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Extract from the Register of European Patents

EP About this file: EP2239759

EP2239759 - Substrate treatment apparatus, substrate treatment method, preliminary electrode structure, measuring electrode structure, and process electrode structure [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  26.10.2012
Database last updated on 14.09.2024
Most recent event   Tooltip26.10.2012Application deemed to be withdrawnpublished on 28.11.2012  [2012/48]
Applicant(s)For all designated states
Korea Advanced Institute of Science and Technology
371-1, Guseong-dong, Yuseong-gu
Daejeon 305-701 / KR
[2010/41]
Inventor(s)01 / Chang, Hong-Young
2327, Department of Physics 373-1 Guseong-dong, Yuseong-gu
Daejeon, 305-701 / KR
02 / Lee, Hun-Su
2327, Department of Physics 373-1 Guseong-dong, Yuseong-gu
Daejeon, 305-701 / KR
 [2010/41]
Representative(s)Harrison, Michael Robert
Harrison IP Limited
3 Ebor House
London Ebor Business Park
Millfield Lane
Nether Poppleton York YO26 6QY / GB
[N/P]
Former [2010/41]Harrison, Michael Robert
Harrison IP Limited Marlborough House Westminster Place York Business Park Nether Poppleton York
YO26 6RW / GB
Application number, filing date09014045.010.11.2009
[2010/41]
Priority number, dateKR2009002942406.04.2009         Original published format: KR 20090029424
[2010/41]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2239759
Date:13.10.2010
Language:EN
[2010/41]
Type: A3 Search report 
No.:EP2239759
Date:28.12.2011
Language:EN
[2011/52]
Search report(s)(Supplementary) European search report - dispatched on:EP28.11.2011
ClassificationIPC:H01J37/32
[2010/41]
CPC:
H01J37/32541 (EP,KR); H01J37/3244 (KR); H01J37/32568 (KR);
H01L21/67017 (KR); H01L21/687 (KR)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2010/41]
Extension statesALNot yet paid
BANot yet paid
RSNot yet paid
TitleGerman:Substratbehandlungsvorrichtung, Substratbehandlungsverfahren, Vorelektrodenstruktur, Messelektrodenstruktur und Prozesselektrodenstruktur[2010/41]
English:Substrate treatment apparatus, substrate treatment method, preliminary electrode structure, measuring electrode structure, and process electrode structure[2010/41]
French:Appareil de traitement de substrat, procédé de traitement de substrat, structure d'électrode préliminaire, structure d'électrode de mesure, et structure d'électrode de processus[2010/41]
Examination procedure01.06.2012Application deemed to be withdrawn, date of legal effect  [2012/48]
10.07.2012Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2012/48]
Fees paidPenalty fee
Additional fee for renewal fee
30.11.201103   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[X]JPS644481  (SUGAWARA MINORU) [X] 10 * abstract * * figures 1,2 *;
 [A]US5820947  (ITOH KENJI [JP]) [A] 1-15 * figures 1,3, * * column 3, line 36 - column 4, line 20 *;
 [A]JP2001135626  (HITACHI INT ELECTRIC INC) [A] 1-15* abstract *;
 [A]JP2001271168  (KOMATSU MFG CO LTD) [A] 1-15 * abstract *;
 [A]JP2002237460  (KANEGAFUCHI CHEMICAL IND) [A] 1-15 * abstract * * figures 1-4 *;
 [XI]EP1595974  (APPLIED MATERIALS INC [US]) [X] 10,12-15 * abstract * * figures 2,3,6B-6G, 7A-7E, 12I-12K * * paragraph [0068] - paragraph [0078] * * paragraph [0088] - paragraph [0097] * * paragraph [0104] - paragraph [0107] * * tables 3,4,5 * [I] 1-9,11
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.