blank Quick help
blank Maintenance news

Scheduled maintenance

Regular maintenance outages:
between 05.00 and 05.15 hrs CET (Monday to Sunday).

Other outages
Availability
Register Forum

2022.02.11

More...
blank News flashes

News flashes

New version of the European Patent Register - SPC information for Unitary Patents.

2024-03-06

More...
blank Related links

Extract from the Register of European Patents

EP About this file: EP2823359

EP2823359 - ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  16.09.2016
Database last updated on 13.07.2024
Most recent event   Tooltip16.09.2016Application deemed to be withdrawnpublished on 19.10.2016  [2016/42]
Applicant(s)For all designated states
Fujifilm Corporation
26-30 Nishiazabu 2-chome
Minato-ku
Tokyo 106-8620 / JP
[N/P]
Former [2015/03]For all designated states
Fujifilm Corporation
26-30 Nishiazabu 2-chome Minato-ku
Tokyo 106-8620 / JP
Inventor(s)01 / INASAKI, Takeshi
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun, Shizuoka 421-0396 / JP
02 / KAWABATA, Takeshi
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun, Shizuoka 421-0396 / JP
03 / TSUCHIMURA, Tomotaka
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun, Shizuoka 421-0396 / JP
04 / TSUCHIHASHI, Toru
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun, Shizuoka 421-0396 / JP
 [2015/28]
Former [2015/03]01 / INASAKI, Takeshi
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun Shizuoka 421-0396 / JP
02 / KAWABATA, Takeshi
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun Shizuoka 421-0396 / JP
03 / TSUCHIMURA, Tomotaka
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun Shizuoka 421-0396 / JP
04 / TSUCHIHASHI, Toru
c/o FUJIFILM Corporation
4000 Kawashiri
Yoshida-cho
Haibara-gun Shizuoka 421-0396 / JP
Representative(s)Hoffmann Eitle
Patent- und Rechtsanwälte PartmbB
Arabellastraße 30
81925 München / DE
[2015/03]
Application number, filing date13758306.801.03.2013
WO2013JP56378
Priority number, dateJP2012004856205.03.2012         Original published format: JP 2012048562
[2015/03]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2013133396
Date:12.09.2013
Language:EN
[2013/37]
Type: A1 Application with search report 
No.:EP2823359
Date:14.01.2015
Language:EN
The application published by WIPO in one of the EPO official languages on 12.09.2013 takes the place of the publication of the European patent application.
[2015/03]
Search report(s)International search report - published on:JP12.09.2013
(Supplementary) European search report - dispatched on:EP17.09.2015
ClassificationIPC:C08F212/14, G03F7/039, H01L21/027
[2015/43]
CPC:
C08F212/24 (EP,KR,US); G03F7/039 (KR); C08F12/22 (US);
C08F12/24 (EP,US); C08F212/22 (EP,US); C08F212/30 (EP,KR,US);
C08F220/301 (KR); C08F261/02 (US); C08F8/02 (EP,US);
C09D125/18 (EP,US); G03F1/00 (EP,US); G03F7/0002 (EP,US);
G03F7/0388 (US); G03F7/0392 (EP,US); G03F7/0397 (EP,US);
G03F7/20 (US); H01L21/027 (KR); C08F12/30 (US) (-)
C-Set:
C08F212/24, C08F212/22 (EP,US);
C08F212/24, C08F212/22, C08F212/30 (EP,US);
C08F212/24, C08F212/32 (EP,US);
C08F212/24, C08F212/32, C08F212/32 (EP,US);
C08F8/02, C08F12/24 (EP,US)
(-)
Former IPC [2015/03]G03F7/039, C08F212/14, H01L21/027
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/03]
TitleGerman:GEGENÜBER AKTINISCHER STRAHLUNG EMPFINDLICHE BZW. STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG UND GEGENÜBER AKTINISCHER STRAHLUNG EMPFINDLICHER BZW. STRAHLUNGSEMPFINDLICHER FILM UND VERFAHREN ZUR STRUKTURFORMUNG MIT DER ZUSAMMENSETZUNG[2015/03]
English:ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION[2015/03]
French:COMPOSITION DE RÉSINE SENSIBLE AUX RAYONNEMENTS ACTINIQUES OU SENSIBLE AUX RAYONNEMENTS, ET PROCÉDÉ DE FORMATION D'UN FILM ET D'UN MOTIF SENSIBLES AUX RAYONNEMENTS ACTINIQUES OU SENSIBLES AUX RAYONNEMENTS, CHACUN UTILISANT LA COMPOSITION[2015/03]
Entry into regional phase07.08.2014National basic fee paid 
07.08.2014Search fee paid 
07.08.2014Designation fee(s) paid 
07.08.2014Examination fee paid 
Examination procedure07.08.2014Examination requested  [2015/03]
19.04.2016Application deemed to be withdrawn, date of legal effect  [2016/42]
31.05.2016Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2016/42]
Fees paidRenewal fee
10.03.2015Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
31.03.201604   M06   Not yet paid
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court
See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[A]US2010248149  (TSUCHIMURA TOMOTAKA [JP], et al) [A] 1-17* the whole document *
International search[A]JPH03282550  (OKI ELECTRIC IND CO LTD);
 [A]US2007148584  (TAKEDA TAKANOBU [JP], et al);
 [A]WO2009035044  (FUJIFILM CORP [JP], et al);
 [XP]JP2013020226  (FUJIFILM CORP)
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.