EP2602661 - Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 10.07.2020 Database last updated on 31.08.2024 | |
Former | The patent has been granted Status updated on 26.07.2019 | ||
Former | Grant of patent is intended Status updated on 19.03.2019 | Most recent event Tooltip | 01.07.2022 | Lapse of the patent in a contracting state New state(s): MK | published on 03.08.2022 [2022/31] | Applicant(s) | For all designated states Shin-Etsu Chemical Co., Ltd. 6-1, Otemachi 2-chome Chiyoda-ku Tokyo / JP | [2013/24] | Inventor(s) | 01 /
Takemura, Katsuya c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi, Niigata / JP | 02 /
Miyazaki, Takashi c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi, Niigata / JP | 03 /
Urano, Hiroyuki c/o New Functional Materials Research Center Shin-Etsu Chemical Co., Ltd. 28-1, Nishi Fukushima Kubiki-ku Joetsu-shi, Niigata / JP | [2013/24] | Representative(s) | Ter Meer Steinmeister & Partner Patentanwälte mbB Nymphenburger Straße 4 80335 München / DE | [2019/35] |
Former [2013/24] | Ter Meer Steinmeister & Partner Me/bk Mauerkircherstrasse 45 81679 München / DE | Application number, filing date | 12196245.0 | 10.12.2012 | [2013/24] | Priority number, date | JP20110270001 | 09.12.2011 Original published format: JP 2011270001 | [2013/24] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2602661 | Date: | 12.06.2013 | Language: | EN | [2013/24] | Type: | B1 Patent specification | No.: | EP2602661 | Date: | 28.08.2019 | Language: | EN | [2019/35] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 04.04.2013 | Classification | IPC: | G03F7/075, G03F7/085, G03F7/038, G03F7/16, G03F7/40 | [2018/41] | CPC: |
G03F7/0757 (EP,KR,US);
G03F7/0382 (EP,KR,US);
G03F7/0045 (KR);
G03F7/028 (KR);
G03F7/038 (KR,US);
G03F7/085 (EP,US);
G03F7/161 (EP,KR,US);
G03F7/2002 (KR,US);
G03F7/26 (KR);
|
Former IPC [2013/24] | G03F7/038, G03F7/075, G03F7/40 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2019/35] |
Former [2013/24] | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR | Title | German: | Chemisch verstärkte, negative Resistzusammensetzung, lichthärtbarer Trockenfilm, Herstellungsverfahren, Musterbildungsverfahren und Schutzfilm für elektrisches/elektronisches Teil | [2013/24] | English: | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | [2013/24] | French: | Composition de réserve négative amplifiée chimiquement, film sec photodurcissable, procédé de fabrication, procédé de formation de motif et film de protection de pièce électronique/électrique | [2013/24] | Examination procedure | 05.12.2013 | Amendment by applicant (claims and/or description) | 05.12.2013 | Examination requested [2014/05] | 07.10.2015 | Despatch of a communication from the examining division (Time limit: M04) | 04.02.2016 | Reply to a communication from the examining division | 20.03.2019 | Communication of intention to grant the patent | 19.07.2019 | Fee for grant paid | 19.07.2019 | Fee for publishing/printing paid | 19.07.2019 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 07.10.2015 | Opposition(s) | 03.06.2020 | No opposition filed within time limit [2020/33] | Fees paid | Renewal fee | 11.12.2014 | Renewal fee patent year 03 | 10.12.2015 | Renewal fee patent year 04 | 13.12.2016 | Renewal fee patent year 05 | 12.12.2017 | Renewal fee patent year 06 | 12.12.2018 | Renewal fee patent year 07 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | HU | 10.12.2012 | AL | 28.08.2019 | AT | 28.08.2019 | CY | 28.08.2019 | CZ | 28.08.2019 | DK | 28.08.2019 | EE | 28.08.2019 | ES | 28.08.2019 | FI | 28.08.2019 | HR | 28.08.2019 | IT | 28.08.2019 | LT | 28.08.2019 | LV | 28.08.2019 | MC | 28.08.2019 | MK | 28.08.2019 | MT | 28.08.2019 | NL | 28.08.2019 | PL | 28.08.2019 | RO | 28.08.2019 | RS | 28.08.2019 | SE | 28.08.2019 | SI | 28.08.2019 | SK | 28.08.2019 | SM | 28.08.2019 | TR | 28.08.2019 | BG | 28.11.2019 | NO | 28.11.2019 | GR | 29.11.2019 | GB | 10.12.2019 | IE | 10.12.2019 | LU | 10.12.2019 | IS | 28.12.2019 | PT | 30.12.2019 | BE | 31.12.2019 | CH | 31.12.2019 | LI | 31.12.2019 | [2022/31] |
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PT | 30.12.2019 | ||
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PT | 30.12.2019 | ||
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BG | 28.11.2019 | ||
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IS | 28.12.2019 | ||
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PT | 30.12.2019 | ||
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NO | 28.11.2019 | Documents cited: | Search | [X]US2004106064 (CHOI SANG-JUN [KR]) [X] 1,6-10 * paragraphs [0048] , [0086]; examples 8-11; claims 10-17,19-22,28,31,35,40,43,46,52,55,59,60 *; | [X]JP2007065488 (JSR CORP) [X] 1,8-10* paragraphs [0060] , [0065] , [0066]; example 11; claims 1,7 *; | [X]EP2105796 (FUJIFILM CORP [JP]) [X] 1,8-10 * paragraphs [0267] - [0269] - [0273] - [0276] - [0285] - [0299]; examples 1-11 * | by applicant | US3159601 | US3159662 | US3220972 | US3775452 | JP2003114531 | US6838229 | JP2008184571 | JP2009200315 | US7700403 | US7785766 |