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EP3127174
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EP About this file: EP3127174
| EP3127174 - REPLACEMENT CONDUCTIVE HARD MASK FOR MULTI-STEP MAGNETIC TUNNEL JUNCTION (MTJ) ETCH [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 01.02.2019 Database last updated on 14.11.2024 | |
| Former | Request for examination was made Status updated on 06.01.2017 | ||
| Former | The international publication has been made Status updated on 13.12.2016 | Most recent event Tooltip | 01.02.2019 | Application deemed to be withdrawn | published on 06.03.2019 [2019/10] | Applicant(s) | For all designated states Qualcomm Incorporated 5775 Morehouse Drive San Diego, CA 92121-1714 / US | [2017/06] | Inventor(s) | 01 /
LU, Yu 5775 Morehouse Drive San Diego, California 92121-1714 / US | 02 /
PARK, Chando 5775 Morehouse Drive San Diego, California 92121-1714 / US | 03 /
CHEN, Wei-Chuan 5775 Morehouse Drive San Diego, California 92121-1714 / US | [2017/06] | Representative(s) | Dunlop, Hugh Christopher, et al Maucher Jenkins Seventh Floor Offices Artillery House 11-19 Artillery Row London SW1P 1RT / GB | [N/P] |
| Former [2017/06] | Dunlop, Hugh Christopher, et al Maucher Jenkins 26 Caxton Street London SW1H 0RJ / GB | Application number, filing date | 15711636.9 | 16.03.2015 | [2017/06] | WO2015US20750 | Priority number, date | US201414243324 | 02.04.2014 Original published format: US201414243324 | [2017/06] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2015153107 | Date: | 08.10.2015 | Language: | EN | [2015/40] | Type: | A1 Application with search report | No.: | EP3127174 | Date: | 08.02.2017 | Language: | EN | The application published by WIPO in one of the EPO official languages on 08.10.2015 takes the place of the publication of the European patent application. | [2017/06] | Search report(s) | International search report - published on: | EP | 08.10.2015 | Classification | IPC: | H01L43/12 | [2017/06] | CPC: |
H10N50/01 (EP,CN,KR,US);
H10N50/10 (CN,KR,US);
H10N50/80 (CN,KR,US);
H10N50/85 (KR)
| Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2017/06] | Title | German: | ERSATZ EINER LEITENDEN HARTMASKE FÜR MEHRSTUFIGES MAGNETTUNNELÜBERGANGSÄTZEN | [2017/06] | English: | REPLACEMENT CONDUCTIVE HARD MASK FOR MULTI-STEP MAGNETIC TUNNEL JUNCTION (MTJ) ETCH | [2017/06] | French: | MASQUE DUR CONDUCTEUR DE REMPLACEMENT POUR GRAVURE DE JONCTION TUNNEL MAGNÉTIQUE (MTJ) EN PLUSIEURS ÉTAPES | [2017/06] | Entry into regional phase | 24.08.2016 | National basic fee paid | 24.08.2016 | Designation fee(s) paid | 24.08.2016 | Examination fee paid | Examination procedure | 22.01.2016 | Request for preliminary examination filed International Preliminary Examining Authority: EP | 24.08.2016 | Examination requested [2017/06] | 24.08.2016 | Date on which the examining division has become responsible | 20.06.2017 | Loss of particular rights, legal effect: Claims | 27.07.2017 | Despatch of communication of loss of particular rights: Claims {1} | 02.10.2018 | Application deemed to be withdrawn, date of legal effect [2019/10] | 29.10.2018 | Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time [2019/10] | Fees paid | Renewal fee | 10.01.2017 | Renewal fee patent year 03 | Penalty fee | Additional fee for renewal fee | 31.03.2018 | 04 M06 Not yet paid |
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| Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Cited in | International search | [XA]US2005090056 (LEE HEON [KR]); | [XA]US2012205764 (CHEN WEI-CHUAN [TW], et al) |