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Extract from the Register of European Patents

EP About this file: EP2171541

EP2171541 - METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  20.07.2012
Database last updated on 14.09.2024
Most recent event   Tooltip18.07.2014Lapse of the patent in a contracting state
New state(s): HU		published on 20.08.2014  [2014/34]
Applicant(s)For all designated states
Carl Zeiss SMT GmbH
Rudolf-Eber-Strasse 2
73447 Oberkochen / DE
[2011/10]
Former [2010/14]For all designated states
Carl Zeiss SMT AG
Rudolf-Eber-Str. 2
73446 Oberkochen / DE
Inventor(s)01 / DORSEL, Andreas
Egerlandstrasse 25
73431 Aalen / DE
02 / SCHMIDT, Stefan
Zeppelinstrasse 73
73430 Aalen / DE
 [2010/14]
Representative(s)Kohler Schmid Möbus Patentanwälte
Partnerschaftsgesellschaft mbB
Gropiusplatz 10
70563 Stuttgart / DE
[N/P]
Former [2011/37]Kohler Schmid Möbus
Patentanwälte Ruppmannstraße 27
70565 Stuttgart / DE
Former [2010/14]Kohler Schmid Möbus
Patentanwälte Ruppmannstraße 27
70565 Stuttgart / DE
Application number, filing date08784811.516.07.2008
[2010/14]
WO2008EP05807
Priority number, dateUS20070951125P20.07.2007         Original published format: US 951125 P
[2010/14]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2009012919
Date:29.01.2009
Language:EN
[2009/05]
Type: A1 Application with search report 
No.:EP2171541
Date:07.04.2010
Language:EN
The application published by WIPO in one of the EPO official languages on 29.01.2009 takes the place of the publication of the European patent application.
[2010/14]
Type: B1 Patent specification 
No.:EP2171541
Date:14.09.2011
Language:EN
[2011/37]
Search report(s)International search report - published on:EP29.01.2009
ClassificationIPC:G03F7/20
[2010/14]
CPC:
G03F7/70916 (EP,KR,US); G03F7/70608 (EP,KR,US); G03F7/70425 (EP,KR,US);
G03F7/7065 (KR); G03F7/7075 (EP,KR,US); G03F7/70808 (EP,KR,US);
G03F7/70866 (EP,KR,US); G03F7/70925 (EP,KR,US); G03F7/70983 (EP,KR,US);
H01L21/027 (KR) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2010/14]
TitleGerman:VERFAHREN ZUR UNTERSUCHUNG EINES WAFERS HINSICHTLICH EINES KONTAMINATIONSLIMITS UND EUV-PROJEKTIONSBELICHTUNGSSYSTEM[2011/05]
English:METHOD FOR EXAMINING A WAFER WITH REGARD TO A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM[2010/14]
French:PROCÉDÉ POUR EXAMINER UNE TRANCHE PAR RAPPORT À UNE LIMITE DE CONTAMINATION ET SYSTÈME D'EXPOSITION PAR PROJECTION D'EUV[2011/05]
Former [2010/14]VERFAHREN ZUR UNTERSUCHUNG EINES WAFERS HINSICHTLICH EINES KONTAMINATIONSLIMITS UND EUV-AUSSETZUNGSSCHUTZSYSTEM
Former [2010/14]PROCÉDÉ POUR EXAMINER UNE TRANCHE EN RAPPORT À UNE LIMITE DE CONTAMINATION ET SYSTÈME D'EXPOSITION PAR PROJECTION D'EUV
Entry into regional phase23.10.2009National basic fee paid 
23.10.2009Designation fee(s) paid 
23.10.2009Examination fee paid 
Examination procedure23.10.2009Amendment by applicant (claims and/or description)
23.10.2009Examination requested  [2010/14]
08.06.2010Despatch of a communication from the examining division (Time limit: M04)
24.09.2010Reply to a communication from the examining division
07.10.2010Despatch of a communication from the examining division (Time limit: M04)
03.11.2010Reply to a communication from the examining division
05.04.2011Communication of intention to grant the patent
22.07.2011Fee for grant paid
22.07.2011Fee for publishing/printing paid
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  08.06.2010
Opposition(s)15.06.2012No opposition filed within time limit [2012/34]
Fees paidRenewal fee
27.07.2010Renewal fee patent year 03
25.07.2011Renewal fee patent year 04
Opt-out from the exclusive  Tooltip
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Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU16.07.2008
AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
MT14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
TR14.09.2011
BG14.12.2011
NO14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
[2014/34]
Former [2014/21]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
MT14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
TR14.09.2011
BG14.12.2011
NO14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
Former [2013/35]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
MT14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
BG14.12.2011
NO14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
Former [2013/29]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
BG14.12.2011
NO14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
Former [2013/22]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
NO14.12.2011
GR15.12.2011
ES25.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/35]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
DK14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
NO14.12.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/26]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
PL14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
NO14.12.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/23]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
EE14.09.2011
FI14.09.2011
HR14.09.2011
IT14.09.2011
LT14.09.2011
LV14.09.2011
RO14.09.2011
SE14.09.2011
SI14.09.2011
SK14.09.2011
NO14.12.2011
GR15.12.2011
IS14.01.2012
PT16.01.2012
Former [2012/21]AT14.09.2011
BE14.09.2011
CY14.09.2011
CZ14.09.2011
FI14.09.2011
HR14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
NO14.12.2011
GR15.12.2011
IS14.01.2012
Former [2012/18]AT14.09.2011
BE14.09.2011
CY14.09.2011
FI14.09.2011
HR14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
NO14.12.2011
GR15.12.2011
Former [2012/13]AT14.09.2011
CY14.09.2011
FI14.09.2011
HR14.09.2011
LT14.09.2011
LV14.09.2011
SE14.09.2011
SI14.09.2011
NO14.12.2011
GR15.12.2011
Cited inInternational search[X]EP1455233  (CANON KK [JP]);
 [A]US6842221  (SHIRAISHI NAOMASA [JP]);
 [X]GB2413645  (BOC GROUP PLC [GB]);
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.