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EP2020617
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EP About this file: EP2020617
| EP2020617 - Resist composition containing a sulfonium compound, pattern-forming method using the resist composition, and sulfonium compound [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 28.12.2012 Database last updated on 18.03.2026 | Most recent event Tooltip | 28.12.2012 | Application deemed to be withdrawn | published on 30.01.2013 [2013/05] | Applicant(s) | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | [N/P] |
| Former [2009/06] | For all designated states FUJIFILM Corporation 26-30, Nishiazabu 2-chome Minato-ku Tokyo / JP | Inventor(s) | 01 /
Kamimura, Sou Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | 02 /
Kawanishi, Yasutomo Fujifilm Corporation 577, Ushijima, Kaisei-machi Ashigarakami-gun, Kanagawa / JP | 03 /
Wada, Kenji Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | 04 /
Tsuchimura, Tomotaka Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | [2009/19] |
| Former [2009/06] | 01 /
Kaminura, Sou Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | ||
| 02 /
Kawanishi, Yasutomo Fujifilm Corporation 577, Ushijima, Kaisei-machi Ashigarakami-gun, Kanagawa / JP | |||
| 03 /
Wada, Kenji Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | |||
| 04 /
Tsuchimura, Tomotaka Fujifilm Corporation 4000 Kawashiri Yoshida-cho Haibara-gun Shizuoka / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [N/P] |
| Former [2009/06] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 08013861.3 | 01.08.2008 | [2009/06] | Priority number, date | JP20070203152 | 03.08.2007 Original published format: JP 2007203152 | [2009/06] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2020617 | Date: | 04.02.2009 | Language: | EN | [2009/06] | Type: | A3 Search report | No.: | EP2020617 | Date: | 29.04.2009 | [2009/18] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.04.2009 | Classification | IPC: | G03F7/004, G03F7/039 | [2009/06] | CPC: |
G03F7/0397 (EP,KR,US);
G03F7/0045 (EP,KR,US);
G03F7/00 (KR);
G03F7/0047 (KR);
Y10S430/106 (EP,KR,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MT, NL, NO, PL, PT, RO, SE, SI, SK, TR [2009/06] | Title | German: | Resistzusammensetzung mit einer Sulfoniumverbindung, Strukturbildungsverfahren mit der Resistzusammensetzung und Sulfoniumverbindung | [2009/06] | English: | Resist composition containing a sulfonium compound, pattern-forming method using the resist composition, and sulfonium compound | [2009/06] | French: | Composition de réserve contenant un composé de sulfonium, procédé de formation de motifs utilisant la composition de réserve, et composé de sulfonium | [2009/06] | Examination procedure | 28.10.2009 | Amendment by applicant (claims and/or description) | 29.10.2009 | Examination requested [2009/50] | 07.04.2010 | Despatch of a communication from the examining division (Time limit: M04) | 11.08.2010 | Reply to a communication from the examining division | 28.03.2012 | Despatch of a communication from the examining division (Time limit: M04) | 08.08.2012 | Application deemed to be withdrawn, date of legal effect [2013/05] | 19.09.2012 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2013/05] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 07.04.2010 | Fees paid | Renewal fee | 26.08.2010 | Renewal fee patent year 03 | 29.08.2011 | Renewal fee patent year 04 | Penalty fee | Additional fee for renewal fee | 31.08.2012 | 05 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [PX] EP1816519 (FUJIFILM CORP et al.) | [PX] EP1840651 (FUJIFILM CORP et al.) | [X] EP1705518 (FUJI PHOTO FILM CO LTD et al.) | [X] EP1338921 (FUJI PHOTO FILM CO LTD et al.) | [X] EP1693705 (FUJI PHOTO FILM CO LTD et al.) | [A] EP1736824 (FUJI PHOTO FILM CO LTD et al.) | Examination | DR EDWARD VALENTE: "Ch. 24 Phenol", 16 March 2003 (2003-03-16), Retrieved from the Internet | JERRY MARCH: "Advanced Organic Chemistry Fourth Edition", WILEY INTERSCIENCE, ISBN: 0-471-60180-2 | by applicant | US6548221 | EP1480078 | US6680157 | US3849137 | DE3914407 | JPS6326653 | JPS55164824 | JPS6269263 | JPS63146038 | JPS63163452 | JPS62153853 | JPS63146029 | US3779778 | EP0126712 | EP0254853 | JPH0225850 | JPH03223860 | JPH04251259 | JPH02258500 | JPS6236663 | JPS61226746 | JPS61226745 | JPS62170950 | JPS6334540 | JPH07230165 | JPH0862834 | JPH0954432 | JPH095988 | JP2002277862 | US5405720 | US5360692 | US5529881 | US5296330 | US5436098 | US5576143 | US5294511 | US5824451 | JP2002090991 | JPH04122938 | JPH0228531 | US4916210 | EP0219294 |