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Extract from the Register of European Patents

EP About this file: EP2111631

EP2111631 - MICROWAVE HYBRID AND PLASMA RAPID THERMAL PROCESSING OR SEMICONDUCTOR WAFERS [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  02.04.2010
Database last updated on 18.11.2024
Most recent event   Tooltip02.04.2010Withdrawal of applicationpublished on 05.05.2010  [2010/18]
Applicant(s)For all designated states
BTU International, Inc.
23 Esquire Road
North Billerica, MA 01862-2596 / US
[2009/44]
Inventor(s)01 / PEELAMEDU, Ramesh
800 bullfinch Drive, Apt 314
Andover, Massachusetts 01810 / US
02 / KUMAR, Satyendra
3740 Edenderry Drive
Troy, MI 48083 / US
03 / KUMAR, Devendra
850 Rambling Drive
Rochester Hills, MI 48307 / US
04 / WONG, David, C.
9 Northbriar Road
Acton, MA 01720 / US
05 / SECCOMBE, Donald, A.
52 Old Nugent Farm Road
Gloucester, MA 01930 / US
06 / DEMCHAK, Michael
145 South Liverois
Rochester Hills, MI 48307 / US
07 / HESTER, Michael, K.
452 Marion Avenue
Waterford, MI 48328 / US
 [2010/07]
Former [2009/44]01 / PEELAMEDU, Ramesh
390 Woodside Court 1
Rochester Hills, MI 48309 / US
02 / KUMAR, Satyendra
3740 Edenderry Drive
Troy, MI 48083 / US
03 / KUMAR, Devendra
850 Rambling Drive
Rochester Hills, MI 48307 / US
04 / WONG, David, C.
9 Northbriar Road
Acton, MA 01720 / US
05 / SECCOMBE, Donald, A.
52 Old Nugent Farm Road
Gloucester, MA 01930 / US
06 / DEMCHAK, Michael
145 South Liverois
Rochester Hills, MI 48307 / US
07 / HESTER, Michael, K.
452 Marion Avenue
Waterford, MI 48328 / US
Representative(s)Hatzmann, Martin
V.O.
Johan de Wittlaan 7
2517 JR Den Haag / NL
[N/P]
Former [2009/44]Hatzmann, Martin
Vereenigde Johan de Wittlaan 7
2517 JR Den Haag / NL
Application number, filing date08713219.723.01.2008
[2009/44]
WO2008US00839
Priority number, dateUS20070897450P25.01.2007         Original published format: US 897450 P
[2009/44]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2008091613
Date:31.07.2008
Language:EN
[2008/31]
Type: A1 Application with search report 
No.:EP2111631
Date:28.10.2009
Language:EN
The application published by WIPO in one of the EPO official languages on 31.07.2008 takes the place of the publication of the European patent application.
[2009/44]
Search report(s)International search report - published on:US31.07.2008
ClassificationIPC:H01L21/00
[2009/44]
CPC:
H01L21/67115 (EP,US); H01L21/324 (KR); H01J37/32192 (EP,US);
H01J37/32825 (EP,US); H01L21/00 (KR)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2009/44]
TitleGerman:SCHNELLE THERMISCHE MIKROWELLEN-HYBRID- UND PLASMAVERARBEITUNG VON HALBLEITERWAFERN[2009/44]
English:MICROWAVE HYBRID AND PLASMA RAPID THERMAL PROCESSING OR SEMICONDUCTOR WAFERS[2009/44]
French:TRAITEMENT THERMIQUE RAPIDE AU PLASMA ET HYBRIDE MICRO-ONDE DE PLAQUETTES SEMI-CONDUCTRICES[2009/44]
Entry into regional phase21.08.2009National basic fee paid 
21.08.2009Search fee paid 
21.08.2009Designation fee(s) paid 
21.08.2009Examination fee paid 
Examination procedure21.08.2009Amendment by applicant (claims and/or description)
21.08.2009Examination requested  [2009/44]
29.03.2010Application withdrawn by applicant  [2010/18]
Fees paidRenewal fee
13.01.2010Renewal fee patent year 03
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Cited inInternational search[Y]US4687895  (CHITRE SANJEEV R [US], et al);
 [Y]US2002073925  (NOBLE DAVID B [US], et al)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.