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Extract from the Register of European Patents

EP About this file: EP2587545

EP2587545 - High-voltage vertical FET and method of manufacturing the same [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  07.10.2016
Database last updated on 16.11.2024
Most recent event   Tooltip07.10.2016Application deemed to be withdrawnpublished on 09.11.2016  [2016/45]
Applicant(s)For all designated states
Power Integrations, Inc.
5245 Hellyer Avenue
San Jose, California 95138 / US
[2013/18]
Inventor(s)01 / Parthasarathy, Vijay
850 University Avenue
Palo Alto, CA 94301 / US
 [2013/18]
Representative(s)Conroy, John, et al
Fish & Richardson P.C.
Highlight Business Towers
Mies-van-der-Rohe-Straße 8
80807 München / DE
[N/P]
Former [2013/18]Schley, Jan Malte
Fish & Richardson P.C.
Mies-van-der-Rohe-Straße 8
80807 München / DE
Application number, filing date13152055.328.11.2007
[2013/18]
Priority number, dateUS2007070740316.02.2007         Original published format: US 707403
[2013/18]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2587545
Date:01.05.2013
Language:EN
[2013/18]
Search report(s)(Supplementary) European search report - dispatched on:EP05.04.2013
ClassificationIPC:H01L29/78, H01L29/423, H01L29/40, H01L29/06, // H01L21/77
[2013/18]
CPC:
H01L29/7813 (EP,US); H01L29/0696 (EP,US); H01L29/407 (EP,US);
H01L29/4238 (EP,US); H01L21/77 (EP,US); H01L29/0878 (EP,US);
H01L29/41741 (EP,US); H01L29/4236 (EP,US); H01L29/42372 (EP,US) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MT,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2013/18]
TitleGerman:Vertikaler Hochspannung-FET und Verfahren zu dessen Herstellung[2013/18]
English:High-voltage vertical FET and method of manufacturing the same[2013/18]
French:Transistor vertical à effet de champ et à haute tension et son procédé de fabrication[2013/18]
Examination procedure19.02.2013Examination requested  [2013/18]
02.05.2013Despatch of a communication from the examining division (Time limit: M04)
11.09.2013Reply to a communication from the examining division
18.03.2015Despatch of a communication from the examining division (Time limit: M06)
14.09.2015Reply to a communication from the examining division
01.06.2016Application deemed to be withdrawn, date of legal effect  [2016/45]
30.06.2016Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2016/45]
Parent application(s)   TooltipEP07254619.5  / EP1959500
EP11168216.7  / EP2365533
Fees paidRenewal fee
19.02.2013Renewal fee patent year 03
19.02.2013Renewal fee patent year 04
19.02.2013Renewal fee patent year 05
19.02.2013Renewal fee patent year 06
27.11.2013Renewal fee patent year 07
26.11.2014Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
30.11.201509   M06   Not yet paid
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Documents cited:Search[A]US5798554  (GRIMALDI ANTONIO [IT], et al) [A] 1* Fig. 1 and related text *;
 [YA]US6337498  (HASEGAWA SHIGERU [JP], et al) [Y] 1-3 * column 4, line 43 - column 5, line 15; figure 1 * * columns 1,2 * [A] 4-15;
 [YA]EP1689001  (POWER INTEGRATIONS INC [US]) [Y] 1-3 * paragraphs [0045] - [0048] - [0 55] , [0 76] , [0 83]; figures 4,5,8 * [A] 4-15
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