EP3513428 - INTEGRATED SYSTEM FOR SEMICONDUCTOR PROCESS [Right-click to bookmark this link] | Status | The application is deemed to be withdrawn Status updated on 24.06.2022 Database last updated on 03.09.2024 | |
Former | Examination is in progress Status updated on 15.10.2021 | ||
Former | Request for examination was made Status updated on 21.06.2019 | ||
Former | The international publication has been made Status updated on 24.03.2018 | Most recent event Tooltip | 24.06.2022 | Application deemed to be withdrawn | published on 27.07.2022 [2022/30] | Applicant(s) | For all designated states Applied Materials, Inc. 3050 Bowers Avenue Santa Clara, CA 95054 / US | [2019/30] | Inventor(s) | 01 /
BAO, Xinyu 42236 Blacow Rd. Fremont California 94538 / US | 02 /
CHUNG, Hua 4645 Piper Drive San Jose California 95129 / US | 03 /
CHU, Schubert S. 8 Sequoia Way San Francisco California 94127 / US | [2019/30] | Representative(s) | Zimmermann & Partner Patentanwälte mbB Postfach 330 920 80069 München / DE | [2019/30] | Application number, filing date | 17851202.6 | 27.01.2017 | [2019/30] | WO2017US15472 | Priority number, date | US201662395083P | 15.09.2016 Original published format: US 201662395083 P | [2019/30] | Filing language | EN | Procedural language | EN | Publication | Type: | A1 Application with search report | No.: | WO2018052479 | Date: | 22.03.2018 | Language: | EN | [2018/12] | Type: | A1 Application with search report | No.: | EP3513428 | Date: | 24.07.2019 | Language: | EN | The application published by WIPO in one of the EPO official languages on 22.03.2018 takes the place of the publication of the European patent application. | [2019/30] | Search report(s) | International search report - published on: | KR | 22.03.2018 | (Supplementary) European search report - dispatched on: | EP | 13.05.2020 | Classification | IPC: | H01L21/67, H01L21/3065, H01L21/20, H01L21/336, H01J37/32 | [2020/16] | CPC: |
H01L21/67207 (EP,US);
H01L21/67196 (KR,US);
B08B7/0035 (US);
C30B25/04 (US);
C30B25/186 (US);
C30B29/06 (US);
H01J37/32458 (US);
H01J37/32899 (EP,US);
H01L21/02046 (US);
H01L21/02532 (US);
H01L21/02636 (US);
H01L21/20 (KR);
H01L21/28518 (US);
H01L21/2855 (US);
H01L21/3065 (KR,US);
H01L21/67034 (KR);
H01L21/67069 (KR);
H01L21/67167 (EP,US);
H01L21/67184 (EP,US);
H01L21/67201 (US);
H01L29/665 (EP);
H01L29/6659 (EP);
H01L29/66636 (EP,US);
H01L29/66795 (US);
H01J2237/334 (US)
(-)
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Former IPC [2019/30] | H01L21/67, H01L21/3065, H01L21/20 | Designated contracting states | AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR [2019/30] | Title | German: | INTEGRIERTES SYSTEM FÜR HALBLEITERVERFAHREN | [2019/30] | English: | INTEGRATED SYSTEM FOR SEMICONDUCTOR PROCESS | [2019/30] | French: | SYSTÈME INTÉGRÉ POUR PROCESSUS SEMI-CONDUCTEUR | [2019/30] | Entry into regional phase | 27.03.2019 | National basic fee paid | 27.03.2019 | Search fee paid | 27.03.2019 | Designation fee(s) paid | 27.03.2019 | Examination fee paid | Examination procedure | 27.03.2019 | Examination requested [2019/30] | 03.12.2020 | Amendment by applicant (claims and/or description) | 15.10.2021 | Despatch of a communication from the examining division (Time limit: M04) | 26.02.2022 | Application deemed to be withdrawn, date of legal effect [2022/30] | 22.03.2022 | Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time [2022/30] | Fees paid | Renewal fee | 27.03.2019 | Renewal fee patent year 03 | 21.01.2020 | Renewal fee patent year 04 | 20.01.2021 | Renewal fee patent year 05 | Penalty fee | Additional fee for renewal fee | 31.01.2022 | 06   M06   Not yet paid |
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Responsibility for the accuracy, completeness or quality of the data displayed under the link provided lies entirely with the Unified Patent Court. | Documents cited: | Search | [XI]WO2008005832 (APPLIED MATERIALS INC [US], et al); | [Y]US2008067557 (YU MING-HUA [TW], et al); | [Y]US2011175140 (TAYLOR MITCHELL C [US], et al); | [Y]US2012021583 (WU CHUN-YUAN [TW], et al) | International search | [A]US6281098 (WANG TIHU [US], et al); | [X]US2003062333 (KRANZ MARTIN [DE], et al); | [A]KR20090035578 (APPLIED MATERIALS INC [US]); | [A]JP2012503336 ; | [A]US2012051872 (KU SHAO-YEN [TW], et al) | by applicant | WO2008005832 | US2012021583 |