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Extract from the Register of European Patents

EP About this file: EP3190086

EP3190086 - REACTION FURNACE FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND, POLYCRYSTALLINE SILICON ROD OR POLYCRYSTALLINE SILICON INGOT [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  18.11.2022
Database last updated on 17.07.2024
FormerThe patent has been granted
Status updated on  10.12.2021
FormerGrant of patent is intended
Status updated on  11.10.2021
FormerExamination is in progress
Status updated on  12.03.2021
FormerRequest for examination was made
Status updated on  15.06.2017
FormerThe international publication has been made
Status updated on  01.02.2017
Most recent event   Tooltip14.06.2024Lapse of the patent in a contracting state
New state(s): TR		published on 17.07.2024  [2024/29]
Applicant(s)For all designated states
Shin-Etsu Chemical Co., Ltd.
6-1, Ohtemachi 2-chome Chiyoda-ku
Tokyo 100-0004 / JP
[2017/28]
Inventor(s)01 / NETSU, Shigeyoshi
c/o Shin-Etsu Chemical Co. Ltd.
Specialty Chemicals Research Center
28-1
Nishifukushima, Kubiki-ku
Joetsu-shi Niigata 942-8601 / JP
02 / HOSHINO, Naruhiro
c/o Shin-Etsu Chemical Co. Ltd.
Specialty Chemicals Research Center
28-1
Nishifukushima, Kubiki-ku
Joetsu-shi Niigata 942-8601 / JP
03 / OKADA, Tetsuro
c/o Shin-Etsu Chemical Co. Ltd.
Specialty Chemicals Research Center
28-1
Nishifukushima, Kubiki-ku
Joetsu-shi Niigata 942-8601 / JP
04 / SAITO, Hiroshi
c/o Shin-Etsu Chemical Co. Ltd.
Specialty Chemicals Research Center
28-1
Nishifukushima, Kubiki-ku
Joetsu-shi Niigata 942-8601 / JP
 [2017/28]
Representative(s)WP Thompson
138 Fetter Lane
London EC4A 1BT / GB
[2017/28]
Application number, filing date15838723.329.07.2015
[2017/28]
WO2015JP03820
Priority number, dateJP2014017979304.09.2014         Original published format: JP 2014179793
[2017/28]
Filing languageJA
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2016035249
Date:10.03.2016
Language:JA
[2016/10]
Type: A1 Application with search report 
No.:EP3190086
Date:12.07.2017
Language:EN
[2017/28]
Type: B1 Patent specification 
No.:EP3190086
Date:12.01.2022
Language:EN
[2022/02]
Search report(s)International search report - published on:JP10.03.2016
(Supplementary) European search report - dispatched on:EP20.02.2018
ClassificationIPC:C01B33/035
[2017/28]
CPC:
C01B33/035 (EP,KR,US); H01L21/22 (KR); B01J19/087 (US);
C23C16/24 (US); C23C16/46 (US); H01L21/02595 (KR);
H01L21/0262 (KR); B01J2219/0801 (US); B01J2219/0803 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/28]
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
TitleGerman:REAKTIONSOFEN ZUR HERSTELLUNG VON POLYKRISTALLINEM SILICIUM, VORRICHTUNG ZUR HERSTELLUNG VON POLYKRISTALLINEM SILICIUM, VERFAHREN ZUR HERSTELLUNG VON POLYKRISTALLINEM SILICIUM UND POLYKRISTALLINER SILICIUMSTAB ODER POLYKRISTALLINER SILICIUMWAFER[2017/28]
English:REACTION FURNACE FOR PRODUCING POLYCRYSTALLINE SILICON, APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON, METHOD FOR PRODUCING POLYCRYSTALLINE SILICON, AND, POLYCRYSTALLINE SILICON ROD OR POLYCRYSTALLINE SILICON INGOT[2017/28]
French:FOUR DE RÉACTION POUR LA PRODUCTION DE SILICIUM POLYCRISTALLIN, APPAREIL ET PROCÉDÉ DE PRODUCTION DE SILICIUM POLYCRISTALLIN, ET BARREAU OU LINGOT DE SILICIUM POLYCRISTALLIN[2017/28]
Entry into regional phase31.01.2017Translation filed 
31.01.2017National basic fee paid 
31.01.2017Search fee paid 
31.01.2017Designation fee(s) paid 
31.01.2017Examination fee paid 
Examination procedure31.01.2017Examination requested  [2017/28]
31.01.2017Date on which the examining division has become responsible
18.09.2018Amendment by applicant (claims and/or description)
16.03.2021Despatch of a communication from the examining division (Time limit: M04)
07.07.2021Reply to a communication from the examining division
12.10.2021Communication of intention to grant the patent
07.12.2021Fee for grant paid
07.12.2021Fee for publishing/printing paid
07.12.2021Receipt of the translation of the claim(s)
Opposition(s)13.10.2022No opposition filed within time limit [2022/51]
Fees paidRenewal fee
22.06.2017Renewal fee patent year 03
11.07.2018Renewal fee patent year 04
15.07.2019Renewal fee patent year 05
14.07.2020Renewal fee patent year 06
15.07.2021Renewal fee patent year 07
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU29.07.2015
AL12.01.2022
AT12.01.2022
CY12.01.2022
CZ12.01.2022
DK12.01.2022
EE12.01.2022
ES12.01.2022
FI12.01.2022
HR12.01.2022
IT12.01.2022
LT12.01.2022
LV12.01.2022
MC12.01.2022
MK12.01.2022
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PL12.01.2022
RO12.01.2022
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TR12.01.2022
BG12.04.2022
NO12.04.2022
GR13.04.2022
IS12.05.2022
PT12.05.2022
GB29.07.2022
IE29.07.2022
LU29.07.2022
BE31.07.2022
CH31.07.2022
FR31.07.2022
LI31.07.2022
[2024/29]
Former [2024/22]HU29.07.2015
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GB29.07.2022
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CH31.07.2022
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Documents cited:Search[XA]WO2013125207  (SHINETSU CHEMICAL CO [JP]) [X] 1,2,4,5 * the whole document * [A] 3;
 [XA]US2013302528  (KUROSAWA YASUSHI [JP], et al) [X] 1,2,4,5 * paragraphs [0011] - [0072]; figures 1,7a,8a * [A] 3;
 [XA]WO2014061212  (SHINETSU CHEMICAL CO [JP]) [X] 1,2,4,5 * the whole document * [A] 3;
 [XA]EP2759520  (SHINETSU CHEMICAL CO [JP]) [X] 1,2,4,5 * paragraphs [0009] - [0034]; figures 1-4; example 1; claims 1-4 * [A] 3;
 [XPA]EP2818450  (SHINETSU CHEMICAL CO [JP]) [XP] 1,2,4,5 * paragraphs [0019] - [0122]; figure 1; example 1; claims 1-7 *[A] 3;
 [E]EP2910525  (SHINETSU CHEMICAL CO [JP]) [E] 1,2,4,5 * paragraphs [0011] - [0041]; figures 1-2b; example 1; claims 1-5 *
International search[A]JP2011231005  (MITSUBISHI MATERIALS CORP) [A] 1-5* , entire text (Family: none) *;
 [X]WO2012098598  (SHINETSU CHEMICAL CO [JP], et al) [X] 1-5 * , paragraphs [0005] to [0006], [0009] to [0013]; examples; claims; fig. 1, 7A to 8A & US 2013/0302528 A1 & WO 2012/098598 A1 & CN 103328380 A & KR 10-2014-0002648 A *;
 [X]JP2013063884  (SHINETSU CHEMICAL CO) [X] 1-5 * , claims; paragraphs [0011] to [0018], [0021] to [0040]; fig. 1 to 4 & US 2014/0134832 A1 & WO 2013/042361 A1 & EP 2759520 A1 & CN 103702938 A & KR 10-2014-0064968 A *;
 [X]WO2014061212  (SHINETSU CHEMICAL CO [JP]) [X] 1-5 * , paragraphs [0005] to [0009]; examples; claims; fig. 1 to 2B & WO 2014/061212 A1 & EP 2910525 A & CN 104736480 A & KR 10-2015-0070286 A *
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.