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Extract from the Register of European Patents

EP About this file: EP2657764

EP2657764 - Manufacturing method of a photomask blank [Right-click to bookmark this link]
Former [2013/44]Photomask blank and manufacturing method thereof
[2020/06]
StatusNo opposition filed within time limit
Status updated on  12.03.2021
Database last updated on 13.11.2024
FormerThe patent has been granted
Status updated on  03.04.2020
FormerGrant of patent is intended
Status updated on  30.01.2020
FormerRequest for examination was made
Status updated on  29.09.2017
Most recent event   Tooltip06.09.2024Lapse of the patent in a contracting state
New state(s): MT		published on 09.10.2024  [2024/41]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome Chiyoda-ku
Tokyo 100-0004 / JP
[2020/19]
Former [2013/44]For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome Chiyoda-ku
Tokyo 100-0004 / JP
Inventor(s)01 / Fukaya, Souichi
c/o Shin-Etsu Chemical Co., Ltd.
New Functional Materials Research Center
28-1, Nishifukushima
Kubiki-ku
Joetsu-shi, Niigata 942-8601 / JP
 [2013/44]
Representative(s)Forrest, Stuart, et al
WP Thompson
138 Fetter Lane
London EC4A 1BT / GB
[2020/19]
Former [2013/44]Smaggasgale, Gillian Helen
WP Thompson
55 Drury Lane
London WC2B 5SQ / GB
Application number, filing date13165445.125.04.2013
[2013/44]
Priority number, dateJP2012010082126.04.2012         Original published format: JP 2012100821
[2013/44]
Filing languageEN
Procedural languageEN
PublicationType: A2 Application without search report 
No.:EP2657764
Date:30.10.2013
Language:EN
[2013/44]
Type: A3 Search report 
No.:EP2657764
Date:05.07.2017
Language:EN
[2017/27]
Type: B1 Patent specification 
No.:EP2657764
Date:06.05.2020
Language:EN
[2020/19]
Search report(s)(Supplementary) European search report - dispatched on:EP01.06.2017
ClassificationIPC:G03F1/26, G03F1/50, G03F1/32
[2017/27]
CPC:
G03F1/26 (EP,KR,US); H01L21/0274 (KR); G03F1/20 (KR);
G03F1/32 (EP,KR,US); G03F1/50 (KR,US); G03F1/58 (KR);
G03F1/82 (KR) (-)
Former IPC [2013/44]G03F1/26, G03F1/50
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/44]
Former [2013/44]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:Herstellungsverfahren für einen Fotomaskenrohling[2020/06]
English:Manufacturing method of a photomask blank[2020/06]
French:Procédé de fabrication d'une ébauche de photomasque[2020/06]
Former [2013/44]Fotomaskenrohling und Herstellungsverfahren dafür
Former [2013/44]Photomask blank and manufacturing method thereof
Former [2013/44]Ébauche de photomasque et son procédé de fabrication
Examination procedure25.04.2013Date on which the examining division has become responsible
20.09.2017Amendment by applicant (claims and/or description)
20.09.2017Examination requested  [2017/44]
31.01.2020Communication of intention to grant the patent
25.03.2020Fee for grant paid
25.03.2020Fee for publishing/printing paid
25.03.2020Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  31.01.2020
Opposition(s)09.02.2021No opposition filed within time limit [2021/15]
Fees paidRenewal fee
10.04.2015Renewal fee patent year 03
30.03.2016Renewal fee patent year 04
10.04.2017Renewal fee patent year 05
11.04.2018Renewal fee patent year 06
15.04.2019Renewal fee patent year 07
31.03.2020Renewal fee patent year 08
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU25.04.2013
AL06.05.2020
AT06.05.2020
CY06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
MK06.05.2020
MT06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
PT07.09.2020
[2024/41]
Former [2024/22]HU25.04.2013
AL06.05.2020
AT06.05.2020
CY06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
MK06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
PT07.09.2020
Former [2023/30]HU25.04.2013
AL06.05.2020
AT06.05.2020
CY06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
PT07.09.2020
Former [2023/27]HU25.04.2013
AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
PT07.09.2020
Former [2022/10]AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
PT07.09.2020
Former [2021/50]AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
MC06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/24]AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SI06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/10]AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
NL06.05.2020
PL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SK06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/09]AL06.05.2020
AT06.05.2020
CZ06.05.2020
DK06.05.2020
EE06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
NL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/08]AL06.05.2020
DK06.05.2020
ES06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
NL06.05.2020
RO06.05.2020
RS06.05.2020
SE06.05.2020
SM06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/04]AL06.05.2020
FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
NL06.05.2020
RS06.05.2020
SE06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2021/01]FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
RS06.05.2020
SE06.05.2020
BG06.08.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2020/51]FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
RS06.05.2020
SE06.05.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2020/50]FI06.05.2020
HR06.05.2020
LT06.05.2020
LV06.05.2020
SE06.05.2020
NO06.08.2020
GR07.08.2020
IS06.09.2020
PT07.09.2020
Former [2020/48]FI06.05.2020
LT06.05.2020
SE06.05.2020
NO06.08.2020
IS06.09.2020
PT07.09.2020
Former [2020/47]LT06.05.2020
NO06.08.2020
IS06.09.2020
Former [2020/46]IS06.09.2020
Documents cited:Search[X]JPH06258817  (TOPPAN PRINTING CO LTD) [X] 1,4,5,10 * paragraphs [0046] , [0050] - [0055]; examples 1-9 *;
 [X]US2002061452  (NOZAWA OSAMU [JP], et al) [X] 1,4 * paragraphs [0037] , [0044] - [0051] - [0056] , [0065] , [0075] , [0084]; examples 1-16; claims 1,2,5,9-11; tables 1-4 *;
 [AD]JP2004199035  (SHINETSU CHEMICAL CO) [AD] 1-10* paragraph [0022] *;
 [XI]EP2237109  (SHINETSU CHEMICAL CO [JP]) [X] 1-5,7,8,10 * paragraphs [0018] - [0021] - [0067] - [0069] - [0073] , [0080] - [0089]; figures 1,2; examples 1,2; claims 1,6-8 * [I] 9;
 [X]US2011111332  (IWASHITA HIROYUKI [JP], et al) [X] 1,2,4 * paragraph [0204]; example 1 *
by applicantJPH07140635
 JP2002229183
 JP2003050458
 JP2004199035
 JP2005331554
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.