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Extract from the Register of European Patents

EP About this file: EP2328864

EP2328864 - ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  24.03.2017
Database last updated on 14.09.2024
FormerExamination is in progress
Status updated on  20.12.2016
Most recent event   Tooltip24.03.2017Application deemed to be withdrawnpublished on 26.04.2017  [2017/17]
Applicant(s)For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome
Minato-ku
Tokyo 106-8620 / JP
[N/P]
Former [2011/23]For all designated states
FUJIFILM Corporation
26-30, Nishiazabu 2-chome Minato-ku
Tokyo 106-8620 / JP
Inventor(s)01 / TSUCHIMURA, Tomotaka
c/o Fujifilm Corporation 4000 Kawashiri Yoshidacho Haibara-gun
Shizuoka-ken / JP
02 / SHIRAKAWA, Koji
c/o Fujifilm Corporation 4000 Kawashiri Yoshidacho Haibara-gun
Shizuoka-ken / JP
03 / TSUCHIHASHI, Toru
c/o Fujifilm Corporation 4000 Kawashiri Yoshidacho Haibara-gun
Shizuoka-ken / JP
04 / TSUBAKI, Hideaki
c/o Fujifilm Corporation 4000 Kawashiri Yoshidacho Haibara-gun
Shizuoka-ken / JP
 [2011/23]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[N/P]
Former [2011/23]HOFFMANN EITLE
Patent- und Rechtsanwälte Arabellastraße 4
81925 München / DE
Application number, filing date09749199.728.09.2009
[2011/23]
WO2009JP67292
Priority number, dateJP2008024919226.09.2008         Original published format: JP 2008249192
JP2009003990523.02.2009         Original published format: JP 2009039905
[2011/23]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2010035905
Date:01.04.2010
Language:EN
[2010/13]
Type: A1 Application with search report 
No.:EP2328864
Date:08.06.2011
Language:EN
The application published by WIPO in one of the EPO official languages on 01.04.2010 takes the place of the publication of the European patent application.
[2011/23]
Search report(s)International search report - published on:EP01.04.2010
ClassificationIPC:C07C309/28, G03F7/004, G03F7/038, G03F7/039
[2011/23]
CPC:
C07C309/42 (EP,KR,US); C07C309/25 (KR,US); C07C309/28 (KR);
C07C309/29 (EP,KR,US); C07C309/35 (EP,US); C07C309/38 (EP,KR,US);
C07C309/39 (EP,US); C07C309/44 (EP,US); C07C309/59 (EP,US);
C07C323/66 (EP,KR,US); C07C381/12 (EP,KR,US); C07D209/82 (EP,US);
C07D339/08 (EP,US); G03F7/0045 (EP,KR,US); G03F7/0047 (KR);
G03F7/0382 (EP,KR,US); G03F7/0392 (EP,KR,US); G03F7/0397 (EP,US);
C07C2601/02 (EP,US); C07C2601/04 (EP,US); C07C2601/08 (EP,US);
C07C2601/14 (EP,US); C07C2601/18 (EP,US); C07C2602/28 (EP,US);
C07C2602/42 (EP,US); C07C2602/44 (EP,US); C07C2603/24 (EP,US);
C07C2603/28 (EP,US); C07C2603/74 (EP,US); Y10S430/122 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   SM,   TR [2011/23]
TitleGerman:GEGENÜBER AKTINISCHEN STRAHLEN ODER GEGENÜBER STRAHLUNG EMPFINDLICHE HARZZUSAMMENSETZUNG UND VERFAHREN ZUM BILDEN VON MUSTERN MIT DER ZUSAMMENSETZUNG[2011/23]
English:ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION[2011/23]
French:COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU AU RAYONNEMENT ET PROCÉDÉ DE FORMATION DE MOTIFS AU MOYEN DE LA COMPOSITION[2011/23]
Entry into regional phase24.03.2011National basic fee paid 
24.03.2011Designation fee(s) paid 
24.03.2011Examination fee paid 
Examination procedure24.03.2011Amendment by applicant (claims and/or description)
24.03.2011Examination requested  [2011/23]
14.07.2016Despatch of a communication from the examining division (Time limit: M04)
25.11.2016Application deemed to be withdrawn, date of legal effect  [2017/17]
21.12.2016Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2017/17]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  14.07.2016
Fees paidRenewal fee
27.09.2011Renewal fee patent year 03
17.09.2012Renewal fee patent year 04
23.09.2013Renewal fee patent year 05
12.09.2014Renewal fee patent year 06
11.09.2015Renewal fee patent year 07
Penalty fee
Additional fee for renewal fee
30.09.201608   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Cited inInternational search[XA]EP0869393  (FUJI PHOTO FILM CO LTD [JP]) [X] 1,3-7,9 * page 6 - page 17 * * page 75; examples 2-8,10; table 2 * [A] 2,8;
 [X]JP2000053601  (TOYO GOSEI KOGYO KK, et al) [X] 1,3-7,9 * the whole document * * paragraph [0034] *;
 [XA]US6200729  (AOAI TOSHIAKI [JP], et al) [X] 1,3-7,9 * column 91 - column 93; examples 1-8,16-26,30; table 2 * * column 6, line 45 - column 37, line 45 * * claims 1,4 * [A] 2,8;
 [A]JP2003267949  (HODOGAYA CHEMICAL CO LTD) [A] 1-9 * paragraphs [0023] , [0025] , [0030] *;
 [A]US2005014095  (YAMAGUCHI SATOSHI [JP], et al) [A] 1-9* paragraphs [0058] , [0156] - [0171]; examples 1-3 *;
 [XA]EP1536285  (FUJI PHOTO FILM CO LTD [JP]) [X] 1-8 * paragraphs [0096] , [0347] , [0012] , [0013]; claims 1-3,4-6,11,23 * * examples 4,11,12,29,30,43,44,109,119,146 * * examples 127,138,160 * * paragraph [0017] * [A] 9;
 [XP]JP2009053518  (FUJIFILM CORP) [XP] 1-3,5-9 * paragraph [0048]; compounds P-3,P-4,P-6,P-9,P-10,P-11,P-13 * * paragraph [0355]; examples 3,4,6,8; table 1 *
ExaminationJP3890375B
 JP2008076559
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.