EP2806451 - DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 01.12.2023 Database last updated on 31.08.2024 | |
Former | The patent has been granted Status updated on 23.12.2022 | ||
Former | Grant of patent is intended Status updated on 17.08.2022 | ||
Former | Examination is in progress Status updated on 08.04.2019 | Most recent event Tooltip | 24.05.2024 | Lapse of the patent in a contracting state New state(s): IT | published on 26.06.2024 [2024/26] | Applicant(s) | For all designated states Nikon Corporation 15-3, Konan 2-chome Minato-ku Tokyo 108-6290 / JP | [2015/36] |
Former [2014/48] | For all designated states Nikon Corporation 12-1, Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP | Inventor(s) | 01 /
OWA, Soichi c/o NIKON CORPORATION Intellectual Property Headquarters 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP | 02 /
WATANABE, Yoji c/o NIKON CORPORATION Intellectual Property Headquarters 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP | [2015/18] |
Former [2014/48] | 01 /
OWA Soichi c/o NIKON CORPORATION Intellectual Property Headquarters 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP | ||
02 /
WATANABE Yoji c/o NIKON CORPORATION Intellectual Property Headquarters 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 / JP | Representative(s) | Hoffmann Eitle Patent- und Rechtsanwälte PartmbB Arabellastraße 30 81925 München / DE | [2014/48] | Application number, filing date | 12865561.0 | 26.12.2012 | [2023/04] | WO2012JP83753 | Priority number, date | JP20120007727 | 18.01.2012 Original published format: JP 2012007727 | [2014/48] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2013108560 | Date: | 25.07.2013 | Language: | JA | [2013/30] | Type: | A1 Application with search report | No.: | EP2806451 | Date: | 26.11.2014 | Language: | EN | [2014/48] | Type: | B1 Patent specification | No.: | EP2806451 | Date: | 25.01.2023 | Language: | EN | [2023/04] | Search report(s) | International search report - published on: | JP | 25.07.2013 | (Supplementary) European search report - dispatched on: | EP | 19.04.2016 | Classification | IPC: | H01L21/027, G02B26/08, G03F7/20, G02F1/29 | [2016/20] | CPC: |
G03F7/70291 (EP,CN,US);
H01L21/0274 (KR);
G03F7/70058 (US);
G02F1/29 (US);
G03F7/70283 (EP,US);
G03F7/70433 (US);
|
Former IPC [2014/48] | H01L21/027, G02B26/08, G03F7/20 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2014/48] | Extension states | BA | Not yet paid | ME | Not yet paid | Title | German: | ANSTEUERVERFAHREN FÜR EINEN RAUMLICHTMODULATOR, VERFAHREN ZUM ERZEUGEN EINES BELICHTUNGSMUSTERS SOWIE BELICHTUNGSVERFAHREN UND -VORRICHTUNG | [2014/48] | English: | DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE | [2014/48] | French: | PROCÉDÉ DE COMMANDE POUR MODULATEUR SPATIAL DE LUMIÈRE, PROCÉDÉ DE GÉNÉRATION DE MOTIF POUR EXPOSITION ET PROCÉDÉ ET DISPOSITIF D'EXPOSITION | [2014/48] | Entry into regional phase | 13.08.2014 | Translation filed | 13.08.2014 | National basic fee paid | 13.08.2014 | Search fee paid | 13.08.2014 | Designation fee(s) paid | 13.08.2014 | Examination fee paid | Examination procedure | 13.08.2014 | Examination requested [2014/48] | 16.11.2016 | Amendment by applicant (claims and/or description) | 11.04.2019 | Despatch of a communication from the examining division (Time limit: M06) | 27.08.2019 | Reply to a communication from the examining division | 20.02.2020 | Despatch of a communication from the examining division (Time limit: M06) | 19.08.2020 | Reply to a communication from the examining division | 18.08.2022 | Communication of intention to grant the patent | 16.12.2022 | Fee for grant paid | 16.12.2022 | Fee for publishing/printing paid | 16.12.2022 | Receipt of the translation of the claim(s) | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 11.04.2019 | Opposition(s) | 26.10.2023 | No opposition filed within time limit [2024/01] | Fees paid | Renewal fee | 22.12.2014 | Renewal fee patent year 03 | 21.12.2015 | Renewal fee patent year 04 | 13.12.2016 | Renewal fee patent year 05 | 12.12.2017 | Renewal fee patent year 06 | 12.12.2018 | Renewal fee patent year 07 | 13.12.2019 | Renewal fee patent year 08 | 14.12.2020 | Renewal fee patent year 09 | 17.12.2021 | Renewal fee patent year 10 | 14.11.2022 | Renewal fee patent year 11 |
Opt-out from the exclusive Tooltip competence of the Unified Patent Court | See the Register of the Unified Patent Court for opt-out data | ||
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | AT | 25.01.2023 | CZ | 25.01.2023 | DK | 25.01.2023 | EE | 25.01.2023 | ES | 25.01.2023 | FI | 25.01.2023 | HR | 25.01.2023 | IT | 25.01.2023 | LT | 25.01.2023 | LV | 25.01.2023 | PL | 25.01.2023 | RO | 25.01.2023 | RS | 25.01.2023 | SI | 25.01.2023 | SK | 25.01.2023 | SM | 25.01.2023 | NO | 25.04.2023 | GR | 26.04.2023 | IS | 25.05.2023 | PT | 25.05.2023 | [2024/26] |
Former [2024/11] | AT | 25.01.2023 | |
CZ | 25.01.2023 | ||
DK | 25.01.2023 | ||
EE | 25.01.2023 | ||
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RO | 25.01.2023 | ||
RS | 25.01.2023 | ||
SI | 25.01.2023 | ||
SK | 25.01.2023 | ||
SM | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/50] | AT | 25.01.2023 | |
CZ | 25.01.2023 | ||
DK | 25.01.2023 | ||
EE | 25.01.2023 | ||
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RO | 25.01.2023 | ||
RS | 25.01.2023 | ||
SK | 25.01.2023 | ||
SM | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/49] | AT | 25.01.2023 | |
CZ | 25.01.2023 | ||
DK | 25.01.2023 | ||
EE | 25.01.2023 | ||
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RO | 25.01.2023 | ||
RS | 25.01.2023 | ||
SM | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/48] | AT | 25.01.2023 | |
DK | 25.01.2023 | ||
EE | 25.01.2023 | ||
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RS | 25.01.2023 | ||
SM | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/46] | AT | 25.01.2023 | |
DK | 25.01.2023 | ||
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RS | 25.01.2023 | ||
SM | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/39] | AT | 25.01.2023 | |
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RS | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
IS | 25.05.2023 | ||
PT | 25.05.2023 | ||
Former [2023/38] | AT | 25.01.2023 | |
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
PL | 25.01.2023 | ||
RS | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
PT | 25.05.2023 | ||
Former [2023/37] | AT | 25.01.2023 | |
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
RS | 25.01.2023 | ||
NO | 25.04.2023 | ||
GR | 26.04.2023 | ||
PT | 25.05.2023 | ||
Former [2023/36] | AT | 25.01.2023 | |
ES | 25.01.2023 | ||
FI | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
LV | 25.01.2023 | ||
RS | 25.01.2023 | ||
NO | 25.04.2023 | ||
PT | 25.05.2023 | ||
Former [2023/35] | AT | 25.01.2023 | |
ES | 25.01.2023 | ||
HR | 25.01.2023 | ||
LT | 25.01.2023 | ||
RS | 25.01.2023 | ||
NO | 25.04.2023 | ||
PT | 25.05.2023 | ||
Former [2023/34] | ES | 25.01.2023 | |
LT | 25.01.2023 | ||
RS | 25.01.2023 | ||
PT | 25.05.2023 | ||
Former [2023/33] | ES | 25.01.2023 | |
LT | 25.01.2023 | Documents cited: | Search | [XY]US2003076404 (TANIGUCHI YUKIO [JP]) [X] 1,4,7,8,13,15,17,18 * paragraphs [0058] , [0060] , [0 66] - [0068]; figure 4b * [Y] 2,3,5,6,9-12,14,16; | [Y]US2004150868 (LJUNGBLAD ULRIC [SE], et al) [Y] 5,6,16 * paragraph [0103] *; | [Y]US2005243397 (LATYPOV AZAT M [US]) [Y] 10-12* paragraphs [0029] - [0031]; figure 1 *; | [Y]US2008073588 (KRUIT PIETER [NL], et al) [Y] 2,3,9,14 * paragraphs [0049] , [0 50]; figures 5a, 5b *; | [Y]US2008074700 (OLSSON MARTIN [SE], et al) [Y] 2,3,9,14 * paragraph [0158]; figure 16a * | International search | [A]US6312134 (JAIN KANTI [US], et al); | [A]WO0241196 (BALL SEMICONDUCTOR INC [US]); | [A]JP2005536875 (MASKLESS LITHOGRAPHY, INC.); | [A]JP2006128194 (CANON KK); | [XP]WO2012043497 (NIKON CORP [JP], et al) | Examination | US2009117494 | by applicant | US5312513 | US6885493 | US2007242247 | WO2009060745 | - YIJIAN CHEN ET AL., "Design and fabrication of tilting and piston micromirrors for maskless lithography", PROC. OFSPIE (USA, (2005), vol. 5751, pages 1023 - 1037 |