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Extract from the Register of European Patents

EP About this file: EP2975157

EP2975157 - GAS FLOW FLANGE FOR A ROTATING DISK REACTOR FOR CHEMICAL VAPOR DEPOSITION [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  21.05.2021
Database last updated on 24.08.2024
FormerExamination is in progress
Status updated on  01.06.2018
FormerRequest for examination was made
Status updated on  16.12.2016
Most recent event   Tooltip21.05.2021Application deemed to be withdrawnpublished on 23.06.2021  [2021/25]
Applicant(s)For all designated states
Veeco Instruments Inc.
Terminal Drive
Plainview, NY 11803 / US
[2016/03]
Inventor(s)01 / Luse, Todd A.
594 Meadow Road
Kings Park, New York 11754 / US
02 / Fremgen, Roger P.
31 Steers Avenue
Northport, New York 11768 / US
 [2016/03]
Representative(s)Dehns
St. Bride's House
10 Salisbury Square
London EC4Y 8JD / GB
[N/P]
Former [2016/03]Jackson, Robert Patrick
Dehns
St Bride's House
10 Salisbury Square
London
EC4Y 8JD / GB
Application number, filing date15172545.417.06.2015
[2016/03]
Priority number, dateUS20141430639817.06.2014         Original published format: US201414306398
[2016/03]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP2975157
Date:20.01.2016
Language:EN
[2016/03]
Search report(s)(Supplementary) European search report - dispatched on:EP21.12.2015
ClassificationIPC:C23C16/455, C23C16/44, C30B25/14
[2016/03]
CPC:
C30B25/14 (EP,US); C23C16/4401 (EP,US); C23C16/45565 (EP,US);
C23C16/45572 (EP,US); C23C16/45574 (EP,US); F17D1/04 (US);
B22F10/20 (EP,US); B22F5/10 (EP,US); Y02P10/25 (EP,US);
Y10T137/0318 (EP,US); Y10T137/0402 (EP,US); Y10T137/6416 (EP,US);
Y10T137/87153 (EP,US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2016/35]
Former [2016/03]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
TitleGerman:GASSTROMFLANSCH FÜR EINEN ROTIERENDEN SCHEIBENREAKTOR ZUR CHEMISCHEN GASPHASENABSCHEIDUNG[2016/03]
English:GAS FLOW FLANGE FOR A ROTATING DISK REACTOR FOR CHEMICAL VAPOR DEPOSITION[2016/03]
French:BRIDE D'ÉCOULEMENT DE GAZ DE RÉACTEUR À DISQUE ROTATIF POUR DÉPÔT CHIMIQUE EN PHASE VAPEUR[2016/03]
Examination procedure20.07.2016Amendment by applicant (claims and/or description)
20.07.2016Examination requested  [2016/35]
30.05.2018Despatch of a communication from the examining division (Time limit: M06)
10.12.2018Reply to a communication from the examining division
12.01.2021Application deemed to be withdrawn, date of legal effect  [2021/25]
09.02.2021Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2021/25]
Fees paidRenewal fee
27.06.2017Renewal fee patent year 03
27.06.2018Renewal fee patent year 04
27.06.2019Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
30.06.202006   M06   Not yet paid
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Documents cited:Search[XYI]US2010143588  (BELOUSOV MIKHAIL [US], et al) [X] 1-4,6,7,10,11,13-15 * paragraphs [0050] - [0051]; figures 11-12 * [Y] 8 [I] 5,9,12;
 [Y]US2011247556  (RARING JAMES W [US], et al) [Y] 8* paragraph [0031] *;
 [X]US2013276703  (CHENG JUI-SHENG [TW], et al) [X] 1-3,6,7,10,11 * paragraphs [0025] , [0027] , [0032]; figure 1A *;
 [X]US2013299009  (JIANG YONG [CN], et al) [X] 1,15 * paragraph [0063]; figure 1 *
by applicantUS2013040246
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.