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Extract from the Register of European Patents

EP About this file: EP3390698

EP3390698 - METHOD FOR EPITAXIAL COATING OF SEMICONDUCTOR WAFERS [Right-click to bookmark this link]
Former [2018/43]METHOD FOR EPITAXIAL COATING OF SEMICONDUCTOR WAFERS, AND SEMICONDUCTOR WAFER
[2020/35]
StatusNo opposition filed within time limit
Status updated on  10.12.2021
Database last updated on 02.11.2024
FormerThe patent has been granted
Status updated on  01.01.2021
FormerGrant of patent is intended
Status updated on  13.08.2020
FormerExamination is in progress
Status updated on  15.02.2020
FormerRequest for examination was made
Status updated on  21.09.2018
FormerThe international publication has been made
Status updated on  23.06.2017
Formerunknown
Status updated on  21.12.2016
Most recent event   Tooltip13.09.2024Lapse of the patent in a contracting state
New state(s): MT		published on 16.10.2024  [2024/42]
Applicant(s)For all designated states
Siltronic AG
Einsteinstraße 172
81677 München / DE
[2021/08]
Former [2018/43]For all designated states
Siltronic AG
Hanns-Seidel-Platz 4
81737 München / DE
Inventor(s)01 / HAGER, Christian
Schulstrasse 12
84556 Kastl / DE
02 / MAY, Katharina
Vollmerstrasse 4
84489 Burghausen / DE
03 / WEBER, Christof
Ludwig-Thoma-Str. 12
84489 Burghausen / DE
 [2018/43]
Representative(s)Killinger, Andreas
Siltronic AG
Intellectual Property
Johannes-Hess-Straße 24
84489 Burghausen / DE
[2018/43]
Application number, filing date16809795.409.12.2016
[2018/43]
WO2016EP80494
Priority number, dateDE20151022566317.12.2015         Original published format: DE102015225663
[2018/43]
Filing languageDE
Procedural languageDE
PublicationType: A1 Application with search report
No.:WO2017102597
Date:22.06.2017
Language:DE
[2017/25]
Type: A1 Application with search report 
No.:EP3390698
Date:24.10.2018
Language:DE
The application published by WIPO in one of the EPO official languages on 22.06.2017 takes the place of the publication of the European patent application.
[2018/43]
Type: B1 Patent specification 
No.:EP3390698
Date:03.02.2021
Language:DE
[2021/05]
Search report(s)International search report - published on:EP22.06.2017
ClassificationIPC:C23C16/44, C30B29/06, H01L21/02, C23C16/02, C30B25/18
[2020/35]
CPC:
C23C16/0236 (EP,KR,US); H01L21/02293 (KR); C30B25/14 (US);
C23C16/4405 (EP,KR,US); C30B25/08 (US); C30B25/12 (US);
C30B25/165 (US); C30B25/186 (EP,KR,US); C30B29/06 (EP,KR,US);
H01L21/02381 (EP,KR,US); H01L21/0243 (EP,KR,US); H01L21/02433 (EP,KR,US);
H01L21/02532 (EP,KR,US); H01L21/0262 (KR); H01L21/02661 (EP,KR,US) (-)
Former IPC [2018/43]C30B25/02, C30B29/06, H01L21/02, C23C16/44, C23C16/02
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2018/43]
Extension statesBANot yet paid
MENot yet paid
Validation statesMANot yet paid
MDNot yet paid
TitleGerman:VERFAHREN ZUM EPITAKTISCHEN BESCHICHTEN VON HALBLEITERSCHEIBEN[2020/35]
English:METHOD FOR EPITAXIAL COATING OF SEMICONDUCTOR WAFERS[2020/35]
French:PROCÉDÉ POUR EFFECTUER LE REVÊTEMENT ÉPITAXIQUE DE TRANCHES DE SEMI-CONDUCTEUR[2020/35]
Former [2018/43]VERFAHREN ZUM EPITAKTISCHEN BESCHICHTEN VON HALBLEITERSCHEIBEN UND HALBLEITERSCHEIBE
Former [2018/43]METHOD FOR EPITAXIAL COATING OF SEMICONDUCTOR WAFERS, AND SEMICONDUCTOR WAFER
Former [2018/43]PROCÉDÉ POUR EFFECTUER LE REVÊTEMENT ÉPITAXIQUE DE TRANCHES DE SEMI-CONDUCTEUR ET TRANCHE DE SEMI-CONDUCTEUR
Entry into regional phase04.06.2018National basic fee paid 
04.06.2018Designation fee(s) paid 
04.06.2018Examination fee paid 
Examination procedure04.06.2018Examination requested  [2018/43]
04.06.2018Date on which the examining division has become responsible
11.01.2019Amendment by applicant (claims and/or description)
19.02.2020Despatch of a communication from the examining division (Time limit: M04)
18.06.2020Reply to a communication from the examining division
14.08.2020Communication of intention to grant the patent
01.12.2020Fee for grant paid
01.12.2020Fee for publishing/printing paid
01.12.2020Receipt of the translation of the claim(s)
Opposition(s)04.11.2021No opposition filed within time limit [2022/02]
Fees paidRenewal fee
19.12.2018Renewal fee patent year 03
23.12.2019Renewal fee patent year 04
24.12.2020Renewal fee patent year 05
Opt-out from the exclusive  Tooltip
competence of the Unified
Patent Court		 See the Register of the Unified Patent Court for opt-out data
Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court.
Lapses during opposition  TooltipHU09.12.2016
AL03.02.2021
CY03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
MC03.02.2021
MK03.02.2021
MT03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
[2024/42]
Former [2024/22]HU09.12.2016
AL03.02.2021
CY03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
MC03.02.2021
MK03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2023/30]HU09.12.2016
AL03.02.2021
CY03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
MC03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2023/29]HU09.12.2016
AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
MC03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2022/33]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
MC03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2022/23]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
IT03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2022/13]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SI03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2022/10]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2022/08]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
ES03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2022/07]AL03.02.2021
CZ03.02.2021
DK03.02.2021
EE03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/50]CZ03.02.2021
DK03.02.2021
EE03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RO03.02.2021
RS03.02.2021
SE03.02.2021
SK03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/49]CZ03.02.2021
DK03.02.2021
EE03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RS03.02.2021
SE03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/48]CZ03.02.2021
EE03.02.2021
FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RS03.02.2021
SE03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/46]FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RS03.02.2021
SE03.02.2021
SM03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/42]FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RS03.02.2021
SE03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
IS03.06.2021
PT04.06.2021
Former [2021/39]FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
PL03.02.2021
RS03.02.2021
SE03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2021/38]FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
NL03.02.2021
RS03.02.2021
SE03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2021/37]FI03.02.2021
HR03.02.2021
LT03.02.2021
LV03.02.2021
RS03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2021/36]FI03.02.2021
HR03.02.2021
LT03.02.2021
BG03.05.2021
NO03.05.2021
GR04.05.2021
PT04.06.2021
Former [2021/35]FI03.02.2021
HR03.02.2021
LT03.02.2021
NO03.05.2021
PT04.06.2021
Former [2021/33]FI03.02.2021
LT03.02.2021
NO03.05.2021
PT04.06.2021
Cited inInternational search[XI]DE102005045338  (SILTRONIC AG [DE]) [X] 1-4,8,10-16 * paragraphs [0058] , [0 72] * * page 5, paragraph 36 - paragraph 46 * [I] 5-7,9;
 [AD]DE102005045339  (SILTRONIC AG [DE]) [AD] 7,9 * paragraphs [0065] , [0069] - [0072] * * paragraphs [0023] , [0 49] *;
 [A]JP2009278035  (SHINETSU HANDOTAI KK) [A] 16* figures 4,5 *;
 [IP]WO2016155915  (SILTRONIC AG [DE]) [IP] 1 * page 4, paragraph 3 *
by applicantDE102005045339
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.