KR,US); H01L29/1608 (EP,KR,US); H01L29/66068 (EP,US);
H01L29/0878 (EP,US) (-)
Former IPC [2009/31]H01L29/12, H01L21/20, H01L21/28, H01L21/336, H01L29/78
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2009/31]
TitleGerman:SILIZIUMCARBIDHALBLEITERBAUELEMENT UND HERSTELLUNGSVERFAHREN DAFÜR[2009/31]
English:SILICON CARBIDE SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME[2009/31]
French:DISPOSITIF SEMI-CONDUCTEUR DE CARBURE DE SILICIUM ET PROCÉDÉ DE FABRICATION DE CELUI-CI[2009/31]
Entry into regional phase17.04.2009Translation filed 
17.04.2009National basic fee paid 
17.04.2009Search fee paid 
17.04.2009Designation fee(s) paid 
17.04.2009Examination fee paid 
Examination procedure17.04.2009Examination requested  [2009/31]
16.05.2011Amendment by applicant (claims and/or description)
06.02.2012Despatch of a communication from the examining division (Time limit: M04)
01.06.2012Reply to a communication from the examining division
03.06.2014Application deemed to be withdrawn, date of legal effect  [2014/46]
02.07.2014Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2014/46]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  06.02.2012
Fees paidRenewal fee
27.11.2009Renewal fee patent year 03
30.11.2010Renewal fee patent year 04
29.11.2011Renewal fee patent year 05
28.11.2012Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
30.11.201307   M06   Not yet paid
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Documents cited:Search[XI]US2005230686  (KOJIMA JUN [JP], et al) [X] 1,2,5-8 * figures 11, 13-17, 22 and associated text *[I] 3,4
International search[A]JPH09102459  (MATSUSHITA ELECTRIC IND CO LTD);
 [A]JPH11162850  (MATSUSHITA ELECTRIC IND CO LTD);
 [A]JP2003234301  (MATSUSHITA ELECTRIC IND CO LTD);
 [Y]JP2004152813  (TOYOTA MOTOR CORP, et al);
 [A]JP2005097040  (NEW IND RES ORGANIZATION);
 [A]JP2005277229  (NAT INST OF ADV IND & TECHNOL);
 [X]JP2006013005  (DENSO CORP);
 [AP]JP2006344942  (SUMITOMO ELECTRIC INDUSTRIES);
 [Y]  - STARKE U. ET AL., "SiC SURFACE RECONSTRUCTION: RELEVANCY OF ATOMIC STRUCTURE FOR GROWTH TECHNOLOGY", SURFACE REVIEW AND LETTERS, (1999), vol. 6, no. 6, pages 1129 - 1141, XP003019155

DOI:   http://dx.doi.org/10.1142/S0218625X99001256
by applicantJP2000294777
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.