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Extract from the Register of European Patents

EP About this file: EP2851937

EP2851937 - POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE [Right-click to bookmark this link]
StatusThe application has been withdrawn
Status updated on  08.09.2017
Database last updated on 31.08.2024
FormerExamination is in progress
Status updated on  26.05.2017
Most recent event   Tooltip08.09.2017Withdrawal of applicationpublished on 11.10.2017  [2017/41]
Applicant(s)For all designated states
Fujimi Incorporated
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi, Aichi 452-8502 / JP
[2015/13]
Inventor(s)01 / YAMATO, Yasuyuki
c/o FUJIMI INCORPORATED
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi Aichi 452-8502 / JP
02 / AKATSUKA, Tomohiko
c/o FUJIMI INCORPORATED
1-1 Chiryo 2-chome
Nishibiwajima-cho
Kiyosu-shi Aichi 452-8502 / JP
 [2015/13]
Representative(s)Grünecker Patent- und Rechtsanwälte PartG mbB
Leopoldstraße 4
80802 München / DE
[N/P]
Former [2015/13]Grünecker, Kinkeldey, Stockmair & Schwanhäusser
Anwaltssozietät
Leopoldstrasse 4
80802 München / DE
Application number, filing date13790468.604.04.2013
WO2013JP60347
Priority number, dateJP2012011459618.05.2012         Original published format: JP 2012114596
[2015/13]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2013172111
Date:21.11.2013
Language:JA
[2013/47]
Type: A1 Application with search report 
No.:EP2851937
Date:25.03.2015
Language:EN
[2015/13]
Search report(s)International search report - published on:JP21.11.2013
(Supplementary) European search report - dispatched on:EP14.12.2015
ClassificationIPC:H01L21/3105, B24B37/04, C09K3/14, H01L21/762, C09G1/02
[2016/02]
CPC:
C09G1/02 (EP,CN,KR,US); C09K3/1454 (KR); H01L21/31053 (EP,CN,KR,US);
B24B37/044 (EP,CN,US); C09K3/1436 (EP,CN,US); C09K3/1463 (EP,CN,US);
H01L21/30625 (KR); H01L21/31055 (US); H01L21/76224 (EP,CN,KR,US) (-)
Former IPC [2015/13]H01L21/304, B24B37/00, C09K3/14
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2015/13]
TitleGerman:POLIERZUSAMMENSETZUNG, POLIERVERFAHREN DAMIT UND VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATS[2015/13]
English:POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE[2015/13]
French:COMPOSITION DE POLISSAGE, PROCÉDÉ DE POLISSAGE QUI UTILISE CETTE DERNIÈRE ET PROCÉDÉ PERMETTANT DE PRODUIRE UN SUBSTRAT[2015/13]
Entry into regional phase27.11.2014Translation filed 
27.11.2014National basic fee paid 
27.11.2014Search fee paid 
27.11.2014Designation fee(s) paid 
27.11.2014Examination fee paid 
Examination procedure27.11.2014Examination requested  [2015/13]
20.07.2016Amendment by applicant (claims and/or description)
30.05.2017Despatch of a communication from the examining division (Time limit: M06)
30.08.2017Application withdrawn by applicant  [2017/41]
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  30.05.2017
Fees paidRenewal fee
27.04.2015Renewal fee patent year 03
30.03.2016Renewal fee patent year 04
26.04.2017Renewal fee patent year 05
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XI]US2006096179  (LU BIN [US], et al) [X] 1-5,7-9 * claims 1,3,7-10 * * paragraph [0038] - paragraph [0039] * [I] 6;
 [X]EP1104778  (JSR CORP [JP]) [X] 1-4,6-9 * claims 1,6,8 * * paragraph [0104] *;
 [XI]GB2390370  (FUJIMI INC [JP]) [X] 1-5 * page 4, line 24 - line 35 * * claims 1, 3-5 * [I] 6;
 [XI]WO2008070113  (CABOT MICROELECTRONICS CORP [US]) [X] 1-4,7-9 * claims 1-5 * * paragraph [0030] - paragraph [0033] * [I] 5,6;
 [XI]US2003124959  (SCHROEDER DAVID J [US], et al) [X] 1-6 * claims 1,3-6,12 * [I] 7;
 [X]US2003211815  (CARTER PHILLIP [US], et al) [X] 1-9 * claims 1,14-18 *;
 [AP]US2013072021  (CUI JI [US], et al) [AP] 1-9 * the whole document *
International search[A]WO2011093153  (JSR CORP [JP], et al);
 [A]JP2006041252  (HITACHI CHEMICAL CO LTD);
 [A]JP2004031905  (SAMSUNG ELECTRONICS CO LTD);
 [A]JP2006318952  (HITACHI CHEMICAL CO LTD);
 [A]WO2006035779  (HITACHI CHEMICAL CO LTD [JP], et al);
 [A]JP2011181884  (HITACHI CHEMICAL CO LTD)
by applicantWO2004010487
 WO2008032681
 JP2011181946
    - "Sulfonicacid-functionalized silica through of thiol groups", CHEM. COMMUN., (2003), pages 246 - 247
    - "Novel Silane Coupling Agents Containing a Photolabile 2-Nitrobenzyl Ester for Introduction of a Carboxy Group on the Surface of Silica Gel", CHEMISTRY LETTERS, (2000), vol. 3, pages 228 - 229
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.