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Extract from the Register of European Patents

EP About this file: EP3513428

EP3513428 - INTEGRATED SYSTEM FOR SEMICONDUCTOR PROCESS [Right-click to bookmark this link]
StatusThe application is deemed to be withdrawn
Status updated on  24.06.2022
Database last updated on 03.09.2024
FormerExamination is in progress
Status updated on  15.10.2021
FormerRequest for examination was made
Status updated on  21.06.2019
FormerThe international publication has been made
Status updated on  24.03.2018
Most recent event   Tooltip24.06.2022Application deemed to be withdrawnpublished on 27.07.2022  [2022/30]
Applicant(s)For all designated states
Applied Materials, Inc.
3050 Bowers Avenue
Santa Clara, CA 95054 / US
[2019/30]
Inventor(s)01 / BAO, Xinyu
42236 Blacow Rd.
Fremont California 94538 / US
02 / CHUNG, Hua
4645 Piper Drive
San Jose California 95129 / US
03 / CHU, Schubert S.
8 Sequoia Way
San Francisco California 94127 / US
 [2019/30]
Representative(s)Zimmermann & Partner Patentanwälte mbB
Postfach 330 920
80069 München / DE
[2019/30]
Application number, filing date17851202.627.01.2017
[2019/30]
WO2017US15472
Priority number, dateUS201662395083P15.09.2016         Original published format: US 201662395083 P
[2019/30]
Filing languageEN
Procedural languageEN
PublicationType: A1 Application with search report
No.:WO2018052479
Date:22.03.2018
Language:EN
[2018/12]
Type: A1 Application with search report 
No.:EP3513428
Date:24.07.2019
Language:EN
The application published by WIPO in one of the EPO official languages on 22.03.2018 takes the place of the publication of the European patent application.
[2019/30]
Search report(s)International search report - published on:KR22.03.2018
(Supplementary) European search report - dispatched on:EP13.05.2020
ClassificationIPC:H01L21/67, H01L21/3065, H01L21/20, H01L21/336, H01J37/32
[2020/16]
CPC:
H01L21/67207 (EP,US); H01L21/67196 (KR,US); B08B7/0035 (US);
C30B25/04 (US); C30B25/186 (US); C30B29/06 (US);
H01J37/32458 (US); H01J37/32899 (EP,US); H01L21/02046 (US);
H01L21/02532 (US); H01L21/02636 (US); H01L21/20 (KR);
H01L21/28518 (US); H01L21/2855 (US); H01L21/3065 (KR,US);
H01L21/67034 (KR); H01L21/67069 (KR); H01L21/67167 (EP,US);
H01L21/67184 (EP,US); H01L21/67201 (US); H01L29/665 (EP);
H01L29/6659 (EP); H01L29/66636 (EP,US); H01L29/66795 (US);
H01J2237/334 (US) (-)
Former IPC [2019/30]H01L21/67, H01L21/3065, H01L21/20
Designated contracting statesAL,   AT,   BE,   BG,   CH,   CY,   CZ,   DE,   DK,   EE,   ES,   FI,   FR,   GB,   GR,   HR,   HU,   IE,   IS,   IT,   LI,   LT,   LU,   LV,   MC,   MK,   MT,   NL,   NO,   PL,   PT,   RO,   RS,   SE,   SI,   SK,   SM,   TR [2019/30]
TitleGerman:INTEGRIERTES SYSTEM FÜR HALBLEITERVERFAHREN[2019/30]
English:INTEGRATED SYSTEM FOR SEMICONDUCTOR PROCESS[2019/30]
French:SYSTÈME INTÉGRÉ POUR PROCESSUS SEMI-CONDUCTEUR[2019/30]
Entry into regional phase27.03.2019National basic fee paid 
27.03.2019Search fee paid 
27.03.2019Designation fee(s) paid 
27.03.2019Examination fee paid 
Examination procedure27.03.2019Examination requested  [2019/30]
03.12.2020Amendment by applicant (claims and/or description)
15.10.2021Despatch of a communication from the examining division (Time limit: M04)
26.02.2022Application deemed to be withdrawn, date of legal effect  [2022/30]
22.03.2022Despatch of communication that the application is deemed to be withdrawn, reason: reply to the communication from the examining division not received in time  [2022/30]
Fees paidRenewal fee
27.03.2019Renewal fee patent year 03
21.01.2020Renewal fee patent year 04
20.01.2021Renewal fee patent year 05
Penalty fee
Additional fee for renewal fee
31.01.202206   M06   Not yet paid
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Documents cited:Search[XI]WO2008005832  (APPLIED MATERIALS INC [US], et al);
 [Y]US2008067557  (YU MING-HUA [TW], et al);
 [Y]US2011175140  (TAYLOR MITCHELL C [US], et al);
 [Y]US2012021583  (WU CHUN-YUAN [TW], et al)
International search[A]US6281098  (WANG TIHU [US], et al);
 [X]US2003062333  (KRANZ MARTIN [DE], et al);
 [A]KR20090035578  (APPLIED MATERIALS INC [US]);
 [A]JP2012503336  ;
 [A]US2012051872  (KU SHAO-YEN [TW], et al)
by applicantWO2008005832
 US2012021583
The EPO accepts no responsibility for the accuracy of data originating from other authorities; in particular, it does not guarantee that it is complete, up to date or fit for specific purposes.