EP3189175 - SYSTEMS AND METHODS FOR SINGLE MAGNETRON SPUTTERING [Right-click to bookmark this link] | Status | No opposition filed within time limit Status updated on 27.12.2019 Database last updated on 20.12.2024 | |
Former | The patent has been granted Status updated on 18.01.2019 | ||
Former | Grant of patent is intended Status updated on 14.11.2018 | ||
Former | Request for examination was made Status updated on 10.10.2018 | ||
Former | Grant of patent is intended Status updated on 20.09.2018 | ||
Former | Request for examination was made Status updated on 15.06.2017 | ||
Former | The international publication has been made Status updated on 03.02.2017 | Most recent event Tooltip | 08.07.2022 | Lapse of the patent in a contracting state New state(s): MK | published on 10.08.2022 [2022/32] | Applicant(s) | For all designated states AES Global Holdings, Pte. Ltd. 80 Robinson Road 02-00 Singapore 068898.3 / SG | [2019/28] |
Former [2017/28] | For all designated states Advanced Energy Industries, Inc. 1625 Sharp Point Drive Fort Collins, CO 80525 / US | Inventor(s) | 01 /
CHRISTIE, David 1300 Twin Oak Court Fort Collins, CO 80525 / US | 02 /
LARSON, Skip, B. 2219 Wakefield Drive Fort Collins, CO 80526 / US | [2017/28] | Representative(s) | Gill, David Alan WP Thompson 138 Fetter Lane London EC4A 1BT / GB | [2017/28] | Application number, filing date | 16831032.4 | 15.07.2016 | [2017/28] | WO2016US42389 | Priority number, date | US201514809084 | 24.07.2015 Original published format: US201514809084 | [2017/28] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2017019323 | Date: | 02.02.2017 | Language: | EN | [2017/05] | Type: | A1 Application with search report | No.: | EP3189175 | Date: | 12.07.2017 | Language: | EN | The application published by WIPO in one of the EPO official languages on 02.02.2017 takes the place of the publication of the European patent application. | [2017/28] | Type: | B1 Patent specification | No.: | EP3189175 | Date: | 20.02.2019 | Language: | EN | [2019/08] | Search report(s) | International search report - published on: | AU | 02.02.2017 | (Supplementary) European search report - dispatched on: | EP | 20.02.2018 | Classification | IPC: | C23C14/35, H01J37/32, G01R17/02, H01J37/34 | [2018/12] | CPC: |
H01J37/3476 (EP,US);
C23C14/3485 (EP,US);
C23C14/3492 (EP,US);
H01J37/3405 (EP,US);
H01J37/3438 (EP,US);
H01J37/3488 (EP,US)
|
Former IPC [2017/28] | C23C14/35, H01J37/32, G01R17/02 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2017/28] | Extension states | BA | Not yet paid | ME | Not yet paid | Validation states | MA | Not yet paid | MD | Not yet paid | Title | German: | SYSTEME UND VERFAHREN FÜR EINZELMAGNETRONSPUTTERN | [2017/28] | English: | SYSTEMS AND METHODS FOR SINGLE MAGNETRON SPUTTERING | [2017/28] | French: | SYSTÈMES ET PROCÉDÉS DE PULVÉRISATION PAR MAGNÉTRON UNIQUE | [2017/28] | Entry into regional phase | 07.04.2017 | National basic fee paid | 07.04.2017 | Search fee paid | 07.04.2017 | Designation fee(s) paid | 07.04.2017 | Examination fee paid | Examination procedure | 07.04.2017 | Examination requested [2017/28] | 07.04.2017 | Date on which the examining division has become responsible | 21.09.2018 | Communication of intention to grant the patent | 05.10.2018 | Disapproval of the communication of intention to grant the patent by the applicant or resumption of examination proceedings by the EPO | 15.11.2018 | Communication of intention to grant the patent | 02.01.2019 | Fee for grant paid | 02.01.2019 | Fee for publishing/printing paid | 02.01.2019 | Receipt of the translation of the claim(s) | Opposition(s) | 21.11.2019 | No opposition filed within time limit [2020/05] | Fees paid | Renewal fee | 11.07.2018 | Renewal fee patent year 03 |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Lapses during opposition Tooltip | HU | 15.07.2016 | AL | 20.02.2019 | AT | 20.02.2019 | CY | 20.02.2019 | CZ | 20.02.2019 | DK | 20.02.2019 | EE | 20.02.2019 | ES | 20.02.2019 | FI | 20.02.2019 | HR | 20.02.2019 | IT | 20.02.2019 | LT | 20.02.2019 | LV | 20.02.2019 | MC | 20.02.2019 | MK | 20.02.2019 | MT | 20.02.2019 | NL | 20.02.2019 | PL | 20.02.2019 | RO | 20.02.2019 | RS | 20.02.2019 | SE | 20.02.2019 | SI | 20.02.2019 | SK | 20.02.2019 | SM | 20.02.2019 | TR | 20.02.2019 | BG | 20.05.2019 | NO | 20.05.2019 | GR | 21.05.2019 | IS | 20.06.2019 | PT | 20.06.2019 | IE | 15.07.2019 | LU | 15.07.2019 | BE | 31.07.2019 | CH | 31.07.2019 | FR | 31.07.2019 | LI | 31.07.2019 | [2022/32] |
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PT | 20.06.2019 | Documents cited: | Search | [A]US4478700 (CRISS RUSSELL C [US]) [A] 1-15 * the whole document *; | [A]WO02103078 (CHEMFILT R & D AKTIEBOLAG [SE], et al) [A] 1-15* the whole document *; | [A]WO2007051461 (ARDENNE ANLAGENTECH GMBH [DE], et al) [A] 1-15 * figures 5-8 * * page 15, line 20 - page 19, line 20 *; | [A]DE102009051056 (ARDENNE ANLAGENTECH GMBH [DE]) [A] 1-15 * the whole document *; | [A] - R Scholl ET AL, "Redundant Anode Sputtering: A Novel Approach To The Disappearing Anode Problem", Advanced Energy Whitepaper., (20000101), pages 1 - 8, URL: http://www.advanced-energy.com/upload/File/White_Papers/SL-WHITE2-270-01.pdf, (20170227), XP055349642 [A] 1-15 * figures 3, 4 * * Redundant anode sputtering; page 3, column 2 - page 4, column 1 * | International search | [Y]US4478700 (CRISS RUSSELL C [US]) [Y] 1-17* col. 3, Ins 43-62 *; | [Y]US5897753 (SCHATZ DOUGLAS S [US], et al) [Y] 1-17 * figs. 3-7; col. 7, In 31 to col 9, In 40 *; | [Y]US2004075060 (LUTEN HENRY A [US], et al) [Y] 1-17 * [0037] *; | [Y] - SCHOLL, R. et al., "Redundant Anode Sputtering: A Novel Approach To The Disappearing Anode Problem", Advanced Energy Whitepaper., (20000000), URL: http://www.advanced-energy.com/upload/File/White_Papers/SL-WHITE2-270-01.pdf, (20161006), XP055349642 [Y] 1-17 * fig. 4, page 3, col. 2, third full paragraph to page 4, col. 1, first paragraph, Tables 1 and 2 * |