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EP2418299
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EP About this file: EP2418299
| EP2418299 - TANTALUM SPUTTERING TARGET [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 30.04.2021 Database last updated on 31.08.2024 | |
| Former | Examination is in progress Status updated on 21.02.2017 | Most recent event Tooltip | 30.04.2021 | Application deemed to be withdrawn | published on 02.06.2021 [2021/22] | Applicant(s) | For all designated states JX Nippon Mining & Metals Corporation 10-4, Toranomon 2-chome Minato-ku Tokyo 105-8417 / JP | [2020/42] |
| Former [2012/07] | For all designated states JX Nippon Mining & Metals Corporation 6-3, Otemachi 2-chome Chiyoda-ku Tokyo 100-8164 / JP | Inventor(s) | 01 /
FUKUSHIMA Atsushi c/o Isohara Factory of JX Nippon Mining&Metals Corporation 187-4 Usuba Hanakawa-cho Kitaibaraki-shi Ibaraki 319-1535 / JP | 02 /
ODA Kunihiro c/o Isohara Factory of JX Nippon Mining&Metals Corporation 187-4 Usuba Hanakawa-cho Kitaibaraki-shi Ibaraki 319-1535 / JP | [2012/07] | Representative(s) | Forresters IP LLP Skygarden Erika-Mann-Straße 11 80636 München / DE | [N/P] |
| Former [2012/13] | Hoarton, Lloyd Douglas Charles, et al Forrester & Boehmert SkyGarden Erika-Mann-Strasse 11 80636 München / DE | ||
| Former [2012/07] | Hoarton, Lloyd Douglas Charles Forrester & Boehmert Pettenkoferstrasse 20-22 80336 Munich / DE | Application number, filing date | 10777652.8 | 23.04.2010 | WO2010JP57237 | Priority number, date | JP20090124566 | 22.05.2009 Original published format: JP 2009124566 | [2012/07] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2010134417 | Date: | 25.11.2010 | Language: | JA | [2010/47] | Type: | A1 Application with search report | No.: | EP2418299 | Date: | 15.02.2012 | Language: | EN | [2012/07] | Search report(s) | International search report - published on: | JP | 25.11.2010 | (Supplementary) European search report - dispatched on: | EP | 28.03.2013 | Classification | IPC: | C23C14/34, C22C27/02, C22F1/18, H01L21/28, H01L21/285, C22F1/00 | [2012/07] | CPC: |
C22C27/00 (EP,US);
C23C14/34 (KR);
C22C27/02 (EP,KR,US);
C23C14/3414 (EP,US)
| Designated contracting states | AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR [2012/07] | Title | German: | TANTALUM-SPUTTERTARGET | [2012/07] | English: | TANTALUM SPUTTERING TARGET | [2012/07] | French: | CIBLE DE PULVÉRISATION CATHODIQUE DE TANTALE | [2012/07] | Entry into regional phase | 05.05.2011 | Translation filed | 05.05.2011 | National basic fee paid | 05.05.2011 | Search fee paid | 05.05.2011 | Designation fee(s) paid | 05.05.2011 | Examination fee paid | Examination procedure | 05.05.2011 | Examination requested [2012/07] | 24.10.2013 | Amendment by applicant (claims and/or description) | 12.02.2014 | Despatch of a communication from the examining division (Time limit: M04) | 18.06.2014 | Reply to a communication from the examining division | 01.12.2014 | Cancellation of oral proceeding that was planned for 11.12.2014 | 11.12.2014 | Date of oral proceedings (cancelled) | 09.01.2015 | Despatch of communication that the application is refused, reason: substantive examination {1} | 10.02.2017 | Despatch of a communication from the examining division (Time limit: M04) | 11.04.2017 | Reply to a communication from the examining division | 23.09.2019 | Despatch of a communication from the examining division (Time limit: M04) | 15.01.2020 | Reply to a communication from the examining division | 06.08.2020 | Despatch of a communication from the examining division (Time limit: M04) | 17.12.2020 | Application deemed to be withdrawn, date of legal effect [2021/22] | 29.01.2021 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2021/22] | Appeal following examination | 27.02.2015 | Appeal received No. T1107/15 | 19.05.2015 | Statement of grounds filed | 28.10.2016 | Result of appeal procedure: continuation of examination procedure | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 12.02.2014 | Fees paid | Renewal fee | 28.03.2012 | Renewal fee patent year 03 | 12.04.2013 | Renewal fee patent year 04 | 25.03.2014 | Renewal fee patent year 05 | 10.04.2015 | Renewal fee patent year 06 | 11.04.2016 | Renewal fee patent year 07 | 10.04.2017 | Renewal fee patent year 08 | 11.04.2018 | Renewal fee patent year 09 | 15.04.2019 | Renewal fee patent year 10 | 31.03.2020 | Renewal fee patent year 11 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]EP0902102 (JAPAN ENERGY CORP [JP]) [A] 5* paragraph [0019]; claims 1,15 *; | [X]US2005155677 (WICKERSHAM CHARLES E JR [US]) [X] 1-6 * paragraphs [0003] , [0034] , [0035] , [0037]; table 1 *; | [X] - HASHIMOTO C ET AL, HIGH QUALITY TA2O5 FILMS USING ULTRA-HIGH PURITY TA SPUTTERING TARGET, JAPANESE JOURNAL OF APPLIED PHYSICS, THE JAPAN SOCIETY OF APPLIED PHYSICS, JAPAN SOCIETY OF APPLIED PHYSICS, TOKYO; JP, PAGE(S) 253 - 256, (19860820), ISSN 0021-4922, XP000097430 [X] 1-3 * table 1 * | International search | [A]JP2000212678 (JAPAN ENERGY CORP); | [A]JP2002530534 (CABOT CORP.); | [A]JP2005336617 (HITACHI METALS LTD) | by applicant | US6331233 | JP2002060934 | JP2002518593 | US2005155677 |