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EP2372404
European procedure
Extract from the Register of European Patents
EP About this file: EP2372404
| EP2372404 - High transmission, high aperture projection objective and projection exposure apparatus [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 22.11.2013 Database last updated on 24.08.2024 | Most recent event Tooltip | 22.11.2013 | No opposition filed within time limit | published on 25.12.2013 [2013/52] | Applicant(s) | For all designated states Carl Zeiss SMT GmbH Rudolf-Eber-Strasse 2 73447 Oberkochen / DE | [2011/40] | Inventor(s) | 01 /
Krähmer, Daniel Birnenweg 2 73457 Essingen / DE | 02 /
Müller, Ralf Dr.-Bosch-Strasse 6 73431 Aalen / DE | 03 /
Schicketanz, Thomas Jahnstrasse 13 73431 Aalen / DE | 04 /
Ulrich, Wilhelm Lederackerring 44 73434 Aalen / DE | 05 /
Epple, Alexander Langertstrasse 38 73431 Aalen / DE | [2011/40] | Representative(s) | Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner mbB Postfach 10 40 36 70035 Stuttgart / DE | [N/P] |
| Former [2011/40] | Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner Postfach 10 40 36 70035 Stuttgart / DE | Application number, filing date | 11169144.0 | 17.10.2008 | [2011/40] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2372404 | Date: | 05.10.2011 | Language: | EN | [2011/40] | Type: | B1 Patent specification | No.: | EP2372404 | Date: | 16.01.2013 | Language: | EN | [2013/03] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 01.09.2011 | Classification | IPC: | G02B1/11, G03F7/20, G02B17/08 | [2011/40] | CPC: |
G03F7/70958 (EP,US);
G02B1/115 (EP,US);
G02B17/0812 (EP,US);
G03F7/70225 (EP,US);
G03F7/70341 (EP,US)
| Designated contracting states | DE, NL [2011/40] | Title | German: | Projektionsobjektiv mit hoher Transmission und hoher Apertur sowie Projektionsbelichtungsvorrichtung | [2011/40] | English: | High transmission, high aperture projection objective and projection exposure apparatus | [2011/40] | French: | Appareil d'exposition de projection et objectif de projection à grande ouverture, à transmission élevée | [2011/40] | Examination procedure | 08.06.2011 | Examination requested [2011/40] | 24.07.2012 | Communication of intention to grant the patent | 26.11.2012 | Fee for grant paid | 26.11.2012 | Fee for publishing/printing paid | Parent application(s) Tooltip | EP08018215.7 / EP2177934 | Opposition(s) | 17.10.2013 | No opposition filed within time limit [2013/52] | Fees paid | Renewal fee | 08.06.2011 | Renewal fee patent year 03 | 24.08.2011 | Renewal fee patent year 04 | 23.10.2012 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [A]WO2007025643 (ZEISS CARL SMT AG [DE], et al) [A] 1-14 * figure 1; tables 1, 1s *; | [A]EP1852745 (ZEISS CARL SMT AG [DE]) [A] 1-14 * paragraphs [0077] , [0 78]; figure 5 * | by applicant | US2006024018 | US7268948 | US2006199040 | US2005233113 | WO2004019128 | EP1480065 | WO2005069055 | US6252647 | US2006050261 | WO2007086220 | US5963365 | - W.H. SOUTHWELL, "Pyramid-array surface-relief structures producing antireflection index matching on optical surfaces", J. OPT. SOC. AM. A, (1991), vol. 8, no. 3, pages 549 - 553, XP000177614 | WO2008EP03987 |