EP2851937 - POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 08.09.2017 Database last updated on 31.08.2024 | |
Former | Examination is in progress Status updated on 26.05.2017 | Most recent event Tooltip | 08.09.2017 | Withdrawal of application | published on 11.10.2017 [2017/41] | Applicant(s) | For all designated states Fujimi Incorporated 1-1 Chiryo 2-chome Nishibiwajima-cho Kiyosu-shi, Aichi 452-8502 / JP | [2015/13] | Inventor(s) | 01 /
YAMATO, Yasuyuki c/o FUJIMI INCORPORATED 1-1 Chiryo 2-chome Nishibiwajima-cho Kiyosu-shi Aichi 452-8502 / JP | 02 /
AKATSUKA, Tomohiko c/o FUJIMI INCORPORATED 1-1 Chiryo 2-chome Nishibiwajima-cho Kiyosu-shi Aichi 452-8502 / JP | [2015/13] | Representative(s) | Grünecker Patent- und Rechtsanwälte PartG mbB Leopoldstraße 4 80802 München / DE | [N/P] |
Former [2015/13] | Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät Leopoldstrasse 4 80802 München / DE | Application number, filing date | 13790468.6 | 04.04.2013 | WO2013JP60347 | Priority number, date | JP20120114596 | 18.05.2012 Original published format: JP 2012114596 | [2015/13] | Filing language | JA | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2013172111 | Date: | 21.11.2013 | Language: | JA | [2013/47] | Type: | A1 Application with search report | No.: | EP2851937 | Date: | 25.03.2015 | Language: | EN | [2015/13] | Search report(s) | International search report - published on: | JP | 21.11.2013 | (Supplementary) European search report - dispatched on: | EP | 14.12.2015 | Classification | IPC: | H01L21/3105, B24B37/04, C09K3/14, H01L21/762, C09G1/02 | [2016/02] | CPC: |
C09G1/02 (EP,CN,KR,US);
C09K3/1454 (KR);
H01L21/31053 (EP,CN,KR,US);
B24B37/044 (EP,CN,US);
C09K3/1436 (EP,CN,US);
C09K3/1463 (EP,CN,US);
|
Former IPC [2015/13] | H01L21/304, B24B37/00, C09K3/14 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2015/13] | Title | German: | POLIERZUSAMMENSETZUNG, POLIERVERFAHREN DAMIT UND VERFAHREN ZUR HERSTELLUNG EINES SUBSTRATS | [2015/13] | English: | POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE | [2015/13] | French: | COMPOSITION DE POLISSAGE, PROCÉDÉ DE POLISSAGE QUI UTILISE CETTE DERNIÈRE ET PROCÉDÉ PERMETTANT DE PRODUIRE UN SUBSTRAT | [2015/13] | Entry into regional phase | 27.11.2014 | Translation filed | 27.11.2014 | National basic fee paid | 27.11.2014 | Search fee paid | 27.11.2014 | Designation fee(s) paid | 27.11.2014 | Examination fee paid | Examination procedure | 27.11.2014 | Examination requested [2015/13] | 20.07.2016 | Amendment by applicant (claims and/or description) | 30.05.2017 | Despatch of a communication from the examining division (Time limit: M06) | 30.08.2017 | Application withdrawn by applicant [2017/41] | Divisional application(s) | The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is 30.05.2017 | Fees paid | Renewal fee | 27.04.2015 | Renewal fee patent year 03 | 30.03.2016 | Renewal fee patent year 04 | 26.04.2017 | Renewal fee patent year 05 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XI]US2006096179 (LU BIN [US], et al) [X] 1-5,7-9 * claims 1,3,7-10 * * paragraph [0038] - paragraph [0039] * [I] 6; | [X]EP1104778 (JSR CORP [JP]) [X] 1-4,6-9 * claims 1,6,8 * * paragraph [0104] *; | [XI]GB2390370 (FUJIMI INC [JP]) [X] 1-5 * page 4, line 24 - line 35 * * claims 1, 3-5 * [I] 6; | [XI]WO2008070113 (CABOT MICROELECTRONICS CORP [US]) [X] 1-4,7-9 * claims 1-5 * * paragraph [0030] - paragraph [0033] * [I] 5,6; | [XI]US2003124959 (SCHROEDER DAVID J [US], et al) [X] 1-6 * claims 1,3-6,12 * [I] 7; | [X]US2003211815 (CARTER PHILLIP [US], et al) [X] 1-9 * claims 1,14-18 *; | [AP]US2013072021 (CUI JI [US], et al) [AP] 1-9 * the whole document * | International search | [A]WO2011093153 (JSR CORP [JP], et al); | [A]JP2006041252 (HITACHI CHEMICAL CO LTD); | [A]JP2004031905 (SAMSUNG ELECTRONICS CO LTD); | [A]JP2006318952 (HITACHI CHEMICAL CO LTD); | [A]WO2006035779 (HITACHI CHEMICAL CO LTD [JP], et al); | [A]JP2011181884 (HITACHI CHEMICAL CO LTD) | by applicant | WO2004010487 | WO2008032681 | JP2011181946 | - "Sulfonicacid-functionalized silica through of thiol groups", CHEM. COMMUN., (2003), pages 246 - 247 | - "Novel Silane Coupling Agents Containing a Photolabile 2-Nitrobenzyl Ester for Introduction of a Carboxy Group on the Surface of Silica Gel", CHEMISTRY LETTERS, (2000), vol. 3, pages 228 - 229 |