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Extract from the Register of European Patents

EP About this file: EP2189845

EP2189845 - Compositions and processes for photolithography [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  08.06.2018
Database last updated on 25.09.2024
FormerThe patent has been granted
Status updated on  30.06.2017
FormerGrant of patent is intended
Status updated on  20.03.2017
Most recent event   Tooltip03.05.2019Lapse of the patent in a contracting state
New state(s): FR
published on 05.06.2019  [2019/23]
Applicant(s)For all designated states
Rohm and Haas Electronic Materials LLC
455 Forest Street
Marlborough, MA 01752 / US
[2010/21]
Inventor(s)01 / Wang, Deyan
68 Laurel Drive
Hudson, MA 01749 / US
02 / Xu, Cheng-Bai
7 Davis Road
Southboro, MA 01772 / US
03 / Barclay, George G.
1566 Main Street
Jefferson, MA 01522 / US
04 / Wu, Chunyi
7 Beths Road
Shrewsbury, MA 01545 / US
 [2017/31]
Former [2010/21]01 / Wang, Deyan
68 Laurel Drive
Hudson, MA 01749 / US
02 / Xu, Cheng-Bai
7 Davis Road
Southboro, MA 01772 / US
03 / Barclay, George G.
1566 Main Street
Jefferson, MA 01522 / US
04 / Wu, Chunyi
7 Beths Road
Shrewsbury, MA 01545 / US
Representative(s)Kent, Venetia Katherine
Patent Outsourcing Limited 1 King Street Bakewell
Derbyshire DE45 1DZ / GB
[2017/31]
Former [2010/21]Kent, Venetia Katherine
Patent Outsourcing Limited 1 King Street Bakewell
Derbyshire DE 45 1DZ / GB
Application number, filing date09155452.718.03.2009
[2010/21]
Priority number, dateUS20080116288P19.11.2008         Original published format: US 116288 P
[2010/21]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2189845
Date:26.05.2010
Language:EN
[2010/21]
Type: A3 Search report 
No.:EP2189845
Date:21.07.2010
[2010/29]
Type: B1 Patent specification 
No.:EP2189845
Date:02.08.2017
Language:EN
[2017/31]
Search report(s)(Supplementary) European search report - dispatched on:EP18.06.2010
ClassificationIPC:G03F7/11, G03F7/039
[2017/14]
CPC:
G03F7/0046 (EP,KR,US); G03F7/0045 (KR); G03F7/0382 (EP,KR,US);
G03F7/0392 (EP,KR,US); G03F7/0397 (US); G03F7/0757 (EP,KR,US);
G03F7/11 (EP,US); G03F7/20 (KR); G03F7/202 (KR);
G03F7/2041 (EP,KR,US) (-)
Former IPC [2010/21]G03F7/004, G03F7/039, G03F7/038, G03F7/20
Designated contracting statesDE,   FR,   GB [2017/31]
Former [2011/13]DE,  FR,  GB 
Former [2010/21]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Zusammensetzungen und Prozesse für Fotolithographie[2010/21]
English:Compositions and processes for photolithography[2010/21]
French:Compositions et procédés de photolithographie[2010/21]
Examination procedure18.03.2009Examination requested  [2010/21]
02.07.2010Despatch of a communication from the examining division (Time limit: M06)
16.02.2011Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time
19.04.2011Reply to a communication from the examining division
17.04.2012Despatch of a communication from the examining division (Time limit: M06)
23.10.2012Reply to a communication from the examining division
27.02.2015Despatch of a communication from the examining division (Time limit: M06)
07.09.2015Reply to a communication from the examining division
21.03.2017Communication of intention to grant the patent
21.06.2017Fee for grant paid
21.06.2017Fee for publishing/printing paid
21.06.2017Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  02.07.2010
Opposition(s)03.05.2018No opposition filed within time limit [2018/28]
Request for further processing for:The application is deemed to be withdrawn due to failure to reply to the examination report
19.04.2011Request for further processing filed
19.04.2011Full payment received (date of receipt of payment)
Request granted
03.05.2011Decision despatched
Fees paidRenewal fee
15.03.2011Renewal fee patent year 03
14.03.2012Renewal fee patent year 04
11.03.2013Renewal fee patent year 05
12.03.2014Renewal fee patent year 06
10.03.2015Renewal fee patent year 07
10.03.2016Renewal fee patent year 08
10.03.2017Renewal fee patent year 09
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipGB18.03.2018
FR31.03.2018
[2019/23]
Former [2019/13]GB18.03.2018
Documents cited:Search[X]EP1684120  (ROHM & HAAS ELECT MAT [US]);
 [X]EP1720072  (ROHM & HAAS ELECT MAT [US]);
 [X]EP1764652  (FUJIFILM CORP [JP]);
 [X]EP1767992  (FUJIFILM CORP [JP]);
 [X]US2008118860  (HARADA YUJI [JP], et al);
 [X]US2008268376  (IRIE MAKIKO [JP]);
 [E]EP2056162  (ROHM & HAAS ELECT MAT [US]);
 [E]EP2090598  (SHINETSU CHEMICAL CO [JP])
ExaminationWO2008123560
by applicantEP0164248
 EP0232972
 US4983492
 US5128232
 US5130410
 US5216111
 US5492793
 US5529880
 EP0783136
 EP0829766
 US5843624
 EP0930542
 US5929176
 US6042997
 US6048664
 US6048662
 US6057083
 EP1008913
 US6090526
 US6136501
 WO03077029
 US6680159
 US6692888
 US6803171
 US2006246373
 EP19960118111
 US19980143462
 WO1999US21912
 US20000567634
 WO2001US14914
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.