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Extract from the Register of European Patents

EP About this file: EP3411899

EP3411899 - HYBRID MASK FOR DEEP ETCHING [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  27.11.2020
Database last updated on 31.08.2024
FormerRequest for examination was made
Status updated on  09.11.2018
FormerThe international publication has been made
Status updated on  11.08.2017
Formerunknown
Status updated on  17.02.2017
Most recent event   Tooltip27.11.2020Application deemed to be withdrawnpublished on 30.12.2020  [2020/53]
Applicant(s)For all designated states
King Abdullah University of Science and Technology
4700 King Abdullah University of
Science and Technology
Thuwal 23955-6900 / SA
[2018/50]
Inventor(s)01 / GHONEIM, Mohamed Tarek
278B Sudan Street
Apt.2
2nd Floor
Mohandessin Giza / EG
 [2018/50]
Representative(s)Ipsilon
Le Centralis
63, avenue du Général Leclerc
92340 Bourg-la-Reine / FR
[N/P]
Former [2018/50]Peguet, Wilfried
Ipsilon
Le Centralis
63, avenue du Général Leclerc
92340 Bourg-la-Reine / FR
Application number, filing date17703800.726.01.2017
[2018/50]
WO2017IB50417
Priority number, dateUS201662289895P01.02.2016         Original published format: US 201662289895 P
[2018/50]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2017134545
Date:10.08.2017
Language:EN
[2017/32]
Type: A1 Application with search report 
No.:EP3411899
Date:12.12.2018
Language:EN
The application published by WIPO in one of the EPO official languages on 10.08.2017 takes the place of the publication of the European patent application.
[2018/50]
Search report(s)International search report - published on:EP10.08.2017
ClassificationIPC:H01L21/308, H01L21/768
[2018/50]
CPC:
H01L21/3081 (EP,US); H01L21/0272 (EP,US); H01L21/0331 (EP,US);
H01L21/76898 (EP,US); H01L21/56 (US); H01L24/03 (US)
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2018/50]
TitleGerman:HYBRIDE MASKE FÜR TIEFÄTZEN[2018/50]
English:HYBRID MASK FOR DEEP ETCHING[2018/50]
French:MASQUE HYBRIDE POUR GRAVURE PROFONDE[2018/50]
Entry into regional phase08.08.2018National basic fee paid 
08.08.2018Designation fee(s) paid 
08.08.2018Examination fee paid 
Examination procedure08.08.2018Amendment by applicant (claims and/or description)
08.08.2018Examination requested  [2018/50]
08.08.2018Date on which the examining division has become responsible
01.08.2020Application deemed to be withdrawn, date of legal effect  [2020/53]
26.08.2020Despatch of communication that the application is deemed to be withdrawn, reason: renewal fee not paid in time  [2020/53]
Fees paidRenewal fee
08.08.2018Renewal fee patent year 03
Penalty fee
Additional fee for renewal fee
31.01.202004   M06   Not yet paid
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Cited inInternational search[X]EP0232894  (SELENIA IND ELETTRONICHE [IT]) [X] 1-3 * page 3, paragraph last - page 5, paragraph 3; figure 2 *;
 [Y]WO0179933  (OBDUCAT AB [SE], et al) [Y] 4 * page 10, line 30 - page 11, line 23; figure 4 *;
 [Y]US2012115331  (KOH CHA-WON [KR], et al) [Y] 7-10* figure 3 *;
 [X]US2014225233  (HIRSCHLER JOACHIM [AT], et al) [X] 1,5,6 * paragraph [0003]; figure 3 *;
 [XY]US2015380251  (GLODDE MARTIN [US], et al) [X] 1,3 * paragraphs [0015] - [0021] - [0 47]; figures 4-6 * [Y] 4,7-10
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.