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EP2738605
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EP About this file: EP2738605
| EP2738605 - Developer for resist pattern-forming method [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 10.06.2016 Database last updated on 15.11.2024 | Most recent event Tooltip | 10.06.2016 | Application deemed to be withdrawn | published on 13.07.2016 [2016/28] | Applicant(s) | For all designated states JSR Corporation 9-2 Higashi-Shinbashi 1-chome Minato-ku Tokyo 105-8640 / JP | [2014/23] | Inventor(s) | 01 /
Furukawa, Taiichi c/o JSR CORPORATION 9-2, Higashi-Shinbashi 1-chome Minato-ku, Tokyo 105-8640 / JP | 02 /
Sakakibara, Hirokazu c/o JSR CORPORATION 9-2, Higashi-Shinbashi 1-chome Minato-ku, Tokyo 105-8640 / JP | [2014/23] | Representative(s) | TBK Bavariaring 4-6 80336 München / DE | [2014/23] | Application number, filing date | 14150102.3 | 26.03.2012 | [2014/23] | Priority number, date | JP20110123697 | 01.06.2011 Original published format: JP 2011123697 | JP20110150480 | 06.07.2011 Original published format: JP 2011150480 | [2014/23] | Filing language | EN | Procedural language | EN | Publication | Type: | A2 Application without search report | No.: | EP2738605 | Date: | 04.06.2014 | Language: | EN | [2014/23] | Type: | A3 Search report | No.: | EP2738605 | Date: | 08.07.2015 | Language: | EN | [2015/28] | Search report(s) | (Supplementary) European search report - dispatched on: | EP | 05.06.2015 | Classification | IPC: | G03F7/039, G03F7/32 | [2014/23] | CPC: |
G03F7/0397 (EP,KR);
G03F7/0045 (KR);
G03F7/0047 (KR);
G03F7/0392 (KR);
G03F7/095 (EP,KR);
G03F7/26 (KR);
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2014/23] | Title | German: | Entwickler für ein Verfahren zur Bildung von Resistmustern | [2014/23] | English: | Developer for resist pattern-forming method | [2014/23] | French: | Révélateur pour un procédé de formation de motif de resérve | [2014/23] | Examination procedure | 03.01.2014 | Examination requested [2014/23] | 09.01.2016 | Application deemed to be withdrawn, date of legal effect [2016/28] | 17.02.2016 | Despatch of communication that the application is deemed to be withdrawn, reason: examination fee not paid in time [2016/28] | Parent application(s) Tooltip | EP12161159.4 / EP2530525 | Fees paid | Renewal fee | 28.03.2014 | Renewal fee patent year 03 | 30.03.2015 | Renewal fee patent year 04 | Penalty fee | Additional fee for renewal fee | 31.03.2016 | 05 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [X]US3704257 (MOD ROBERT R, et al) [X] 1 * examples 1,11 *; | [A]WO2010140709 (FUJIFILM CORP [JP], et al) [A] 1-8 * claims 1,4 * * page 31, line 10 - page 33, line 12 * * page 126, line 3 - page 127, line 20 * * page 145; compounds B-1, A1 * * examples 33,42,49,58 *; | [A]US2010323305 (TSUBAKI HIDEAKI [JP], et al) [A] 1-8 * page 79; examples 38,44; table 6 * | [XI] - A. W. RALSTON ET AL, "SOLUBILITIES OF HIGH MOLECULAR WEIGHT NORMAL ALIPHATIC PRIMARY AMINES", THE JOURNAL OF ORGANIC CHEMISTRY, (19440101), vol. 9, no. 1, doi:10.1021/jo01183a012, ISSN 0022-3263, pages 102 - 112, XP055039329 [X] 1-7,9 * tables III-XVI * [I] 8 DOI: http://dx.doi.org/10.1021/jo01183a012 | by applicant | JP2000199953 | JPH0612452B | JPS5993448 | JPH05188598 | JP2005352384 | WO2007116664 | EP2530525 |