EP2886685 - Device for accumulating a treatment liquid inside of a treatment area of a horizontal processing apparatus for a galvanic or wet-chemical metal deposition [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 10.06.2016 Database last updated on 02.11.2024 | Most recent event Tooltip | 10.06.2016 | Application deemed to be withdrawn | published on 13.07.2016 [2016/28] | Applicant(s) | For all designated states MKS IP Association Erasmusstraße 20 10553 Berlin / DE | [N/P] |
Former [2015/26] | For all designated states Atotech Deutschland GmbH Erasmusstraße 20 10553 Berlin / DE | Inventor(s) | 01 /
Grüßner, Stefan Blumenstraße 5 91177 Thalmässing / DE | 02 /
Wiener, Ferdinand Holsteinerstraße 6a 90559 Burgthann / DE | [2015/26] | Representative(s) | Wonnemann, Jörg Atotech Deutschland GmbH Patent Management Erasmusstraße 20 10553 Berlin / DE | [2015/26] | Application number, filing date | 13198968.3 | 20.12.2013 | [2015/26] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | EP2886685 | Date: | 24.06.2015 | Language: | EN | [2015/26] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 02.04.2014 | Classification | IPC: | C25D17/00, C25D17/02, C23C18/16, C25D7/06, H05K3/00 | [2015/26] | CPC: |
H05K3/0085 (EP);
C23C18/1628 (EP);
C25D17/00 (EP);
C25D17/001 (EP);
C25D17/02 (EP);
C25D21/12 (EP);
C25D7/0621 (EP);
C25D7/0664 (EP);
H05K3/241 (EP);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2015/26] | Extension states | BA | Not yet paid | ME | Not yet paid | Title | German: | Vorrichtung zum Ansammeln einer Behandlungsflüssigkeit in einem Behandlungsbereich einer horizontalen Verarbeitungsvorrichtung für galvanische nasschemische Metallabscheidung | [2015/26] | English: | Device for accumulating a treatment liquid inside of a treatment area of a horizontal processing apparatus for a galvanic or wet-chemical metal deposition | [2015/26] | French: | Dispositif destiné à accumuler un liquide de traitement à l'intérieur d'une zone de traitement d'un appareil de traitement horizontal ou galvanique pour un dépôt métallique par voie chimique humide | [2015/26] | Examination procedure | 20.12.2013 | Examination requested [2015/26] | 05.01.2016 | Application deemed to be withdrawn, date of legal effect [2016/28] | 01.02.2016 | Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [2016/28] | Fees paid | Penalty fee | Additional fee for renewal fee | 31.12.2015 | 03   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XYI]JPH06283643 (MATSUSHITA TETSUO) [X] 1,4,5,11-15 * paragraph [0021]; figure 2 * * paragraph [0023] - paragraph [0024] * [Y] 6-9 [I] 2,3,10; | [Y]US2010203252 (KAWASHITA MAMORU [JP], et al) [Y] 6,7 * abstract *; | [Y]JPH11256393 (SUMITOMO METAL IND) [Y] 8,9 * claims 2,3 * |