EP2487135 - SiOx, AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 21.11.2014 Database last updated on 02.11.2024 | Most recent event Tooltip | 21.11.2014 | Withdrawal of application | published on 24.12.2014 [2014/52] | Applicant(s) | For all designated states OSAKA Titanium Technologies Co., Ltd. 1, Higashihama-cho Amagasaki-shi Hyogo 660-8533 / JP | [2012/33] | Inventor(s) | 01 /
KANNO, Hideaki c/o OSAKA Titanium technologies Co. Ltd. 1 Higashihama-cho Amagasaki-shi Hyogo 660-8533 / JP | 02 /
KIZAKI, Shingo c/o OSAKA Titanium technologies Co. Ltd. 1 Higashihama-cho Amagasaki-shi Hyogo 660-8533 / JP | [2012/33] | Representative(s) | Simons, Amanda Louise J A Kemp 14 South Square Gray's Inn London WC1R 5JJ / GB | [2012/33] | Application number, filing date | 10821726.6 | 04.10.2010 | WO2010JP05927 | Priority number, date | JP20090235365 | 09.10.2009 Original published format: JP 2009235365 | [2012/33] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2011043049 | Date: | 14.04.2011 | Language: | JA | [2011/15] | Type: | A1 Application with search report | No.: | EP2487135 | Date: | 15.08.2012 | Language: | EN | [2012/33] | Search report(s) | International search report - published on: | JP | 14.04.2011 | Classification | IPC: | C01B33/113, B65D81/24, H01M4/48 | [2012/33] | CPC: |
H01M4/62 (EP,US);
C01B33/113 (EP,KR,US);
B65D81/24 (KR);
H01M4/48 (KR);
H01M4/485 (EP,US);
H01M10/0525 (EP,US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2012/33] | Title | German: | SIOX SOWIE DAMPFABSCHEIDUNGSMATERIAL FÜR EINEN BARRIEREFILM DAMIT UND NEGATIVELEKTRODEN-AKTIVMATERIAL FÜR EINE LITHIUMIONEN-SEKUNDÄRBATTERIE DAMIT | [2012/33] | English: | SiOx, AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME | [2012/33] | French: | SiOx, MATÉRIAU DE DEPOT POUR FILM DE BARRIÉRE ET MATÉRIAU ACTIF D'ÉLECTRODE NÉGATIVE POUR ACCUMULATEUR LITHIUM-ION L'UTILISANT | [2012/33] | Entry into regional phase | 30.03.2012 | Translation filed | 30.03.2012 | National basic fee paid | 30.03.2012 | Search fee paid | 30.03.2012 | Designation fee(s) paid | 30.03.2012 | Examination fee paid | Examination procedure | 06.01.2011 | Request for preliminary examination filed International Preliminary Examining Authority: JP | 30.03.2012 | Amendment by applicant (claims and/or description) | 30.03.2012 | Examination requested [2012/33] | 17.11.2014 | Application withdrawn by applicant [2014/52] | Fees paid | Renewal fee | 11.10.2012 | Renewal fee patent year 03 | 14.10.2013 | Renewal fee patent year 04 | 14.10.2014 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [X]JP2007099548 (SHIKOKU RESEARCH INST INC, et al); | [X]JPH01230421 (NIPPON CATALYTIC CHEM IND); | [X]JPH0492810 (AI ESU AI YUUGEN, et al); | [A]JP2003192326 (SHINETSU CHEMICAL CO); | [A]WO2006025195 (SUMITOMO TITANIUM CORP [JP], et al); | [A]JP2002097567 (SUMITOMO SITIX OF AMAGASAKI IN); | [A]JP2001220125 (SHINETSU CHEMICAL CO) | by applicant | WO2006025195 | JP3951107B | JP3952118B |