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Extract from the Register of European Patents

EP About this file: EP2306240

EP2306240 - A pellicle for lithography and a method for making the same [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  09.09.2022
Database last updated on 11.09.2024
FormerThe patent has been granted
Status updated on  01.10.2021
FormerGrant of patent is intended
Status updated on  14.06.2021
FormerExamination is in progress
Status updated on  20.12.2019
Most recent event   Tooltip06.09.2024Lapse of the patent in a contracting state
New state(s): MT
published on 09.10.2024 [2024/41]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Otemachi 2-chome Chiyoda-ku
Tokyo / JP
[2011/14]
Inventor(s)01 / Tsukada, Junichi
c/o Shin-Etsu Chemical Co., Ltd.
13-1, Isobe 2-chome
Annaka-shi
Gunma / JP
02 / Shirasaki, Toru
c/o Shin-Etsu Chemical Co., Ltd.
13-1, Isobe 2-chome
Annaka-shi
Gunma / JP
 [2021/44]
Former [2011/14]01 / Tsukada, Junichi
c/o Shin-Etsu Chemical Co., Ltd. 13-1, Isobe 2-chome Annaka-shi
Gunma / JP
02 / Shirasaki, Toru
c/o Shin-Etsu Chemical Co., Ltd. 13-1, Isobe 2-chome Annaka-shi
Gunma / JP
Representative(s)Müller, Thomas, et al
Patentanwalt
emescon
Balanstraße 57
81541 München / DE
[N/P]
Former [2021/44]Müller, Thomas, et al
Patentanwalt
emescon
Balanstraße 57
81541 München / DE
Former [2011/14]Müller & Schubert
Patentanwälte Innere Wiener Straße 13
81667 München / DE
Application number, filing date10185886.801.10.2010
[2011/14]
Priority number, dateJP2009023035602.10.2009         Original published format: JP 2009230356
JP2009025027530.10.2009         Original published format: JP 2009250275
[2011/14]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2306240
Date:06.04.2011
Language:EN
[2011/14]
Type: A3 Search report 
No.:EP2306240
Date:01.01.2014
Language:EN
[2014/01]
Type: B1 Patent specification 
No.:EP2306240
Date:03.11.2021
Language:EN
[2021/44]
Search report(s)(Supplementary) European search report - dispatched on:EP03.12.2013
ClassificationIPC:G03F1/00, G03F1/62, G03F1/64
[2014/01]
CPC:
G03F1/64 (EP,KR,US); G03F1/62 (EP,KR,US); H01L21/0274 (KR)
Former IPC [2011/14]G03F1/00, G03F1/14
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2021/44]
Former [2011/14]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:Pellikel für Lithographie und Herstellungsverfahren hierfür[2011/14]
English:A pellicle for lithography and a method for making the same[2011/14]
French:Pellicule pour lithographie et son procédé de fabrication[2011/14]
Examination procedure25.06.2014Amendment by applicant (claims and/or description)
25.06.2014Examination requested  [2014/32]
03.01.2020Despatch of a communication from the examining division (Time limit: M04)
07.04.2020Reply to a communication from the examining division
03.12.2020Despatch of a communication from the examining division (Time limit: M04)
10.03.2021Reply to a communication from the examining division
15.06.2021Communication of intention to grant the patent
08.09.2021Fee for grant paid
08.09.2021Fee for publishing/printing paid
08.09.2021Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  03.01.2020
Opposition(s)04.08.2022No opposition filed within time limit [2022/41]
Fees paidRenewal fee
11.10.2012Renewal fee patent year 03
14.10.2013Renewal fee patent year 04
14.10.2014Renewal fee patent year 05
12.10.2015Renewal fee patent year 06
11.10.2016Renewal fee patent year 07
11.10.2017Renewal fee patent year 08
11.10.2018Renewal fee patent year 09
15.10.2019Renewal fee patent year 10
14.10.2020Renewal fee patent year 11
29.09.2021Renewal fee patent year 12
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU01.10.2010
AL03.11.2021
AT03.11.2021
CY03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
MK03.11.2021
MT03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
TR03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
[2024/41]
Former [2024/29]HU01.10.2010
AL03.11.2021
AT03.11.2021
CY03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
MK03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
TR03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2024/27]HU01.10.2010
AL03.11.2021
AT03.11.2021
CY03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
MK03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2024/21]HU01.10.2010
AL03.11.2021
AT03.11.2021
CY03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2024/18]HU01.10.2010
AL03.11.2021
AT03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2023/25]AL03.11.2021
AT03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
MC03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2023/01]AL03.11.2021
AT03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SI03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/49]AL03.11.2021
AT03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/35]AT03.11.2021
CZ03.11.2021
DK03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SK03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/34]AT03.11.2021
EE03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RO03.11.2021
RS03.11.2021
SE03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/33]AT03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RS03.11.2021
SE03.11.2021
SM03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/25]AT03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RS03.11.2021
SE03.11.2021
BG03.02.2022
NO03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/24]AT03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RS03.11.2021
SE03.11.2021
BG03.02.2022
GR04.02.2022
IS03.03.2022
PT03.03.2022
Former [2022/23]AT03.11.2021
ES03.11.2021
FI03.11.2021
HR03.11.2021
LT03.11.2021
LV03.11.2021
PL03.11.2021
RS03.11.2021
BG03.02.2022
PT03.03.2022
Former [2022/22]AT03.11.2021
FI03.11.2021
LT03.11.2021
RS03.11.2021
BG03.02.2022
Former [2022/21]AT03.11.2021
RS03.11.2021
BG03.02.2022
Former [2022/19]BG03.02.2022
Documents cited:Search[X]EP1978404  (SHINETSU CHEMICAL CO [JP]) [X] 8,9,11,12 * table 1 * * examples 2, 3 * * paragraph [0014] - paragraph [0026] * * paragraph [0031] - paragraph [0035] * * paragraphs [0041] , [0044] *;
 [XI]EP2017671  (SHINETSU CHEMICAL CO [JP]) [X] 8,9,11,12 * paragraph [0012] - paragraph [0019] * * examples 1, 2, 3, 4 * [I] 1-3,5,6;
 [X]US2009246646  (HAMADA YUICHI [JP]) [X] 1,5,6 * examples 1-4 * * paragraph [0041] - paragraphs [0045] , [0 59] *;
 [X]US2006146313  (GALLAGHER EMILY F [US], et al) [X] 8,9,11,12 * abstract * * claims 1-7 * * paragraphs [0007] , [0 15] - [0022] *;
 [A]EP1898261  (SHINETSU CHEMICAL CO [JP]) [A] 1-13 * examples 1-3 * * paragraph [0012] - paragraph [0020] *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.