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EP2441859
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EP About this file: EP2441859
| EP2441859 - PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 08.02.2013 Database last updated on 02.11.2024 | Most recent event Tooltip | 08.02.2013 | Withdrawal of application | published on 13.03.2013 [2013/11] | Applicant(s) | For all designated states Mitsubishi Heavy Industries, Ltd. 16-5, Konan 2-chome Minato-ku Tokyo 108-8215 / JP | [2012/16] | Inventor(s) | 01 /
MATSUDA Ryuichi c/o TAKASAGO Research&Development Center MITSUBISHI HEAVY INDUSTRIES LTD. 1-1 Arai-cho Shinhama 2-chome Takasago-shi Hyogo 676-8686 / JP | 02 /
YOSHIDA Kazuto c/o KOBE Shipyard&Machinery Works MITSUBISHI HEAVY INDUSTRIES LTD. 1-1 Wadasaki-cho 1-chome Hyogo-ku Kobe-shi Hyogo 652-8585 / JP | 03 /
KAWANO Yuichi c/o TAKASAGO Research&Development Center MITSUBISHI HEAVY INDUSTRIES LTD. 1-1 Arai-cho Shinhama 2-chome Takasago-shi Hyogo 676-8686 / JP | [2012/16] | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastrasse 30 81925 München / DE | [N/P] |
| Former [2012/16] | HOFFMANN EITLE Patent- und Rechtsanwälte Arabellastrasse 4 81925 München / DE | Application number, filing date | 10786056.1 | 24.05.2010 | WO2010JP58734 | Priority number, date | JP20090139795 | 11.06.2009 Original published format: JP 2009139795 | [2012/16] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2010143525 | Date: | 16.12.2010 | Language: | JA | [2010/50] | Type: | A1 Application with search report | No.: | EP2441859 | Date: | 18.04.2012 | Language: | EN | [2012/16] | Search report(s) | International search report - published on: | JP | 16.12.2010 | Classification | IPC: | C23C16/44, H01L21/205 | [2012/16] | CPC: |
H01J37/32577 (EP,US);
C23C16/4404 (EP,KR,US);
C23C16/50 (EP,KR,US);
H01J37/32467 (EP,KR,US);
H01J37/32504 (EP,KR,US);
Y10S156/916 (EP,US)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, SE, SI, SK, SM, TR [2012/16] | Title | German: | VORRICHTUNG ZUR PLASMAVERARBEITUNG UND VERFAHREN ZUR PLASMAVERARBEITUNG | [2012/16] | English: | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | [2012/16] | French: | APPAREIL DE TRAITEMENT AU PLASMA ET PROCÉDÉ DE TRAITEMENT AU PLASMA | [2012/16] | Entry into regional phase | 06.12.2011 | Translation filed | 06.12.2011 | National basic fee paid | 06.12.2011 | Search fee paid | 06.12.2011 | Designation fee(s) paid | 06.12.2011 | Examination fee paid | Examination procedure | 06.12.2011 | Examination requested [2012/16] | 04.02.2013 | Application withdrawn by applicant [2013/11] | Fees paid | Renewal fee | 29.03.2012 | Renewal fee patent year 03 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [A]JPH02183533 (FUJITSU LTD); | [Y]JPH08172080 (APPLIED MATERIALS INC); | [Y]JPH1038300 (FUJI INDUSTRIES CO LTD); | [A]JPH10321559 (HITACHI LTD); | [A]JP2000173931 (SONY CORP); | [Y]JP2005191023 (MITSUBISHI HEAVY IND LTD) | by applicant | JP2005191023 |