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EP2724197
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EP About this file: EP2724197
| EP2724197 - METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 03.09.2021 Database last updated on 19.10.2024 | |
| Former | Grant of patent is intended Status updated on 17.12.2020 | Most recent event Tooltip | 03.09.2021 | Application deemed to be withdrawn | published on 06.10.2021 [2021/40] | Applicant(s) | For all designated states D2S, Inc. 4040 Moorpark Avenue Suite 250 San Jose, CA 95117 / US | [2014/18] | Inventor(s) | 01 /
FUJIMURA, Akira 15220 Sobey Road Saratoga, California 95070 / US | 02 /
BORK, Ingo 115 Beacon Street Mountain View, California 94040 / US | [2014/18] | Representative(s) | Haseltine Lake Kempner LLP One Portwall Square Portwall Lane Bristol BS1 6BH / GB | [N/P] |
| Former [2014/18] | Williams, Lisa Estelle Haseltine Lake LLP Redcliff Quay 120 Redcliff Street Bristol BS1 6HU / GB | Application number, filing date | 12804558.0 | 19.06.2012 | WO2012US43042 | Priority number, date | US201113168953 | 25.06.2011 Original published format: US201113168953 | [2014/18] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2013003102 | Date: | 03.01.2013 | Language: | EN | [2013/01] | Type: | A1 Application with search report | No.: | EP2724197 | Date: | 30.04.2014 | Language: | EN | The application published by WIPO in one of the EPO official languages on 03.01.2013 takes the place of the publication of the European patent application. | [2014/18] | Search report(s) | International search report - published on: | RU | 03.01.2013 | (Supplementary) European search report - dispatched on: | EP | 23.07.2015 | Classification | IPC: | G03F1/20, H01L21/027, B82Y10/00, G03F7/20, H01J37/317, G03F1/78, B82Y40/00 | [2015/35] | CPC: |
H01J37/3174 (EP,US);
G03F7/2037 (US);
B82Y10/00 (EP,US);
B82Y40/00 (EP,US);
G03F1/20 (US);
G03F1/78 (EP,US);
H01L21/027 (US);
H01J2237/31764 (EP,US);
H01J2237/31771 (EP,US);
|
| Former IPC [2014/18] | G03F1/20, H01L21/027 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2014/18] | Title | German: | VERFAHREN UND SYSTEM ZUR HERSTELLUNG VON MUSTERN MITHILFE EINER LADUNGSTRÄGERSTRAHL-LITHOGRAPHIE | [2014/18] | English: | METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY | [2014/18] | French: | PROCÉDÉ ET SYSTÈME DE FORMATION DE MOTIFS AU MOYEN D'UNE LITHOGRAPHIE PAR FAISCEAU DE PARTICULES CHARGÉES | [2014/18] | Entry into regional phase | 16.01.2014 | National basic fee paid | 16.01.2014 | Search fee paid | 16.01.2014 | Designation fee(s) paid | 16.01.2014 | Examination fee paid | Examination procedure | 16.01.2014 | Examination requested [2014/18] | 19.02.2016 | Amendment by applicant (claims and/or description) | 18.12.2020 | Communication of intention to grant the patent | 29.04.2021 | Application deemed to be withdrawn, date of legal effect [2021/40] | 21.05.2021 | Despatch of communication that the application is deemed to be withdrawn, reason: fee for grant / fee for printing not paid in time [2021/40] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 18.12.2020 | Fees paid | Renewal fee | 30.06.2014 | Renewal fee patent year 03 | 29.06.2015 | Renewal fee patent year 04 | 30.06.2016 | Renewal fee patent year 05 | 29.06.2017 | Renewal fee patent year 06 | 27.06.2018 | Renewal fee patent year 07 | 26.06.2019 | Renewal fee patent year 08 | 29.06.2020 | Renewal fee patent year 09 | Penalty fee | Additional fee for renewal fee | 30.06.2021 | 10 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US2011053093 (HAGIWARA KAZUYUKI [JP], et al) [X] 1-5,10-15 * figures 1-5 * * paragraph [0029] * * paragraph [0032] - paragraph [0037] * * paragraph [0038] * * claims 7-26 *; | [X]EP2302659 (D2S INC [US]) [X] 1-5,10-15 * figures 1-4,7, 8 * * claims 1-19 * * paragraph [0039] - paragraph [0041] * * paragraph [0043] - paragraph [0047] * * paragraph [0052] - paragraph [0055] *; | [A] - HAGIWARA KAZUYUKI ET AL, "Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction", PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XVIII, SPIE, 1000 20TH ST. BELLINGHAM WA 98225-6705 USA, (20110429), vol. 8081, no. 1, doi:10.1117/12.898862, pages 1 - 8, XP060015153 [A] 1-15 * the whole document * DOI: http://dx.doi.org/10.1117/12.898862 | [A] - PIERRAT CHRISTOPHE ET AL, "Mask data correction methodology in the context of model-based fracturing and advanced mask models", OPTICAL MICROLITHOGRAPHY XXIV, SPIE, 1000 20TH ST. BELLINGHAM WA 98225-6705 USA, (20110317), vol. 7973, no. 1, doi:10.1117/12.881550, pages 1 - 11, XP060009262 [A] 1-15 * the whole document * DOI: http://dx.doi.org/10.1117/12.881550 | International search | [A]US6917048 (FUJIWARA TOMOHARU [JP], et al); | [A]WO2010025032 (D2S INC [US], et al); | [A]US2011045409 (FUJIMURA AKIRA [US]); | [A]US2011053056 (FUJIMURA AKIRA [US], et al); | [A]WO2011025795 (D2S INC [US], et al) | by applicant | US2011053093 | EP2302659 |