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Extract from the Register of European Patents

EP About this file: EP2984596

EP2984596 - INVERSE-CONTOUR MACHINING TO ELIMINATE RESIDUAL STRESS DISTORTION [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  04.09.2020
Database last updated on 19.07.2024
FormerThe patent has been granted
Status updated on  27.09.2019
FormerGrant of patent is intended
Status updated on  16.07.2019
FormerExamination is in progress
Status updated on  02.02.2018
Most recent event   Tooltip08.07.2022Lapse of the patent in a contracting state
New state(s): MK
published on 10.08.2022  [2022/32]
Applicant(s)For all designated states
Raytheon Company
870 Winter Street
Waltham, MA 02451 / US
[2019/33]
Former [2016/07]For all designated states
Raytheon Company
870 Winter Street
Waltham, MA 02451-1449 / US
Inventor(s)01 / SIMON, Robert T.
870 Winter Street
Waltham, Massachusetts 02451 / US
02 / GREGORY, Kris E.
870 Winter Street
Waltham, Massachusetts 02451 / US
03 / HORSTMAN, Thomas
870 Winter Street
Waltham, Massachusetts 02451 / US
 [2016/07]
Representative(s)Dentons UK and Middle East LLP
One Fleet Place
London EC4M 7WS / GB
[2019/44]
Former [2016/07]Hill, Justin John, et al
Olswang LLP
90 High Holborn
London WC1V 6XX / GB
Application number, filing date14783260.411.02.2014
[2016/07]
WO2014US15862
Priority number, dateUS201361811012P11.04.2013         Original published format: US 201361811012 P
[2016/07]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2014168681
Date:16.10.2014
Language:EN
[2014/42]
Type: A1 Application with search report 
No.:EP2984596
Date:17.02.2016
Language:EN
The application published by WIPO in one of the EPO official languages on 16.10.2014 takes the place of the publication of the European patent application.
[2016/07]
Type: B1 Patent specification 
No.:EP2984596
Date:30.10.2019
Language:EN
[2019/44]
Search report(s)International search report - published on:US16.10.2014
(Supplementary) European search report - dispatched on:EP13.06.2016
ClassificationIPC:G05B19/401, B23Q15/22, B23C3/00, G05B19/404, G05B19/4097
[2019/32]
CPC:
B23C3/00 (EP,US); G05B19/4097 (US); G05B19/404 (EP,US);
B23C2250/00 (US); G05B2219/37308 (US); G05B2219/37576 (EP,US);
G05B2219/45145 (US); G05B2219/49184 (EP,US) (-)
Former IPC [2016/28]G06F19/00, B23Q15/22, G05B19/401, B23C3/00, G05B19/404, G05B19/4097
Former IPC [2016/07]G06F19/00
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2016/07]
Extension statesBANot yet paid
MENot yet paid
TitleGerman:INVERSE KONTURENBEARBEITUNG ZUR ELIMINIERUNG EINER RESTSPANNUNGSVERZERRUNG[2016/07]
English:INVERSE-CONTOUR MACHINING TO ELIMINATE RESIDUAL STRESS DISTORTION[2016/07]
French:USINAGE DE CONTOUR INVERSE À DES FINS D'ÉLIMINATION DE DÉFORMATION DE CONTRAINTE RÉSIDUELLE[2016/07]
Entry into regional phase11.11.2015National basic fee paid 
11.11.2015Search fee paid 
11.11.2015Designation fee(s) paid 
11.11.2015Examination fee paid 
Examination procedure11.02.2015Request for preliminary examination filed
International Preliminary Examining Authority: US
11.11.2015Examination requested  [2016/07]
23.12.2016Amendment by applicant (claims and/or description)
05.02.2018Despatch of a communication from the examining division (Time limit: M04)
04.06.2018Reply to a communication from the examining division
17.07.2019Communication of intention to grant the patent
20.09.2019Fee for grant paid
20.09.2019Fee for publishing/printing paid
20.09.2019Receipt of the translation of the claim(s)
Divisional application(s)The date of the Examining Division's first communication in respect of the earliest application for which a communication has been issued is  05.02.2018
Opposition(s)31.07.2020No opposition filed within time limit [2020/41]
Fees paidRenewal fee
11.11.2015Renewal fee patent year 03
10.02.2017Renewal fee patent year 04
14.02.2018Renewal fee patent year 05
13.02.2019Renewal fee patent year 06
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See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU11.02.2014
AL30.10.2019
AT30.10.2019
CY30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
MK30.10.2019
MT30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
TR30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IE11.02.2020
LU11.02.2020
BE29.02.2020
CH29.02.2020
FR29.02.2020
IS29.02.2020
LI29.02.2020
PT02.03.2020
[2022/32]
Former [2022/27]HU11.02.2014
AL30.10.2019
AT30.10.2019
CY30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
MT30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
TR30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IE11.02.2020
LU11.02.2020
BE29.02.2020
CH29.02.2020
FR29.02.2020
IS29.02.2020
LI29.02.2020
PT02.03.2020
Former [2021/12]AL30.10.2019
AT30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IE11.02.2020
LU11.02.2020
BE29.02.2020
CH29.02.2020
FR29.02.2020
IS29.02.2020
LI29.02.2020
PT02.03.2020
Former [2021/07]AL30.10.2019
AT30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IE11.02.2020
LU11.02.2020
CH29.02.2020
FR29.02.2020
IS29.02.2020
LI29.02.2020
PT02.03.2020
Former [2020/51]AL30.10.2019
AT30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
LU11.02.2020
CH29.02.2020
IS29.02.2020
LI29.02.2020
PT02.03.2020
Former [2020/50]AL30.10.2019
AT30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
MC30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SI30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
LU11.02.2020
IS29.02.2020
PT02.03.2020
Former [2020/48]AL30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
LU11.02.2020
IS29.02.2020
PT02.03.2020
Former [2020/38]AL30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
IT30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/37]AL30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
SK30.10.2019
SM30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/36]AL30.10.2019
CZ30.10.2019
DK30.10.2019
EE30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/35]AL30.10.2019
CZ30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RO30.10.2019
RS30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/32]AL30.10.2019
ES30.10.2019
FI30.10.2019
HR30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RS30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/25]ES30.10.2019
FI30.10.2019
HR30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
RS30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/24]ES30.10.2019
FI30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
IS29.02.2020
PT02.03.2020
Former [2020/23]ES30.10.2019
FI30.10.2019
LT30.10.2019
LV30.10.2019
NL30.10.2019
PL30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
GR31.01.2020
PT02.03.2020
Former [2020/22]FI30.10.2019
LT30.10.2019
SE30.10.2019
BG30.01.2020
NO30.01.2020
PT02.03.2020
Former [2020/21]NO30.01.2020
Documents cited:Search[A]EP1787176  (RENISHAW PLC [GB]) [A] 1-15 * paragraph [0014] - paragraph [0024] ** paragraph [0051] - paragraph [0056] *;
 [XI]US2009132080  (GLASSER ARNDT [DE]) [X] 1,14,15 * paragraph [0001] - paragraph [0028] * * paragraph [0039] - paragraph [0044] * * figures 3-5 * [I] 2-13;
 [A]  - SUK-HWAN S ET AL, "Incorporation of Tool Deflection in Tool Path Computation: Simulation and Analysis", JOURNAL OF MANUFACTURING SYSTEMS, SOCIETY OF MANUFACTURING ENGINEERS, DEARBORN, MI, US, (19960101), vol. 15, no. 3, ISSN 0278-6125, pages 190 - 199, XP004008185 [A] 1-15 * abstract * * page 193:"Path Modification" *
International search[A]US2004267462  (BERRY JOHN T [US], et al);
 [A]US6934642  (BERRY JOHN T [US], et al);
 [X]US6947809  (REN FENG [US], et al);
 [A]WO2006008554  (ISIS INNOVATION [GB], et al);
 [A]  - "Minimizing Destortion in Machining. Diffraction Notes", LAMBDA RESEARCH., (1999), pages 1 - 4, URL: http://www.lambdatechs.com/documents/dn_24.pdf, (20140515), XP055236778
by applicantUS2009132080
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.