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Extract from the Register of European Patents

EP About this file: EP2487135

EP2487135 - SiOx, AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  21.11.2014
Database last updated on 02.11.2024
Most recent event   Tooltip21.11.2014Withdrawal of applicationpublished on 24.12.2014  [2014/52]
Applicant(s)For all designated states
OSAKA Titanium Technologies Co., Ltd.
1, Higashihama-cho Amagasaki-shi
Hyogo 660-8533 / JP
[2012/33]
Inventor(s)01 / KANNO, Hideaki
c/o OSAKA Titanium technologies Co. Ltd.
1 Higashihama-cho
Amagasaki-shi Hyogo 660-8533 / JP
02 / KIZAKI, Shingo
c/o OSAKA Titanium technologies Co. Ltd.
1 Higashihama-cho
Amagasaki-shi Hyogo 660-8533 / JP
 [2012/33]
Representative(s)Simons, Amanda Louise
J A Kemp
14 South Square
Gray's Inn
London WC1R 5JJ / GB
[2012/33]
Application number, filing date10821726.604.10.2010
WO2010JP05927
Priority number, dateJP2009023536509.10.2009         Original published format: JP 2009235365
[2012/33]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2011043049
Date:14.04.2011
Language:JA
[2011/15]
Type: A1 Application with search report 
No.:EP2487135
Date:15.08.2012
Language:EN
[2012/33]
Search report(s)International search report - published on:JP14.04.2011
ClassificationIPC:C01B33/113, B65D81/24, H01M4/48
[2012/33]
CPC:
H01M4/62 (EP,US); C01B33/113 (EP,KR,US); B65D81/24 (KR);
H01M4/48 (KR); H01M4/485 (EP,US); H01M10/0525 (EP,US);
H01M4/131 (EP,US); Y02E60/10 (EP) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2012/33]
TitleGerman:SIOX SOWIE DAMPFABSCHEIDUNGSMATERIAL FÜR EINEN BARRIEREFILM DAMIT UND NEGATIVELEKTRODEN-AKTIVMATERIAL FÜR EINE LITHIUMIONEN-SEKUNDÄRBATTERIE DAMIT[2012/33]
English:SiOx, AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME[2012/33]
French:SiOx, MATÉRIAU DE DEPOT POUR FILM DE BARRIÉRE ET MATÉRIAU ACTIF D'ÉLECTRODE NÉGATIVE POUR ACCUMULATEUR LITHIUM-ION L'UTILISANT[2012/33]
Entry into regional phase30.03.2012Translation filed 
30.03.2012National basic fee paid 
30.03.2012Search fee paid 
30.03.2012Designation fee(s) paid 
30.03.2012Examination fee paid 
Examination procedure06.01.2011Request for preliminary examination filed
International Preliminary Examining Authority: JP
30.03.2012Amendment by applicant (claims and/or description)
30.03.2012Examination requested  [2012/33]
17.11.2014Application withdrawn by applicant  [2014/52]
Fees paidRenewal fee
11.10.2012Renewal fee patent year 03
14.10.2013Renewal fee patent year 04
14.10.2014Renewal fee patent year 05
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Cited inInternational search[X]JP2007099548  (SHIKOKU RESEARCH INST INC, et al);
 [X]JPH01230421  (NIPPON CATALYTIC CHEM IND);
 [X]JPH0492810  (AI ESU AI YUUGEN, et al);
 [A]JP2003192326  (SHINETSU CHEMICAL CO);
 [A]WO2006025195  (SUMITOMO TITANIUM CORP [JP], et al);
 [A]JP2002097567  (SUMITOMO SITIX OF AMAGASAKI IN);
 [A]JP2001220125  (SHINETSU CHEMICAL CO)
by applicantWO2006025195
 JP3951107B
 JP3952118B
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.