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Extract from the Register of European Patents

EP About this file: EP2323158

EP2323158 - Lithography system and projection method [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  07.02.2014
Database last updated on 09.07.2024
Most recent event   Tooltip07.02.2014Application deemed to be withdrawnpublished on 12.03.2014  [2014/11]
Applicant(s)For all designated states
Mapper Lithography IP B.V.
Computerlaan 15
2628 XK Delft / NL
[2011/20]
Inventor(s)01 / Kruit, Pieter
Koornmarkt 49
2611 EB Delft / NL
02 / Wieland, Marco Jan-Jaco
c/o Computerlaan 15
2628 XK Delft / NL
03 / Steenbrink, Stijn Willem Karel Herman
Tolsteegsingel 50 bis a
3282 AM Utrecht / NL
04 / Jager, Remco
Lange Nieuwstraat 95
3512 PG Utrecht / NL
 [2011/20]
Representative(s)Geurts, Franciscus Antonius
Octrooibureau Vriesendorp & Gaade B.V.
Koninginnegracht 19
2514 AB Den Haag / NL
[N/P]
Former [2011/20]Geurts, Franciscus Antonius
Octrooibureau Vriesendorp & Gaade B.V. Dr. Kuyperstraat 6
2514 BB Den Haag / NL
Application number, filing date11157080.009.03.2007
[2011/20]
Priority number, dateUS20060781040P10.03.2006         Original published format: US 781040 P
[2011/20]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2323158
Date:18.05.2011
Language:EN
[2011/20]
Type: A3 Search report 
No.:EP2323158
Date:04.01.2012
Language:EN
[2012/01]
Search report(s)(Supplementary) European search report - dispatched on:EP01.12.2011
ClassificationIPC:H01J37/317, H01J37/302, G03F7/20, B82Y10/00
[2012/01]
CPC:
H01J37/3177 (EP,KR,US); H01J37/3174 (EP,KR,US); B82Y10/00 (EP,US);
B82Y40/00 (EP,KR,US); G03F7/2059 (KR); G03F7/70291 (EP,KR,US);
G03F7/70383 (EP,KR,US); G03F7/70508 (EP,KR,US); H01J37/3026 (EP,KR,US);
H01L21/67282 (EP,KR,US); H01J2237/31764 (EP,KR,US); H01J2237/31766 (EP,KR,US);
H01J2237/31771 (EP,US) (-)
Former IPC [2011/20]H01J37/317, H01J37/302, G03F7/20
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2011/20]
TitleGerman:Lithographiesystem und Projektionsmethode[2011/20]
English:Lithography system and projection method[2011/20]
French:Système de lithographie et procédé de projection[2011/20]
Examination procedure04.07.2012Amendment by applicant (claims and/or description)
04.07.2012Examination requested  [2012/33]
01.10.2013Application deemed to be withdrawn, date of legal effect  [2014/11]
04.11.2013Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2014/11]
Parent application(s)   TooltipEP07747250.4  / EP1994447
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20070747250) is  06.03.2009
Fees paidRenewal fee
07.03.2011Renewal fee patent year 03
07.03.2011Renewal fee patent year 04
07.03.2011Renewal fee patent year 05
19.03.2012Renewal fee patent year 06
Penalty fee
Additional fee for renewal fee
31.03.201307   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]JPS5710236  (TOKYO SHIBAURA ELECTRIC CO) [A] 1 * abstract *;
 [A]US4498010  (BIECHLER CHARLES S [US], et al) [A] 1 * abstract *;
 [I]US5103101  (BERGLUND C NEIL [US], et al) [I] 1-7 * column 2, lines 43-60 * * column 3, lines 15-39; figure 1 * * column 4, line 15 - column 5, line 30; figures 4-7(2); claims 5, 7, 10, 14, 15 *;
 [I]US5369282  (ARAI SOICHIRO [JP], et al) [I] 1-6 * column 2, lines 4-41; figure 1 * * column 3, line 46 - column 4, line 6; figure 2 * * column 10, lines 22-25 * * column 13, line 45 - column 15, line 25; figures 11(a)-11(e) * * column 16, line 53 - column 19, line 10; figures 15-19 *;
 [A]US2002027198  (NAGATA KOJI [JP], et al) [A] 1 * abstract *;
 [I]US6498685  (JOHNSON KENNETH C [US]) [I] 1-7 * column 53, line 36 - column 54, line 63; figures 51-57 *;
 [I]US2004004699  (KANATAKE TAKASHI [JP]) [I] 1-7 * paragraphs [0092] - [0102]; figures 15,17,18 *;
 [A]US2004037487  (NAKAYA DAISUKE [JP], et al) [A] 1* paragraphs [0144] , [0164] , [0165] *
by applicantUS4498010
 US5103101
 US5393987
 US2002104970
 WO2004038509
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.