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Extract from the Register of European Patents

EP About this file: EP2806451

EP2806451 - DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  01.12.2023
Database last updated on 31.08.2024
FormerThe patent has been granted
Status updated on  23.12.2022
FormerGrant of patent is intended
Status updated on  17.08.2022
FormerExamination is in progress
Status updated on  08.04.2019
Most recent event   Tooltip24.05.2024Lapse of the patent in a contracting state
New state(s): IT		published on 26.06.2024  [2024/26]
Applicant(s)For all designated states
Nikon Corporation
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
[2015/36]
Former [2014/48]For all designated states
Nikon Corporation
12-1, Yurakucho 1-chome Chiyoda-ku
Tokyo 100-8331 / JP
Inventor(s)01 / OWA, Soichi
c/o NIKON CORPORATION
Intellectual Property Headquarters
12-1 Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8331 / JP
02 / WATANABE, Yoji
c/o NIKON CORPORATION
Intellectual Property Headquarters
12-1 Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8331 / JP
 [2015/18]
Former [2014/48]01 / OWA Soichi
c/o NIKON CORPORATION
Intellectual Property Headquarters
12-1 Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8331 / JP
02 / WATANABE Yoji
c/o NIKON CORPORATION
Intellectual Property Headquarters
12-1 Yurakucho 1-chome
Chiyoda-ku
Tokyo 100-8331 / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2014/48]
Application number, filing date12865561.026.12.2012
[2023/04]
WO2012JP83753
Priority number, dateJP2012000772718.01.2012         Original published format: JP 2012007727
[2014/48]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2013108560
Date:25.07.2013
Language:JA
[2013/30]
Type: A1 Application with search report 
No.:EP2806451
Date:26.11.2014
Language:EN
[2014/48]
Type: B1 Patent specification 
No.:EP2806451
Date:25.01.2023
Language:EN
[2023/04]
Search report(s)International search report - published on:JP25.07.2013
(Supplementary) European search report - dispatched on:EP19.04.2016
ClassificationIPC:H01L21/027, G02B26/08, G03F7/20, G02F1/29
[2016/20]
CPC:
G03F7/70291 (EP,CN,US); H01L21/0274 (KR); G03F7/70058 (US);
G02F1/29 (US); G03F7/70283 (EP,US); G03F7/70433 (US);
G03F7/70508 (EP,CN,US); G02B26/0833 (EP,CN) (-)
Former IPC [2014/48]H01L21/027, G02B26/08, G03F7/20
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2014/48]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:ANSTEUERVERFAHREN FÜR EINEN RAUMLICHTMODULATOR, VERFAHREN ZUM ERZEUGEN EINES BELICHTUNGSMUSTERS SOWIE BELICHTUNGSVERFAHREN UND -VORRICHTUNG[2014/48]
English:DRIVE METHOD FOR SPATIAL LIGHT MODULATOR, METHOD FOR GENERATING PATTERN FOR EXPOSURE, AND EXPOSURE METHOD AND DEVICE[2014/48]
French:PROCÉDÉ DE COMMANDE POUR MODULATEUR SPATIAL DE LUMIÈRE, PROCÉDÉ DE GÉNÉRATION DE MOTIF POUR EXPOSITION ET PROCÉDÉ ET DISPOSITIF D'EXPOSITION[2014/48]
Entry into regional phase13.08.2014Translation filed 
13.08.2014National basic fee paid 
13.08.2014Search fee paid 
13.08.2014Designation fee(s) paid 
13.08.2014Examination fee paid 
Examination procedure13.08.2014Examination requested  [2014/48]
16.11.2016Amendment by applicant (claims and/or description)
11.04.2019Despatch of a communication from the examining division (Time limit: M06)
27.08.2019Reply to a communication from the examining division
20.02.2020Despatch of a communication from the examining division (Time limit: M06)
19.08.2020Reply to a communication from the examining division
18.08.2022Communication of intention to grant the patent
16.12.2022Fee for grant paid
16.12.2022Fee for publishing/printing paid
16.12.2022Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  11.04.2019
Opposition(s)26.10.2023No opposition filed within time limit [2024/01]
Fees paidRenewal fee
22.12.2014Renewal fee patent year 03
21.12.2015Renewal fee patent year 04
13.12.2016Renewal fee patent year 05
12.12.2017Renewal fee patent year 06
12.12.2018Renewal fee patent year 07
13.12.2019Renewal fee patent year 08
14.12.2020Renewal fee patent year 09
17.12.2021Renewal fee patent year 10
14.11.2022Renewal fee patent year 11
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipAT25.01.2023
CZ25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
IT25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SI25.01.2023
SK25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
[2024/26]
Former [2024/11]AT25.01.2023
CZ25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SI25.01.2023
SK25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/50]AT25.01.2023
CZ25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SK25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/49]AT25.01.2023
CZ25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RO25.01.2023
RS25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/48]AT25.01.2023
DK25.01.2023
EE25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RS25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/46]AT25.01.2023
DK25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RS25.01.2023
SM25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/39]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RS25.01.2023
NO25.04.2023
GR26.04.2023
IS25.05.2023
PT25.05.2023
Former [2023/38]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
PL25.01.2023
RS25.01.2023
NO25.04.2023
GR26.04.2023
PT25.05.2023
Former [2023/37]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
RS25.01.2023
NO25.04.2023
GR26.04.2023
PT25.05.2023
Former [2023/36]AT25.01.2023
ES25.01.2023
FI25.01.2023
HR25.01.2023
LT25.01.2023
LV25.01.2023
RS25.01.2023
NO25.04.2023
PT25.05.2023
Former [2023/35]AT25.01.2023
ES25.01.2023
HR25.01.2023
LT25.01.2023
RS25.01.2023
NO25.04.2023
PT25.05.2023
Former [2023/34]ES25.01.2023
LT25.01.2023
RS25.01.2023
PT25.05.2023
Former [2023/33]ES25.01.2023
LT25.01.2023
Documents cited:Search[XY]US2003076404  (TANIGUCHI YUKIO [JP]) [X] 1,4,7,8,13,15,17,18 * paragraphs [0058] , [0060] , [0 66] - [0068]; figure 4b * [Y] 2,3,5,6,9-12,14,16;
 [Y]US2004150868  (LJUNGBLAD ULRIC [SE], et al) [Y] 5,6,16 * paragraph [0103] *;
 [Y]US2005243397  (LATYPOV AZAT M [US]) [Y] 10-12* paragraphs [0029] - [0031]; figure 1 *;
 [Y]US2008073588  (KRUIT PIETER [NL], et al) [Y] 2,3,9,14 * paragraphs [0049] , [0 50]; figures 5a, 5b *;
 [Y]US2008074700  (OLSSON MARTIN [SE], et al) [Y] 2,3,9,14 * paragraph [0158]; figure 16a *
International search[A]US6312134  (JAIN KANTI [US], et al);
 [A]WO0241196  (BALL SEMICONDUCTOR INC [US]);
 [A]JP2005536875  (MASKLESS LITHOGRAPHY, INC.);
 [A]JP2006128194  (CANON KK);
 [XP]WO2012043497  (NIKON CORP [JP], et al)
ExaminationUS2009117494
by applicantUS5312513
 US6885493
 US2007242247
 WO2009060745
    - YIJIAN CHEN ET AL., "Design and fabrication of tilting and piston micromirrors for maskless lithography", PROC. OFSPIE (USA, (2005), vol. 5751, pages 1023 - 1037
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.