| EP2339053 - Manufacturing apparatus and manufacturing method of silicon carbide single crystal [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 12.03.2021 Database last updated on 26.03.2026 | |
| Former | The patent has been granted Status updated on 03.04.2020 | ||
| Former | Grant of patent is intended Status updated on 20.11.2019 | ||
| Former | Examination is in progress Status updated on 22.02.2017 | Most recent event Tooltip | 17.10.2025 | Change - lapse in a contracting state New state(s): IS | published on 19.11.2025 [2025/47] | Applicant(s) | For all designated states DENSO CORPORATION 1-1, Showa-cho Kariya-city Aichi-pref., 448-8661 / JP | [2020/18] |
| Former [2011/26] | For all designated states DENSO CORPORATION 1-1, Showa-Cho Kariya City Aichi 448-8661 / JP | Inventor(s) | 01 /
Hara, Kazukuni c/o DENSO CORPORATION Intellectual Property Dept. 1-1, Showa-cho, Kariya-city Aichi-pref., 448-8661 / JP | [2020/19] |
| Former [2011/26] | 01 /
Hara, Kazukuni Intellectual Property Dept. DENSO CORPORATION 1-1 Aichi-pref. Aichi 448-8661 / JP | Representative(s) | Winter, Brandl - Partnerschaft mbB Alois-Steinecker-Straße 22 85354 Freising / DE | [N/P] |
| Former [2020/19] | Winter, Brandl, Fürniss, Hübner, Röss, Kaiser, Polte - Partnerschaft mbB Patent- und Rechtsanwaltskanzlei Alois-Steinecker-Strasse 22 85354 Freising / DE | ||
| Former [2011/26] | Winter, Brandl, Fürniss, Hübner, Röss, Kaiser, Polte - Partnerschaft Bavariaring 10 80336 München / DE | Application number, filing date | 10195901.3 | 20.12.2010 | [2011/26] | Priority number, date | JP20090292850 | 24.12.2009 Original published format: JP 2009292850 | [2011/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2339053 | Date: | 29.06.2011 | Language: | EN | [2011/26] | Type: | A3 Search report | No.: | EP2339053 | Date: | 04.04.2012 | Language: | EN | [2012/14] | Type: | B1 Patent specification | No.: | EP2339053 | Date: | 06.05.2020 | Language: | EN | [2020/19] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 06.03.2012 | Classification | IPC: | C30B29/36, C30B25/10, C30B25/12, C30B23/06 | [2019/47] | CPC: |
C30B23/063 (EP,US);
C30B25/10 (EP,US);
C30B25/12 (EP,US);
C30B29/36 (EP,US)
|
| Former IPC [2011/47] | C30B29/36, C30B25/00, C30B25/10, C30B25/12, C30B23/06 | ||
| Former IPC [2011/26] | C30B29/36, C30B25/00, C30B25/10 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2020/19] |
| Former [2011/26] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | Herstellungsvorrichtung und Herstellungsverfahren eines Silizium-Carbid-Einkristalls | [2019/47] | English: | Manufacturing apparatus and manufacturing method of silicon carbide single crystal | [2011/26] | French: | Appareil de fabrication et procédé de fabrication de monocristal de carbure de silicium | [2011/26] |
| Former [2011/26] | Herstellungsvorrichtung und Herstellungsverfahren eines Silizium-Carbid-Einzelkristalls | Examination procedure | 04.10.2012 | Amendment by applicant (claims and/or description) | 04.10.2012 | Examination requested [2012/46] | 12.03.2013 | Despatch of a communication from the examining division (Time limit: M04) | 05.07.2013 | Reply to a communication from the examining division | 14.12.2015 | Despatch of a communication from the examining division (Time limit: M04) | 22.04.2016 | Reply to a communication from the examining division | 13.10.2016 | Despatch of a communication from the examining division (Time limit: M04) | 13.02.2017 | Reply to a communication from the examining division | 21.11.2019 | Communication of intention to grant the patent | 18.03.2020 | Fee for grant paid | 18.03.2020 | Fee for publishing/printing paid | 18.03.2020 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 12.03.2013 | Opposition(s) | 09.02.2021 | No opposition filed within time limit [2021/15] | Fees paid | Renewal fee | 11.12.2012 | Renewal fee patent year 03 | 27.12.2013 | Renewal fee patent year 04 | 22.12.2014 | Renewal fee patent year 05 | 22.12.2015 | Renewal fee patent year 06 | 23.12.2016 | Renewal fee patent year 07 | 21.12.2017 | Renewal fee patent year 08 | 19.12.2018 | Renewal fee patent year 09 | 23.12.2019 | Renewal fee patent year 10 |
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| Former [2020/46] | IS | 06.09.2020 | Documents cited: | Search | [X] WO2004111316 (LPE SPA et al.) | [X] EP1464735 (DENSO CORP et al.) [X] 1 * abstract * * page 7, lines 13-27 * | [XA] JP2006321681 (TOYOTA MOTOR CORP et al.) [X] 1 * paragraph [0045]; figures 13,14,16 *[A] 2 | [A] GB1498459 (PHIZI I IM P N LEBEDEVA AN SSS et al.) [A] 1 * paragraph [0023]; figure 2 * * abstract * | [A] JP2004311649 (DENSO CORP et al.) [A] 1,2 * figure 2 * | [A] WO2008014434 (CARACAL INC et al.) [A] 1 * paragraph [0031]; figure 2 * | [X] EP1205584 (DENSO CORP et al.) [X] 1 * abstract * * page 13, line 25 - page 15, line 5 * | [XA] JP2003002795 (TOYOTA CENTRAL RES & DEV et al.) [X] 1 * abstract * * paragraphs [0079] - [0082] *[A] 2 | [X] US6045613 (HUNTER CHARLES ERIC et al.) [X] 1 * abstract * | [A] DE3230727 (SIEMENS AG et al.) [A] 1 * abstract * | [A] JPH11278985 (TOYOTA CENTRAL RES & DEV et al.) [A] 1,3 * abstract * | [A] DE19842109 (FORSCHUNGSVERBUND BERLIN EV et al.) [A] 7-9 * abstract * | [A] WO9833961 (NORTHROP GRUMMAN CORP et al.) [A] 10,12 * abstract * | [A] GEISER J ET AL: "Transient numerical study of temperature gradients during sublimation growth of SiC: Dependence on apparatus design", JOURNAL OF CRYSTAL GROWTH, ELSEVIER, AMSTERDAM, NL, vol. 297, no. 1, 15 December 2006 (2006-12-15), pages 20 - 32, XP025157409, ISSN: 0022-0248, [retrieved on 20061215], DOI: 10.1016/J.JCRYSGRO.2006.08.046 DOI: http://dx.doi.org/10.1016/j.jcrysgro.2006.08.046 | by applicant | JP2002362998 |