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Extract from the Register of European Patents

EP About this file: EP2613192

EP2613192 - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  02.09.2016
Database last updated on 09.09.2024
Most recent event   Tooltip17.08.2018Lapse of the patent in a contracting state
New state(s): BG		published on 19.09.2018  [2018/38]
Applicant(s)For all designated states
Nikon Corporation
15-3, Konan 2-chome
Minato-ku
Tokyo 108-6290 / JP
[2015/36]
Former [2013/28]For all designated states
Nikon Corporation
12-1, Yurakucho 1-chome Chiyoda-ku
Tokyo 100-8331 / JP
Inventor(s)01 / Binnard, Michael
2444 Coronet Boulevard
Belmont, CA 94000 / US
 [2013/28]
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2015/44]
Former [2013/28]HOFFMANN EITLE
Patent- und Rechtsanwälte
Arabellastrasse 4
81925 München / DE
Application number, filing date13154183.117.03.2004
[2013/28]
Priority number, dateUS20030462499P11.04.2003         Original published format: US 462499 P
[2013/28]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2613192
Date:10.07.2013
Language:EN
[2013/28]
Type: A3 Search report 
No.:EP2613192
Date:11.06.2014
Language:EN
[2014/24]
Type: B1 Patent specification 
No.:EP2613192
Date:28.10.2015
Language:EN
[2015/44]
Search report(s)(Supplementary) European search report - dispatched on:EP09.05.2014
ClassificationIPC:G03B27/32, G03B27/42, G03B27/58, G03F7/20, G03B27/52
[2013/28]
CPC:
G03F7/70341 (EP,KR,US); G03B27/52 (EP,KR,US); G03F7/20 (KR);
G03F7/2012 (KR); G03F7/2041 (KR); G03F7/2055 (KR);
G03F7/2063 (KR); G03F7/30 (KR); G03F7/70716 (EP,KR,US);
G03F7/70725 (US); G03F7/70733 (EP,KR,US); G03F7/70833 (KR) (-)
Designated contracting statesAT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HU,   IE,   IT,   LI,   LU,   MC,   NL,   PL,   PT,   RO,   SE,   SI,   SK,   TR [2015/44]
Former [2013/28]AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HU,  IE,  IT,  LI,  LU,  MC,  NL,  PL,  PT,  RO,  SE,  SI,  SK,  TR 
TitleGerman:Vorrichtung und Verfahren zur Erhaltung von Immersionsflüssigkeit in der Spalte unter einer Projektionslinse während des Waferaustauschs in einer Immersionslithografiemaschine[2013/28]
English:Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine[2013/28]
French:Appareil et procédé permettant de maintenir un fluide d'immersion dans l'espace sous une lentille de projection pendant un échange de plaques dans une machine de lithographie par immersion[2013/28]
Examination procedure18.09.2014Amendment by applicant (claims and/or description)
24.09.2014Examination requested  [2014/45]
22.05.2015Communication of intention to grant the patent
15.09.2015Fee for grant paid
15.09.2015Fee for publishing/printing paid
15.09.2015Receipt of the translation of the claim(s)
Parent application(s)   TooltipEP04721260.0  / EP1616220
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued (EP20040721260) is  03.03.2011
Opposition(s)29.07.2016No opposition filed within time limit [2016/40]
Fees paidRenewal fee
06.02.2013Renewal fee patent year 03
06.02.2013Renewal fee patent year 04
06.02.2013Renewal fee patent year 05
06.02.2013Renewal fee patent year 06
06.02.2013Renewal fee patent year 07
06.02.2013Renewal fee patent year 08
06.02.2013Renewal fee patent year 09
06.02.2013Renewal fee patent year 10
18.03.2014Renewal fee patent year 11
23.03.2015Renewal fee patent year 12
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU17.03.2004
AT28.10.2015
BG28.10.2015
CY28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
TR28.10.2015
GR29.01.2016
PT29.02.2016
GB17.03.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
FR31.03.2016
LI31.03.2016
[2018/38]
Former [2018/29]HU17.03.2004
AT28.10.2015
CY28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
TR28.10.2015
GR29.01.2016
PT29.02.2016
GB17.03.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
FR31.03.2016
LI31.03.2016
Former [2018/28]HU17.03.2004
AT28.10.2015
CY28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
GB17.03.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
FR31.03.2016
LI31.03.2016
Former [2017/10]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
GB17.03.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
FR31.03.2016
LI31.03.2016
Former [2017/08]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
GB17.03.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
LI31.03.2016
Former [2017/07]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
LU17.03.2016
BE31.03.2016
CH31.03.2016
LI31.03.2016
Former [2016/49]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
MC28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SI28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
LU17.03.2016
BE31.03.2016
Former [2016/47]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
LU17.03.2016
BE31.03.2016
Former [2016/39]AT28.10.2015
CZ28.10.2015
DK28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
BE31.03.2016
Former [2016/36]AT28.10.2015
CZ28.10.2015
EE28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
PL28.10.2015
RO28.10.2015
SE28.10.2015
SK28.10.2015
GR29.01.2016
PT29.02.2016
BE31.03.2016
Former [2016/34]AT28.10.2015
CZ28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
PL28.10.2015
SE28.10.2015
GR29.01.2016
PT29.02.2016
Former [2016/24]AT28.10.2015
ES28.10.2015
FI28.10.2015
IT28.10.2015
PL28.10.2015
SE28.10.2015
GR29.01.2016
PT29.02.2016
Former [2016/23]ES28.10.2015
IT28.10.2015
SE28.10.2015
Former [2016/21]ES28.10.2015
IT28.10.2015
Former [2016/20]ES28.10.2015
Documents cited:Search[A]US5825043  (SUWA KYOICHI [JP]) [A] 1-24* column 23, lines 1-67; figure 9 *;
 [A]WO9949504  (NIKON CORP [JP], et al) [A] 1-24 * abstract *;
 [A]US2001004105  (KWAN YIM BUN P [NL], et al) [A] 1-24 * paragraphs [0025] - [0032] - [ 106]; figure 2 *
by applicantJPH08136475
 US5528118
 US5528100
 JPH08171054
 JPH08330224
 JPH08334695
 US5623853
 US5668672
 US5689377
 JPH103039
 JPH1020195
 US5835275
 US5874820
 US6262796
 US6341007
 US19970873605
 US20030462142
 US20030462112
 US20030500312
 US20040541329
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.