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Extract from the Register of European Patents

EP About this file: EP3141528

EP3141528 - POLYCRYSTALLINE METAL OXIDE, METHODS OF MANUFACTURE THEREOF, AND ARTICLES COMPRISING THE SAME [Right-click to bookmark this link]
StatusNo opposition filed within time limit
Status updated on  10.07.2020
Database last updated on 14.11.2024
FormerThe patent has been granted
Status updated on  02.08.2019
FormerGrant of patent is intended
Status updated on  25.03.2019
FormerExamination is in progress
Status updated on  20.07.2018
FormerRequest for examination was made
Status updated on  22.09.2017
FormerThe application has been published
Status updated on  10.02.2017
Most recent event   Tooltip08.07.2022Lapse of the patent in a contracting state
New state(s): MK
published on 10.08.2022  [2022/32]
Applicant(s)For all designated states
TIAX LLC
35 Hartwell Avenue
Lexington, MA 02421 / US
[2017/11]
Inventor(s)01 / OFER, David
37 Booth Street
Needham, MA 02494 / US
02 / PULLEN, Adrian
65 Boylston Street
Boston, MA 02130 / US
03 / SRIRAMULU, Suresh
23 Virginia Road
Arlington, MA 02476 / US
 [2017/11]
Representative(s)Verhorevoort, Kerry Linda
Bridle Intellectual Property Limited
6F Thomas Way
Lakesview
International Business Park
Canterbury, Kent CT3 4JZ / GB
[2017/11]
Application number, filing date16190160.827.07.2012
[2017/11]
Priority number, dateUS201161575115P16.08.2011         Original published format: US 201161575115 P
[2017/11]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report 
No.:EP3141528
Date:15.03.2017
Language:EN
[2017/11]
Type: B1 Patent specification 
No.:EP3141528
Date:04.09.2019
Language:EN
[2019/36]
Search report(s)(Supplementary) European search report - dispatched on:EP13.01.2017
ClassificationIPC:C01G53/00, C01G51/00, C01D15/02, H01M10/0525, H01M4/505, H01M4/525, H01M4/36, C04B35/26, H01M4/485, // H01M4/02
[2017/11]
CPC:
H01M4/364 (EP,CN,US); C01G53/42 (EP,CN,KR,US); C01D15/02 (EP,CN,US);
C01G49/0027 (KR); C01G51/42 (EP,CN,US); C01G51/50 (EP,CN,US);
C01G53/66 (CN,US); H01M10/0525 (EP,CN,US); H01M4/366 (KR);
H01M4/505 (EP,CN,US); H01M4/525 (EP,CN,KR,US); C01P2002/54 (EP,CN,US);
C01P2002/85 (EP,CN,US); C01P2004/03 (EP,CN,US); C01P2004/04 (EP,CN,US);
C01P2004/50 (KR); C01P2004/62 (KR); C01P2006/40 (KR);
H01M2004/021 (EP,CN,US); H01M2004/028 (CN,US); Y02E60/10 (EP,US);
Y02P70/50 (US) (-)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2017/43]
Former [2017/11]AL,  AT,  BE,  BG,  CH,  CY,  CZ,  DE,  DK,  EE,  ES,  FI,  FR,  GB,  GR,  HR,  HU,  IE,  IS,  IT,  LI,  LT,  LU,  LV,  MC,  MK,  MT,  NL,  NO,  PL,  PT,  RO,  RS,  SE,  SI,  SK,  SM,  TR 
TitleGerman:POLYKRISTALLINES METALLOXID, VERFAHREN ZUR HERSTELLUNG DAVON UND ARTIKEL DAMIT[2017/11]
English:POLYCRYSTALLINE METAL OXIDE, METHODS OF MANUFACTURE THEREOF, AND ARTICLES COMPRISING THE SAME[2017/11]
French:OXYDE MÉTALLIQUE POLYCRISTALLIN, SES PROCÉDÉS DE FABRICATION ET ARTICLES LE COMPRENANT[2017/11]
Examination procedure22.09.2016Date on which the examining division has become responsible
15.09.2017Amendment by applicant (claims and/or description)
15.09.2017Examination requested  [2017/43]
18.07.2018Despatch of a communication from the examining division (Time limit: M06)
15.01.2019Reply to a communication from the examining division
26.03.2019Communication of intention to grant the patent
23.07.2019Fee for grant paid
23.07.2019Fee for publishing/printing paid
23.07.2019Receipt of the translation of the claim(s)
Parent application(s)   TooltipEP12823734.4  / EP2744754
Divisional application(s)EP19191989.3  / EP3604230
Opposition(s)05.06.2020No opposition filed within time limit [2020/33]
Fees paidRenewal fee
16.01.2017Renewal fee patent year 03
16.01.2017Renewal fee patent year 04
16.01.2017Renewal fee patent year 05
11.09.2017Renewal fee patent year 06
24.07.2018Renewal fee patent year 07
23.07.2019Renewal fee patent year 08
Penalty fee
Additional fee for renewal fee
31.07.201706   M06   Fee paid on   11.09.2017
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU27.07.2012
AL04.09.2019
AT04.09.2019
CY04.09.2019
CZ04.09.2019
DK04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
MC04.09.2019
MK04.09.2019
MT04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SI04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
IS05.01.2020
PT06.01.2020
[2022/32]
Former [2022/28]HU27.07.2012
AL04.09.2019
AT04.09.2019
CY04.09.2019
CZ04.09.2019
DK04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
MC04.09.2019
MT04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SI04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
IS05.01.2020
PT06.01.2020
Former [2021/15]AL04.09.2019
AT04.09.2019
CZ04.09.2019
DK04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
MC04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SI04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
IS05.01.2020
PT06.01.2020
Former [2020/37]AL04.09.2019
AT04.09.2019
CZ04.09.2019
DK04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SI04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
IS05.01.2020
PT06.01.2020
Former [2020/36]AL04.09.2019
AT04.09.2019
CZ04.09.2019
DK04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
IS05.01.2020
PT06.01.2020
Former [2020/27]AL04.09.2019
AT04.09.2019
CZ04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SK04.09.2019
SM04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
PT06.01.2020
IS24.02.2020
Former [2020/26]AL04.09.2019
AT04.09.2019
CZ04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
SK04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
PT06.01.2020
IS24.02.2020
Former [2020/23]AL04.09.2019
AT04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RO04.09.2019
RS04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
PT06.01.2020
Former [2020/22]AL04.09.2019
EE04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RS04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
PT06.01.2020
Former [2020/20]AL04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
NL04.09.2019
RS04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
Former [2020/15]AL04.09.2019
ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
RS04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
Former [2020/12]ES04.09.2019
FI04.09.2019
HR04.09.2019
LT04.09.2019
LV04.09.2019
RS04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
GR05.12.2019
Former [2020/10]FI04.09.2019
LT04.09.2019
SE04.09.2019
BG04.12.2019
NO04.12.2019
Former [2020/09]FI04.09.2019
LT04.09.2019
NO04.12.2019
Former [2020/08]LT04.09.2019
NO04.12.2019
Documents cited:Search[A]US6071649  (MAO ZHENHUA [US], et al) [A] 1-11 * column 2, line 15 - column 3, line 40 *;
 [X]US2002192552  (LAMPE-ONNERUD CHRISTINA [US], et al) [X] 1-11 * paragraphs [0037] - [0038] * * paragraphs [0051] - [0052] * * paragraph [0134] *;
 [A]US2005260495  (ONNERUD PER T [US], et al) [A] 1-11 * paragraph [0010] - paragraph [0017] *;
 [A]JP2008234872  (SONY CORP) [A] 1-11* abstract *;
 [XA]US2009121179  (SHI JAY JIE [CN]) [X] 1-7,10,11 * page 1, paragraph 0001 * * page 1, paragraph 0008 - page 2, paragraph 0021 * * page 3; example 1 * [A] 8,9
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.