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EP2506291
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EP About this file: EP2506291
| EP2506291 - Method and apparatus for forming a straight line projection on a semiconductor substrate [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 30.08.2013 Database last updated on 09.09.2024 | Most recent event Tooltip | 30.08.2013 | Application deemed to be withdrawn | published on 02.10.2013 [2013/40] | Applicant(s) | For all designated states Excico France 13-21 Quai des Gresillons, Bat. B7 92230 Gennevilliers / FR | [2012/40] | Inventor(s) | 01 /
Godart, Bruno 7 Allée Millet 91940 Les Ulis / FR | 02 /
Migozzi, Jean-Blaise 11 Avenue de la division Leclerc 92310 Sevres / FR | [2012/40] | Representative(s) | BiiP bv Engels Plein 3 bus 102 3000 Leuven / BE | [N/P] |
| Former [2012/40] | BiiP cvba Culliganlaan 1B 1831 Diegem (Bruxelles) / BE | Application number, filing date | 11290155.8 | 28.03.2011 | [2012/40] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2506291 | Date: | 03.10.2012 | Language: | EN | [2012/40] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.09.2011 | Classification | IPC: | H01L21/268, G02B17/06, B23K26/00, B23K26/073 | [2012/40] | CPC: |
G02B19/0023 (EP,KR,US);
H01L21/67098 (KR);
H01L21/02691 (KR,US);
B23K26/0006 (EP,KR,US);
B23K26/354 (EP,KR,US);
G02B19/0028 (EP,US);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2012/40] | Extension states | BA | Not yet paid | ME | Not yet paid | Title | German: | Verfahren und Vorrichtung zur Bildung einer Projektion mit geraden Linien auf einem Halbleitersubstrat | [2012/40] | English: | Method and apparatus for forming a straight line projection on a semiconductor substrate | [2012/40] | French: | Procédé et appareil pour former une projection en ligne droite sur un substrat semi-conducteur | [2012/40] | Examination procedure | 04.04.2013 | Application deemed to be withdrawn, date of legal effect [2013/40] | 15.05.2013 | Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [2013/40] | Fees paid | Penalty fee | Additional fee for renewal fee | 31.03.2013 | 03 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [ID]JPH06145000 (MURATA MANUFACTURING CO) [ID] 1-5,13,14 * abstract * * figure 2 *; | [I]WO0173769 (ULTRATECH STEPPER INC [US]) [I] 1-14 * page 5, line 21 - page 10, line 27 * * page 15, line 6 - page 16, line 2 * * page 17, line 10 - line 15 * * figures 2, 3, 11, 12 *; | [I]US6502319 (GOODRICH GARY [US], et al) [I] 1-5,11 * abstract * * column 3, line 62 - column 4, line 21 * * figures 16, 17 *; | [A]US2006163223 (ZHANG SHIYU [US], et al) [A] 1-14 * abstract * * paragraph [0062] - paragraph [0063] ** figure 5 * | by applicant | JPH06145000 |