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EP3198629
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EP About this file: EP3198629
| EP3198629 - MULTI-PASS PATTERNING USING NON-REFLECTING RADIATION LITHOGRAPHY ON AN UNDERLYING GRATING [Right-click to bookmark this link] | Status | The application has been withdrawn Status updated on 28.06.2019 Database last updated on 02.11.2024 | |
| Former | Request for examination was made Status updated on 30.06.2017 | ||
| Former | The international publication has been made Status updated on 08.02.2017 | Most recent event Tooltip | 28.06.2019 | Withdrawal of application | published on 31.07.2019 [2019/31] | Applicant(s) | For all designated states Intel Corporation 2200 Mission College Boulevard Santa Clara, CA 95054 / US | [2017/31] | Inventor(s) | 01 /
CHANDHOK, Manish 2090 NW Overton Court Beaverton, Oregon 97006 / US | 02 /
YOUNKIN, Todd R. c/o Intel Corporation 2200 Mission College Boulevard M/S: RNB4-150 Santa Clara, California 95054 / US | 03 /
LEE, Sang H. 13730 Calle Tacuba Saratoga, California 95070 / US | 04 /
WALLACE, Charles H. 2127 NE 25th Avenue Portland, Oregon 97212 / US | [2017/31] | Representative(s) | Goddar, Heinz J. Boehmert & Boehmert Anwaltspartnerschaft mbB Pettenkoferstrasse 22 80336 München / DE | [2017/31] | Application number, filing date | 14902548.8 | 22.09.2014 | [2017/31] | WO2014US56761 | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2016048264 | Date: | 31.03.2016 | Language: | EN | [2016/13] | Type: | A1 Application with search report | No.: | EP3198629 | Date: | 02.08.2017 | Language: | EN | The application published by WIPO in one of the EPO official languages on 31.03.2016 takes the place of the publication of the European patent application. | [2017/31] | Search report(s) | International search report - published on: | KR | 31.03.2016 | (Supplementary) European search report - dispatched on: | EP | 26.04.2018 | Classification | IPC: | H01L21/027, G03F7/00, // H01L21/768 | [2018/22] | CPC: |
G03F7/0035 (EP,US);
H01L21/0274 (EP,KR,US);
G03F7/70 (US);
G03F7/094 (EP,US);
G03F7/2022 (KR);
G03F7/2039 (EP,US);
G03F7/70466 (EP,US);
H01L21/0273 (US);
H01L21/0277 (EP,KR,US);
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| Former IPC [2017/31] | H01L21/027, G03F7/20 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2017/31] | Title | German: | MULTIPASS-STRUKTURIERUNG MIT NICHT REFLEKTIERENDER STRAHLUNGSLITHOGRAPHIE AUF EINEM DARUNTER LIEGENDEN GITTER | [2017/31] | English: | MULTI-PASS PATTERNING USING NON-REFLECTING RADIATION LITHOGRAPHY ON AN UNDERLYING GRATING | [2017/31] | French: | FORMATION DE MOTIFS À PASSAGES MULTIPLES À L'AIDE D'UNE LITHOGRAPHIE PAR RAYONNEMENT NON RÉFLÉCHISSANT SUR UN RÉSEAU SOUS-JACENT | [2017/31] | Entry into regional phase | 08.02.2017 | National basic fee paid | 08.02.2017 | Search fee paid | 08.02.2017 | Designation fee(s) paid | 08.02.2017 | Examination fee paid | Examination procedure | 08.02.2017 | Examination requested [2017/31] | 08.02.2017 | Date on which the examining division has become responsible | 19.11.2018 | Amendment by applicant (claims and/or description) | 24.06.2019 | Application withdrawn by applicant [2019/31] | Fees paid | Renewal fee | 08.02.2017 | Renewal fee patent year 03 | 12.09.2017 | Renewal fee patent year 04 | 11.09.2018 | Renewal fee patent year 05 |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [I]US2014272711 (BRISTOL ROBERT L [US], et al) [I] 1-5,7-15 * paragraphs [0048] , [0052] - [0057] - [0 71]; figure - *; | [E]WO2015094488 (INTEL CORP [US]) [E] 1-5,7-15 * abstract * | International search | [A]US2012009529 (HATAKEYAMA JUN [JP]) [A] 1-25 * See paragraphs [0070]-[0137], claims 1-4 and figures 1A-9. *; | [A]US6667237 (METZLER RICHARD A [US]) [A] 1-25 * See column 3, line 19 - column 6, line 26 and figures 2A-3E. *; | [A]US2009246706 (HENDEL RUDOLF [US], et al) [A] 1-25 * See abstract, paragraphs [0046]-[0055] and figures 3A-4F. *; | [A]JP5204410B (ASML NETHERLANDS B.V. et al.) [A] 1-25 * See paragraphs [0010]-[0041] and figures 1-24. *; | [A]KR20010017089 (HYNIX SEMICONDUCTOR INC [KR]) [A] 1-25 * See abstract, claims 1-5 and figures la-2b. * |