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Extract from the Register of European Patents

EP About this file: EP2298715

EP2298715 - SPUTTERING TARGET COMPRISING LANTHANUM OXIDE AND PROCESS FOR SPUTTERING TARGET PRODUCTION [Right-click to bookmark this link]
Former [2011/12]LANTHANUM OXIDE-BASED SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING LANTHANUM OXIDE-BASED SINTERED OBJECT, AND PROCESS FOR SPUTTERING TARGET PRODUCTION USING THE PROCESS
[2013/39]
StatusThe application is deemed to be withdrawn
Status updated on  20.06.2014
Database last updated on 11.09.2024
Most recent event   Tooltip20.06.2014Application deemed to be withdrawnpublished on 23.07.2014  [2014/30]
Applicant(s)For all designated states
JX Nippon Mining & Metals Corporation
6-3, Otemachi 2-chome Chiyoda-ku
Tokyo 100-8164 / JP
[2011/12]
Inventor(s)01 / SATOH Kazuyuki
c/o Isohara Factory of JX Nippon Mining &Metals Corporation ,187-4 Usaba ,Hanakawa-cho
Kitaibaraki-shi Ibaraki 319-1535 / JP
02 / KOIDO Yoshimasa
c/o Isohara Factory of JX Nippon Mining &Metals Corporation 187-4,Usaba,Hanakawa-cho
Kitaibaraki-shi Ibaraki 319-1535 / JP
 [2011/12]
Representative(s)Hoarton, Lloyd Douglas Charles, et al
Forresters IP LLP
Skygarden
Erika-Mann-Strasse 11
80636 München / DE
[N/P]
Former [2012/13]Hoarton, Lloyd Douglas Charles, et al
Forrester & Boehmert
SkyGarden
Erika-Mann-Strasse 11
80636 München / DE
Former [2011/12]Hoarton, Lloyd Douglas Charles
Forrester & Boehmert Pettenkoferstrasse 20-22
80336 Munich / DE
Application number, filing date09794307.023.06.2009
[2011/12]
WO2009JP61352
Priority number, dateJP2008017653807.07.2008         Original published format: JP 2008176538
[2011/12]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2010004861
Date:14.01.2010
Language:JA
[2010/02]
Type: A1 Application with search report 
No.:EP2298715
Date:23.03.2011
Language:EN
[2011/12]
Search report(s)International search report - published on:JP14.01.2010
(Supplementary) European search report - dispatched on:EP21.10.2011
ClassificationIPC:C04B35/462, C04B35/486, C04B35/49, C04B35/645, H01L21/28, H01L29/51, C04B35/50, C23C14/08, C23C14/34, H01L21/02
[2013/39]
CPC:
C23C14/3414 (EP,US); C04B35/50 (EP,KR,US); C04B35/00 (KR);
C04B35/462 (EP,US); C04B35/486 (EP,US); C04B35/49 (EP,US);
C04B35/645 (EP,US); C23C14/08 (EP,US); C23C14/34 (KR);
H01L21/02181 (EP,US); H01L21/02186 (EP,US); H01L21/02189 (EP,US);
H01L21/02192 (EP,US); H01L21/02194 (EP,US); H01L21/02266 (EP,US);
H01L21/28194 (EP,US); H01L29/517 (EP,US); C04B2235/3227 (EP,US);
C04B2235/3232 (EP,US); C04B2235/3244 (EP,US); C04B2235/442 (EP,US);
C04B2235/656 (EP,US); C04B2235/6581 (EP,US); C04B2235/721 (EP,US);
C04B2235/77 (EP,US); C04B2235/782 (EP,US); C04B2235/786 (EP,US);
C04B2235/9669 (EP,US) (-)
Former IPC [2011/47]C04B35/50, C04B35/00, C23C14/34, H01L21/02, C23C14/08, H01L21/316
Former IPC [2011/12]C04B35/50, C04B35/00, C23C14/34
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2011/12]
TitleGerman:SPUTTERING-TARGET AUF LANTHANOXIDBASIS SOWIE VERFAHREN ZUR HERSTELLUNG DES SPUTTERING-TARGETS[2013/39]
English:SPUTTERING TARGET COMPRISING LANTHANUM OXIDE AND PROCESS FOR SPUTTERING TARGET PRODUCTION[2013/39]
French:CIBLE DE PULVÉRISATION À BASE D'OXYDE DE LANTHANE, ET PROCÉDÉ POUR PRODUIRE UNE CIBLE DE PULVÉRISATION.[2013/39]
Former [2011/12]GESINTERTES OBJEKT AUF LANTHANOXIDBASIS, SPUTTERING-TARGET MIT DEM GESINTERTEN OBJEKT, VERFAHREN ZUR HERSTELLUNG DES GESINTERTEN OBJEKTS AUF LANTHANOXIDBASIS SOWIE VERFAHREN ZUR HERSTELLUNG DES SPUTTERING-TARGETS IN DIESEM VERFAHREN
Former [2011/12]LANTHANUM OXIDE-BASED SINTERED OBJECT, SPUTTERING TARGET COMPRISING THE SINTERED OBJECT, PROCESS FOR PRODUCING LANTHANUM OXIDE-BASED SINTERED OBJECT, AND PROCESS FOR SPUTTERING TARGET PRODUCTION USING THE PROCESS
Former [2011/12]OBJET FRITTÉ À BASE D'OXYDE DE LANTHANE, CIBLE DE PULVÉRISATION COMPRENANT L'OBJET FRITTÉ, PROCÉDÉ POUR PRODUIRE L'OBJET FRITTÉ À BASE D'OXYDE DE LANTHANE, ET PROCÉDÉ POUR PRODUIRE UNE CIBLE DE PULVÉRISATION EN UTILISANT LE PROCÉDÉ
Entry into regional phase20.12.2010Translation filed 
20.12.2010National basic fee paid 
20.12.2010Search fee paid 
20.12.2010Designation fee(s) paid 
20.12.2010Examination fee paid 
Examination procedure27.10.2009Request for preliminary examination filed
International Preliminary Examining Authority: JP
20.12.2010Examination requested  [2011/12]
11.05.2012Amendment by applicant (claims and/or description)
16.09.2013Communication of intention to grant the patent
28.01.2014Application deemed to be withdrawn, date of legal effect  [2014/30]
06.03.2014Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time  [2014/30]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  16.09.2013
Fees paidRenewal fee
13.06.2011Renewal fee patent year 03
14.06.2012Renewal fee patent year 04
10.06.2013Renewal fee patent year 05
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Documents cited:Search[A]EP1178129  (FUJIKURA LTD [JP], et al) [A] 1-10* paragraphs [0062] , [0 96] *;
 [I]EP1501090  (MATSUSHITA ELECTRIC IND CO LTD [JP]) [I] 1-10 * paragraph [0222] - paragraph [0223] * * paragraph [0130] - paragraph [0132] *
International search[X]JPH04164858  (ONODA CEMENT CO LTD);
 [A]JP2000001362  (NIPPON SERATEKKU KK, et al);
 [X]JP2001505620  (SIEMENS AG.);
 [A]JP2001342056  (CHUBU KIRESUTO KK, et al);
 [A]JP2004327210  (HONDA MOTOR CO LTD);
 [Y]JP2004339035  (NISSAN MOTOR);
 [X]WO2006025350  (UNIV TOKYO [JP], et al);
 [A]WO2007142333  (MITSUBISHI MATERIALS CORP [JP], et al);
 [A]JP2007334357  (SCHOTT AG);
 [X]  - YAMING JI ET AL.,, "Fabrication of transparent La2Hf207 ceramics from combustion synthesized powders", MATERIALS RESEARCH BULLETIN, vol. 40, no. ISS.3, pages 553 - 559, XP004753215

DOI:   http://dx.doi.org/10.1016/j.materresbull.2004.10.010
by applicantJP2007324593
    - ALSHAREEF H.N.; QUEVEDO-LOPEZ M.; WEN H.C.; HARRIS R.; KIRSCH P.; MAJHI P.; LEE B.H.; JAMMY R., "Work function engineering using lanthanum oxide interfacial layers", APPL. PHYS. LETT., (2006), vol. 89, no. 23, pages 232103 - 232103,3
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.